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31. 发明申请

US20090012255A1 HYDROXYL ORGANIC OLIGOSILOXANE RESIN AND PREPARATION METHOD THEREOF 审中-公开
标题翻译：羟基有机低聚硅氧烷树脂及其制备方法
公开(公告)号：US20090012255A1
公开(公告)日：2009-01-08
申请号：US12166995
申请日：2008-07-02
申请人： Byeong-Soo Bae , Kyung-Ho Jung , Ji-Hoon Ko , Jung-Ho Jin
发明人： Byeong-Soo Bae , Kyung-Ho Jung , Ji-Hoon Ko , Jung-Ho Jin
IPC分类号： B05D3/06 , C08G77/08 , C08G77/14 , B05D3/02
CPC分类号： C08G77/16 , C08G77/14 , C08G77/20 , C08G77/26
摘要： Disclosed are hydroxyl organic oligosiloxane resins prepared by hydrolysis-condensation of organic alkoxysilane and preparation method thereof. More particularly, the present invention provides a method for preparation of novel resins with excellent coating properties, mechanical properties and thermal stability, comprising use of a hydroxyl organic oligosiloxane resin which has a center of inorganic network structure with high condensation degree formed by complete hydrolysis-condensation, and at least one hydroxyl group and organic group or organic functional group around the center.
摘要翻译：公开了通过有机烷氧基硅烷的水解缩合制备的羟基有机低聚硅氧烷树脂及其制备方法。更具体地说，本发明提供一种制备具有优异的涂料性能，机械性能和热稳定性的新型树脂的方法，其包括使用具有通过完全水解形成的具有高缩合度的无机网状结构中心的羟基有机低聚硅氧烷树脂，缩合，以及中心周围的至少一个羟基和有机基团或有机官能团。

32. 发明授权

US06912056B2 Apparatus and method for measuring each thickness of a multilayer stacked on a substrate 失效
标题翻译：用于测量层叠在基板上的多层厚度的装置和方法
公开(公告)号：US06912056B2
公开(公告)日：2005-06-28
申请号：US10914149
申请日：2004-08-10
申请人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
发明人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
IPC分类号： G01B11/06 , H01L21/66 , G01B11/28
CPC分类号： G01B11/0641
摘要： In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each corresponding to one of a plurality of hypothetical multilayers, is stored. One of the plurality of hypothetical multilayers is initially assumed to be the multilayer actually formed on the substrate. A plurality of theoretical spectra is calculated using one of the plurality of recipe data in accordance with various theoretical thicknesses of one of the plurality of hypothetical multilayers. The measured spectrum is compared with the plurality of theoretical spectra to determine a temporary thickness of the multilayer. A reliability of the temporary thickness of the multilayer is estimated. The temporary thickness is output as a thickness of the multilayer on the substrate when the reliability of the temporary thickness is within an allowable range.
摘要翻译：在测量基板上的多层厚度的装置和方法中，测量从基板反射的反射光的光谱。存储多个与多个假想多层中的一个对应的食谱数据。多个假想多层中的一个最初被假设为实际形成在基底上的多层。根据多个假想多层之一的各种理论厚度，使用多个配方数据中的一个来计算多个理论光谱。将测量的光谱与多个理论光谱进行比较，以确定多层的临时厚度。估计多层的临时厚度的可靠性。当临时厚度的可靠性在允许范围内时，临时厚度作为衬底上的多层的厚度输出。

33. 发明申请

US20050127292A1 Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的关键尺寸的方法，系统和计算机程序产品
公开(公告)号：US20050127292A1
公开(公告)日：2005-06-16
申请号：US11008477
申请日：2004-12-09
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： H01L21/66 , G01Q10/04 , H01J37/22 , H01J37/28 , H01L21/027
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

