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    • 33. 发明授权
    • Spacer structure having a surface which can reduce secondaries
    • 间隔结构具有可以减少二次的表面
    • US06809469B1
    • 2004-10-26
    • US09413774
    • 1999-10-07
    • Nobuhiro ItoHideaki Mitsutake
    • Nobuhiro ItoHideaki Mitsutake
    • H01J162
    • H01J9/242H01J29/028H01J29/864H01J31/127H01J2329/863H01J2329/8635H01J2329/864H01J2329/8645H01J2329/8655H01J2329/866
    • A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the displacement of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.
    • 静电受限制的间隔物和设置间隔物的电子束装置。 在包括设置有电子发射装置的电子源的电子束装置中,设置有设置在电子源和面板之间的阳极和间隔物的面板在间隔基板的表面上形成不均匀性, 具有比粗糙度更小的厚度。 这使得对于能量低于电阻膜的第二交叉点能量的一次电子的入射角倍增系数的限制成为可能。 设置有上述间隔物的电子束装置由于间隔件而可以限制发光点的位移和伴随静电的沿面放电的显示定义和长期可靠性。
    • 40. 发明申请
    • MANUFACTURING METHOD OF HERMETIC CONTAINER
    • 渗透容器的制造方法
    • US20120055196A1
    • 2012-03-08
    • US13198867
    • 2011-08-05
    • Mamo MatsumotoTomohiro SaitoNobuhiro Ito
    • Mamo MatsumotoTomohiro SaitoNobuhiro Ito
    • C03B23/20
    • H01L51/5246H01J9/241H01L51/525
    • A manufacturing method of a hermetic container includes an assembling step of assembling the hermetic container and a sealing step of sealing by first and second sealing materials. Thus, in a case where local heating light is scanned toward an already-sealed portion of the second sealing material, since a separation portion of an unsealed state is located between the already-sealed portion and a downstream end of scanning, a load due to expansion/contraction of a frame body is applied to the first sealing material which is present in the separation portion of the unsealed state. After then, since the local heating light is irradiated to the first sealing material to which the load has been applied so as to heat and melt it, the load is relieved, whereby it is possible to suppress deterioration of joining strength and airtightness of the hermetic container.
    • 密封容器的制造方法包括组装密封容器的组装步骤和通过第一和第二密封材料密封的密封步骤。 因此,在向第二密封材料的已经密封的部分扫描局部加热光的情况下,由于未密封状态的分离部位于已经密封的部分和扫描的下游端之间,所以由于 将框体的伸缩进行施加到存在于未密封状态的分离部中的第一密封材料。 然后,由于局部加热光被照射到已经施加负载的第一密封材料上以加热和熔化,所以负载被释放,从而可以抑制密封件的接合强度和气密性的劣化 容器。