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    • 34. 发明授权
    • Method of manufacturing a semiconductor laser device
    • 制造半导体激光器件的方法
    • US5394425A
    • 1995-02-28
    • US201342
    • 1994-02-24
    • Hideki FukunagaNobuaki UekiHiromi OtomaHideo Nakayama
    • Hideki FukunagaNobuaki UekiHiromi OtomaHideo Nakayama
    • H01S5/00H01S5/20H01S5/22H01S5/223H01S3/19
    • H01S5/22H01S5/20H01S5/2059H01S5/2226H01S5/223
    • The method applies to manufacture of a semiconductor laser device which comprises a semiconductor substrate and a plurality of semiconductor layers piled sequentially one on top of another on the semiconductor substrate, the semiconductor layers including at least a first clad layer; an active layer interposed between a pair of optical waveguide layers, and a second clad layer. In the present manufacturing method, a first impurity diffusion source film is applied on top of the semiconductor layers, an insulation film is applied on top of the first impurity diffusion source film, two layers consisting of the first impurity diffusion source film and insulation film are removed respectively into a stripe shape except for the areas of the semiconductor layers in which impurities are to be diffused, a diffusion protect film to be etched selectively with respect to the insulation film is formed on the surfaces of the semiconductor layers and two layers, an impurity is thermally diffused from the first impurity diffusion source film, a diffusion protect film is etched selectively with respect to the insulation film, and a second impurity is diffused with the insulation film as a mask.
    • 该方法适用于半导体激光器件的制造,该半导体激光器件包括半导体衬底和在半导体衬底上依次堆叠在一起的多个半导体层,半导体层至少包括第一覆盖层; 介于一对光波导层之间的有源层和第二覆层。 在本制造方法中,将第一杂质扩散源膜施加在半导体层的顶部,在第一杂质扩散源膜的顶部施加绝缘膜,由第一杂质扩散源膜和绝缘膜构成的两层 除去杂质要扩散的半导体层的区域以外的条纹状,在半导体层和两层的表面上形成相对于绝缘膜选择性地蚀刻的扩散保护膜, 杂质从第一杂质扩散源膜热扩散,相对于绝缘膜选择性地蚀刻扩散保护膜,第二杂质以绝缘膜作为掩模扩散。
    • 38. 发明授权
    • Surface-emitting semiconductor laser, surface-emitting semiconductor laser device, optical transmission apparatus, and information processing apparatus
    • 表面发射半导体激光器,表面发射半导体激光装置,光传输装置和信息处理装置
    • US08368972B2
    • 2013-02-05
    • US13190022
    • 2011-07-25
    • Kazutaka TakedaHideo Nakayama
    • Kazutaka TakedaHideo Nakayama
    • H04N1/04H04N1/46
    • H01S5/18311H01S5/02212H01S5/02284H01S5/02288H01S5/0425H01S5/18355H01S5/18386
    • A surface-emitting semiconductor laser includes a substrate, a first semiconductor multi-layered reflector of a first conductivity type, an active region, a second semiconductor multi-layered reflector of a second conductivity type, a columnar structure, a current-confining layer including a conductive area surrounded with an oxidized area, a first electrode defining a light-emitting window, a first dielectric film covering the light-emitting window, and a second dielectric film formed on the first dielectric film. The second dielectric film has an asymmetrical shape having a long axis and a short axis, the second dielectric film is located at a position overlapping with the conductive area, the second refractive index n2 is greater than the first refractive index n1, the thickness of the first dielectric film is an odd multiple of λ/4·n1 (λ: oscillation wavelength), and the thickness of the second dielectric film is an odd multiple of λ/4·n2.
    • 表面发射半导体激光器包括基板,第一导电类型的第一半导体多层反射器,有源区,第二导电类型的第二半导体多层反射器,柱状结构,电流限制层,包括 由氧化区域包围的导电区域,限定发光窗口的第一电极,覆盖发光窗口的第一电介质膜和形成在第一电介质膜上的第二电介质膜。 第二电介质膜具有长轴和短轴的不对称形状,第二电介质膜位于与导电区重叠的位置,第二折射率n2大于第一折射率n1, 第一电介质膜是λ/ 4·n1(λ:振荡波长)的奇数倍,第二电介质膜的厚度为λ/ 4·n2的奇数倍。
    • 39. 发明授权
    • DA converter, solid-state imaging device, and camera system
    • DA转换器,固态成像装置和相机系统
    • US08274589B2
    • 2012-09-25
    • US12662073
    • 2010-03-30
    • Hideo Nakayama
    • Hideo Nakayama
    • H04N3/14H04N5/335H04N5/235H04N5/228
    • H04N5/378H03M1/06H03M1/742H04N5/374
    • A DA converter includes: an analog signal output section that generates an output current and a non-output current according to a value of a digital input signal in response to a gain control signal supplied to adjust gain, and that outputs an analog signal produced by current-voltage conversion of the output current and causes the non-output current to flow to a reference potential; a gain control signal generating section that generates a gain current and a non-select current according to a value of a digital gain control signal, and that generates the gain control signal by current-voltage conversion of the gain current and supplies the gain control signal to the analog signal output section; and a correction current generating section that generates, based on the non-select current of the gain control signal generating section, a correction current that complements an amount of current fluctuation due to changes in gain settings in the gain control signal generating section, and that causes the correction current to flow to the reference potential.
    • DA转换器包括:模拟信号输出部分,响应于提供的用于调节增益的增益控制信号,根据数字输入信号的值产生输出电流和非输出电流,并且输出由 输出电流的电流 - 电压转换,并使非输出电流流向参考电位; 增益控制信号产生部分,根据数字增益控制信号的值产生增益电流和非选择电流,并通过电流 - 电压转换增益电流产生增益控制信号,并将增益控制信号 到模拟信号输出部分; 以及校正电流产生部,其基于所述增益控制信号生成部的非选择电流生成补偿电流,所述校正电流补充由于所述增益控制信号生成部中的增益设定的变化引起的电流变动量, 导致校正电流流向参考电位。