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31. 发明申请

US20100043546A1 SENSOR AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：传感器及其制造方法
公开(公告)号：US20100043546A1
公开(公告)日：2010-02-25
申请号：US12516007
申请日：2007-11-29
申请人： Atsushi Kandori , Masao Majima , Kenichi Nagae , Yasuyoshi Takai
发明人： Atsushi Kandori , Masao Majima , Kenichi Nagae , Yasuyoshi Takai
IPC分类号： G01C19/56 , H01L21/30
CPC分类号： G01C19/5719 , G01P15/0802 , G01P15/124 , G01P15/125
摘要： Provided is a sensor including a movably supported movable element and an opposing member. The sensor detects a relative positional relationship between the movable element and the opposing member which are provided with a spacing therebetween The opposing member has an impurity-doped portion which is provided to one of an opposing portion which is opposed to the movable element and an adjoining portion which adjoins the opposing portion. At least a part of the impurity-doped portion is formed on an opposite surface opposite to a surface which is opposed to the movable element, from which opposite surface an electrical wiring is led out.
摘要翻译：提供一种传感器，包括可移动支撑的可移动元件和相对构件。传感器检测可移动元件和相对构件之间的间隔的相对位置关系。相对构件具有杂质掺杂部分，该杂质掺杂部分设置在与可移动元件相对的相对部分中的一个上，邻接相对部分的部分。杂质掺杂部分的至少一部分形成在与可移动元件相对的表面相对的相对表面上，从该导体的相对表面引出电线。

32. 发明授权

US06435130B1 Plasma CVD apparatus and plasma processing method 失效
标题翻译：等离子体CVD装置和等离子体处理方法
公开(公告)号：US06435130B1
公开(公告)日：2002-08-20
申请号：US08916540
申请日：1997-08-22
申请人： Satoshi Takaki , Yoshio Segi , Atsushi Yamagami , Hiroyuki Katagiri , Hitoshi Murayama , Yasuyoshi Takai
发明人： Satoshi Takaki , Yoshio Segi , Atsushi Yamagami , Hiroyuki Katagiri , Hitoshi Murayama , Yasuyoshi Takai
IPC分类号： C23C16509
CPC分类号： H01J37/32091 , C23C16/24 , C23C16/45578 , C23C16/509 , G03G5/08278
摘要： A plasma CVD apparatus comprising a substantially enclosed reaction chamber containing substrate holding means and a cathode electrode arranged therein, wherein a high frequency power from a high frequency power source is supplied to said cathode electrode to generate plasma between said substrate holding means having a subtrate positioned thereon and said cathode electrode whereby plasma-processing said substrate, characterized in that said cathode electrode comprises a plurality of conductor members situated on substantially the same axis which are capacitively coupled by a dielectric member. A plasma-processing method using said cathode electrode.
摘要翻译：一种等离子体CVD装置，包括：基本封闭的反应室，其包含基板保持装置和布置在其中的阴极电极，其中来自高频电源的高频功率被提供给所述阴极，以在所述基板保持装置之间产生等离子体，所述基板保持装置具有位于在其上和所述阴极电极，由此对所述衬底进行等离子体处理，其特征在于，所述阴极包括位于基本上相同的轴上的多个导体构件，所述多个导体构件通过电介质构件电容耦合。1。一种使用所述阴极电极的等离子体处理方法。

33. 发明授权

US06335281B1 Deposited film forming process 有权
标题翻译：沉积成膜工艺
公开(公告)号：US06335281B1
公开(公告)日：2002-01-01
申请号：US09334176
申请日：1999-06-16
申请人： Yoshio Segi , Hideaki Matsuoka , Hiroyuki Katagiri , Yasuyoshi Takai
发明人： Yoshio Segi , Hideaki Matsuoka , Hiroyuki Katagiri , Yasuyoshi Takai
IPC分类号： H01L2144
CPC分类号： C23C16/54 , C23C16/4581 , C23C16/46
摘要： In a deposited film forming process or apparatus, a deposited film is formed on a film-forming substrate by reduced-pressure vapor phase growth. The film-forming substrate is set on an auxiliary substrate and an auxiliary-substrate cap member is set at the upper part thereof. A maximum temperature difference between temperature at the upper end of the film-forming substrate and the temperature at the lower end of the auxiliary-substrate cap member provided on the film-forming substrate at its upper part is so controlled as to be not greater than a prescribed value so that a film deposited on the auxiliary-substrate cap member is improved in adhesion. Any deposits of films on the part other than the film-forming substrate can be prevented from coming off and scattering on the film-forming substrate so that deposited films having uniform film thickness and film quality can steadily be formed and also faulty images can occur less frequently. It is also possible to achieve improvements of various properties of films formed, film forming rate, reproducibility, and productivity so that yield can dramatically be improved in mass production.
摘要翻译：在沉积膜形成工艺或装置中，通过减压气相生长在成膜基板上形成沉积膜。成膜基板设置在辅助基板上，辅助基板盖部件设置在其上部。成膜基板的上端的温度与设置在成膜基板上部的辅助基板盖部件的下端的温度之间的最大温度差被控制为不大于规定值，使得沉积在辅助基板盖构件上的膜提高了粘附性。可以防止膜形成基板以外的部分的沉积物在成膜基板上脱落并散射，从而可以稳定地形成膜厚度和膜质量均匀的沉积膜，并且可以发生较少的图像经常。也可以实现成膜的各种性能，成膜速度，再现性和生产率的改善，从而大量提高产量。

34. 发明授权

US6158382A Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition 失效
标题翻译：通过等离子体化学气相沉积形成沉积膜的方法和通过等离子体化学气相沉积形成沉积膜的装置
公开(公告)号：US6158382A
公开(公告)日：2000-12-12
申请号：US989233
申请日：1997-12-12
申请人： Yoshio Segi , Hiroyuki Katagiri , Yasuyoshi Takai
发明人： Yoshio Segi , Hiroyuki Katagiri , Yasuyoshi Takai
IPC分类号： G03G5/082 , C23C16/27 , C23C16/44 , C23C16/455 , C23C16/50 , C23C16/509 , H01L21/205 , C23C16/00
CPC分类号： C23C16/45561 , C23C16/455 , C23C16/45578 , C23C16/5093
摘要： A film-forming method by a plasma CVD process, comprising introducing a raw material gas into a reaction chamber containing a substrate positioned therein through a plurality of gas ejecting holes provided at a gas feed pipe and introducing a discharging energy into said reaction chamber to excite and decompose said film-forming raw material gas introduced into said reaction chamber whereby causing the formation of a deposited film on said substrate, characterized in that the introduction of said film-forming raw material gas into said reaction chamber is conducted by ejecting the film-forming raw material gas toward a member opposed to the substrate from each of right and left sides of the gas feed pipe through the gas ejecting holes of the gas feed pipe at a gas-ejecting angle (a) of 45.degree..ltoreq.(a)
摘要翻译：通过等离子体CVD法的成膜方法，包括通过设置在气体供给管上的多个气体喷射孔将原料气体引入到设置在其中的基板的反应室中，并将排出能量引入到所述反应室中以进行激发并且分解引入所述反应室的所述成膜原料气体，从而在所述基材上形成沉积膜，其特征在于，将所述成膜原料气体引入所述反应室中，通过气体供给管的气体喷射孔，以45°的气体喷射角（a）从气体供给管的左右两侧向与基板相对的部件形成原料气体）<90°相对于在所述圆柱形基底和所述多个气体供给管中的每一个之间通过的管线。

35. 发明授权

US08420501B2 Transfer method of functional region, LED array, LED printer head, and LED printer 有权
标题翻译：功能区转移方式，LED阵列，LED打印头，LED打印机
公开(公告)号：US08420501B2
公开(公告)日：2013-04-16
申请号：US12611739
申请日：2009-11-03
申请人： Takao Yonehara , Yasuyoshi Takai
发明人： Takao Yonehara , Yasuyoshi Takai
IPC分类号： H01L21/52
CPC分类号： H01L33/0079 , B41J2/45 , H01L21/6835 , H01L25/167 , H01L27/153 , H01L2221/68322 , H01L2221/68368 , H01L2924/0002 , H01L2924/00
摘要： A method includes arranging a first bonding layer on a first functional region on a first substrate, or a region on a second substrate, bonding the first functional region to the second substrate through the first bonding layer, subjecting a first release layer to a first process to separate the first substrate from the first functional region at the first release layer, arranging a second bonding layer on a second functional region on the first substrate, or a region on a third substrate, bonding the second functional region to the second or third substrate through the second bonding layer, and subjecting a second release layer to a second process to separate the first substrate from the second functional region at the second release layer.
摘要翻译：一种方法包括：在第一基板上的第一功能区域或第二基板上的区域上布置第一接合层，通过第一接合层将第一功能区域与第二基板接合，使第一释放层进行第一处理在第一释放层处将第一基板与第一功能区域分开，在第一基板上的第二功能区域或第三基板上的区域上布置第二接合层，将第二功能区域结合到第二或第三基板通过第二接合层，并且使第二剥离层进行第二工序，以将第一衬底与第二剥离层处的第二功能区分离。

36. 发明授权

US08415230B2 Method for transferring functional regions, LED array, LED printer head, and LED printer 有权
标题翻译：传输功能区域的方法，LED阵列，LED打印机头和LED打印机
公开(公告)号：US08415230B2
公开(公告)日：2013-04-09
申请号：US13254024
申请日：2010-03-01
申请人： Takao Yonehara , Yasuyoshi Takai
发明人： Takao Yonehara , Yasuyoshi Takai
IPC分类号： H01L21/30 , H01L21/46
CPC分类号： B41J2/45 , H01L21/6835 , H01L24/83 , H01L33/0079 , H01L2221/68359 , H01L2924/14 , H01L2924/3025 , H01L2924/00
摘要： Provided is a method for transferring, onto a second substrate, at least one of functional regions arranged and joined to a first separation layer that is disposed on a first substrate and that becomes separable by a treatment, in which regions on the second substrate where the functional regions are to be transferred have a second separation layer that becomes separable by a treatment. The method includes a step of joining the first substrate to the second substrate by bonding such that the functional regions contact the second separation layer; a step of separating the functional regions from the first substrate at the first separation layer; and a step of, before or after the step of separation, forming separation grooves penetrating through the second substrate and the second separation layer from a surface of the second substrate, the surface being opposite to a surface having the second separation layer thereon.
摘要翻译：提供了一种用于将布置并连接到第一分离层的功能区域中的至少一个转移到第二基板上的方法，第一分离层设置在第一基板上并且通过处理可分离，其中第二基板上的区域要转移功能区域具有可通过处理分离的第二分离层。该方法包括通过接合将第一基板接合到第二基板的步骤，使得功能区域接触第二分离层; 在第一分离层处分离功能区域与第一基板的步骤; 以及在分离步骤之前或之后的步骤，从第二基板的表面形成穿过第二基板和第二分离层的分离槽，该表面与其上具有第二分离层的表面相对。

37. 发明授权

US06716324B2 Method of forming transparent, conductive film, method of compensating defective region of semiconductor layer, photovoltaic element, and method of producing photovoltaic element 有权
标题翻译：形成透明导电膜的方法，补偿半导体层的缺陷区的方法，光电元件以及生产光电元件的方法
公开(公告)号：US06716324B2
公开(公告)日：2004-04-06
申请号：US10058802
申请日：2002-01-30
申请人： Toshihiro Yamashita , Yasuyoshi Takai , Hiroshi Izawa
发明人： Toshihiro Yamashita , Yasuyoshi Takai , Hiroshi Izawa
IPC分类号： C23C1434
CPC分类号： H01L31/022425 , H01L31/022466 , H01L31/022475 , Y02E10/50
摘要： Provided is a method of forming a transparent, conductive film on a semiconductor layer formed on a substrate, by sputtering, wherein voltages are applied independently of each other to both a target and the substrate, respectively, and a bias voltage appearing in the substrate is controlled so as to form the transparent, conductive film on only a portion except for a defective region of the semiconductor layer, thereby restraining shunting of the transparent, conductive film and achieving excellent appearance thereof. Also provided are a defective region compensation method of a semiconductor layer, a photovoltaic element, and a method of producing the photovoltaic element.
摘要翻译：提供了通过溅射在形成在基板上的半导体层上形成透明导电膜的方法，其中分别将电压彼此独立地施加到靶和基板两者，并且基板中出现的偏压为被控制以在除了半导体层的缺陷区域之外的部分上形成透明导电膜，从而抑制透明导电膜的分流并实现其优异的外观。还提供了半导体层的有缺陷的区域补偿方法，光电元件以及制造光电元件的方法。

38. 发明授权

US06452091B1 Method of producing thin-film single-crystal device, solar cell module and method of producing the same 失效
标题翻译：薄膜单晶器件的制造方法，太阳能电池模块及其制造方法
公开(公告)号：US06452091B1
公开(公告)日：2002-09-17
申请号：US09614548
申请日：2000-07-12
申请人： Katsumi Nakagawa , Takao Yonehara , Yasuyoshi Takai , Kiyofumi Sakaguchi , Noritaka Ukiyo , Masaaki Iwane , Yukiko Iwasaki
发明人： Katsumi Nakagawa , Takao Yonehara , Yasuyoshi Takai , Kiyofumi Sakaguchi , Noritaka Ukiyo , Masaaki Iwane , Yukiko Iwasaki
IPC分类号： H01L2102
CPC分类号： H01L21/76259 , H01L21/304 , Y10T156/1002 , Y10T156/1028 , Y10T156/1041 , Y10T156/1048 , Y10T156/1049
摘要： The peeling of a thin-film single-crystal from a substrate is carried out so that the directions of straight lines on the single-crystal surface made by planes on which the single-crystal is apt to cleave are different from the front line direction of the peeled single-crystal. This single-crystal is used in a solar cell and a drive circuit member of an image display element. A method is provided which prevents a decrease in quality and yield of a single crystal layer when it is peeled from a substrate. A flexible solar cell module having a thin film single-crystal layer is made so that its flexing direction is different from the single-crystal's cleaving direction. Thus, a thin-film single-crystal solar cell module having excellent durability and reliability due to a lack of defect or cracking during production and use, and a method for producing the same, is provided.
摘要翻译：进行从基板剥离薄膜单晶，使得由单晶易于劈开的平面制成的单晶面上的直线的方向不同于剥离的单晶。该单晶体用于太阳能电池和图像显示元件的驱动电路部件。提供了当从基板剥离时防止单晶层的质量和产量降低的方法。制成具有薄膜单晶层的柔性太阳能电池模块，使其挠曲方向与单晶的分裂方向不同。因此，提供了由于在生产和使用期间缺少缺陷或破裂而具有优异的耐久性和可靠性的薄膜单晶太阳能电池组件及其制造方法。

39. 发明授权

US06406554B1 Method and apparatus for producing electrophotographic photosensitive member 有权
标题翻译：用于制造电子照相感光构件的方法和装置
公开(公告)号：US06406554B1
公开(公告)日：2002-06-18
申请号：US09605759
申请日：2000-06-28
申请人： Hiroyuki Katagiri , Yoshio Segi , Hideaki Matsuoka , Yasuyoshi Takai
发明人： Hiroyuki Katagiri , Yoshio Segi , Hideaki Matsuoka , Yasuyoshi Takai
IPC分类号： B08B908
CPC分类号： G03G5/08278 , G03G5/08214 , G03G5/08221 , G03G5/08235
摘要： The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member includes a step forming a functional film on a substrate, and a washing step of spraying water on the substrate surface from concentrically arranged nozzle groups positioned in a twisted relationship before the step of forming the functional film.
摘要翻译：本发明提供一种制造电子照相感光构件的方法，该方法能够获得高质量均匀的图像，而没有图像缺陷和图像密度不均匀。制造电子照相感光构件的方法包括在基板上形成功能膜的步骤，以及在形成功能膜的步骤之前，从位于扭曲关系的同心布置的喷嘴组在基板表面上喷射水的洗涤步骤。

40. 发明授权

US06223684B1 Film deposition apparatus 失效
标题翻译：膜沉积装置
公开(公告)号：US06223684B1
公开(公告)日：2001-05-01
申请号：US09110124
申请日：1998-07-06
申请人： Yasushi Fujioka , Masahiro Kanai , Yasuyoshi Takai
发明人： Yasushi Fujioka , Masahiro Kanai , Yasuyoshi Takai
IPC分类号： C23C1600
CPC分类号： H01J37/32623 , C23C16/4401 , C23C16/4412 , C23C16/50 , Y10S156/916
摘要： A film deposition apparatus includes a vacuum chamber, a gas supplier, a gas exhauster, and a discharging means, the film deposition apparatus forming a deposited film on a substrate provided in the vacuum chamber by a plasma enhanced CVD process, wherein at least one louver is provided at the interior and/or vicinity of the plasma discharging space in the vacuum chamber.
摘要翻译：成膜装置包括真空室，气体供给器，排气装置和排出装置，该成膜装置通过等离子体增强CVD工艺在设置在真空室中的基板上形成沉积膜，其中至少一个百叶窗设置在真空室中的等离子体放电空间的内部和/或附近。

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