34. 发明申请

US20050041255A1 Apparatus and method for measuring each thickness of a multilayer stacked on a substrate 失效
公开(公告)号：US20050041255A1
公开(公告)日：2005-02-24
申请号：US10914149
申请日：2004-08-10
申请人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
发明人： Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
IPC分类号： G01B11/06 , H01L21/66 , G01B9/02
CPC分类号： G01B11/0641
摘要： In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each corresponding to one of a plurality of hypothetical multilayers, is stored. One of the plurality of hypothetical multilayers is initially assumed to be the multilayer actually formed on the substrate. A plurality of theoretical spectra is calculated using one of the plurality of recipe data in accordance with various theoretical thicknesses of one of the plurality of hypothetical multilayers. The measured spectrum is compared with the plurality of theoretical spectra to determine a temporary thickness of the multilayer. A reliability of the temporary thickness of the multilayer is estimated. The temporary thickness is output as a thickness of the multilayer on the substrate when the reliability of the temporary thickness is within an allowable range.

35. 发明授权

US07923684B2 Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的关键尺寸的方法，系统和计算机程序产品
公开(公告)号：US07923684B2
公开(公告)日：2011-04-12
申请号：US12274471
申请日：2008-11-20
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

36. 发明申请

US20090085482A1 Method of Manufacturing Barrier Rib for Plasma Display Panel 有权
标题翻译：等离子显示屏制造障肋的方法
公开(公告)号：US20090085482A1
公开(公告)日：2009-04-02
申请号：US11918221
申请日：2006-02-03
申请人： Byeong-Soo Bae , Jung-Hwan Kim , Ji-Hoon Ko , Kyung-Ho Jung
发明人： Byeong-Soo Bae , Jung-Hwan Kim , Ji-Hoon Ko , Kyung-Ho Jung
IPC分类号： H01J17/49 , B29C35/08
CPC分类号： H01J9/242 , H01J2211/36
摘要： Disclosed herein is a method of manufacturing a barrier rib for a plasma display panel, including a silicon compound resin. The method according to a first embodiment of this invention includes providing a silicon compound resin layer on a substrate; pressing the silicon compound resin layer using a master having a pattern corresponding to the shape of a barrier rib to be transferred; and curing the silicon compound resin and then releasing the master. In addition, the method according to a second embodiment includes loading a silicon compound resin into grooves of a master having a pattern corresponding to the shape of a barrier rib; pressing the master on a substrate to transfer the silicon compound to the substrate; and curing the transferred silicon compound resin and then releasing the master.
摘要翻译：本文公开了一种制造包括硅化合物树脂的等离子体显示面板的隔壁的方法。根据本发明的第一实施方案的方法包括在基材上提供硅化合物树脂层; 使用具有对应于要传送的障壁的形状的图案的主体来压制硅化合物树脂层; 并固化硅化合物树脂，然后释放母料。此外，根据第二实施例的方法包括将硅化合物树脂加载到具有对应于障壁形状的图案的母版的凹槽中; 将基板压在基板上以将硅化合物转印到基板上; 并固化转移的硅化合物树脂，然后释放母料。

37. 发明申请

US20090077696A1 Methods, Systems and Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的临界尺寸的方法，系统和计算机程序产品
公开(公告)号：US20090077696A1
公开(公告)日：2009-03-19
申请号：US12274471
申请日：2008-11-20
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： G01N13/10 , G01N23/00 , G06K9/00
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

38. 发明授权

US07468512B2 Computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的关键尺寸的计算机程序产品
公开(公告)号：US07468512B2
公开(公告)日：2008-12-23
申请号：US11426713
申请日：2006-06-27
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

39. 发明申请

US20090311441A1 FABRICATION METHOD OF MICRO-OPTICAL ELEMENTS USING PHOTOIMAGEABLE HYBRID MATERIALS 审中-公开
标题翻译：使用可光化混合材料的微光学元件的制造方法
公开(公告)号：US20090311441A1
公开(公告)日：2009-12-17
申请号：US12376088
申请日：2007-02-23
申请人： Byeong-Soo Bae , Dong-Jun Kang , Kyung-Ho Jung
发明人： Byeong-Soo Bae , Dong-Jun Kang , Kyung-Ho Jung
IPC分类号： B05D3/06
CPC分类号： G02B5/1876 , G02B5/1847
摘要： The present invention provides with a method for fabricating micro- optical elements comprising: forming a photoimageable hybrid coating layer containing oligo-siloxane containing a polymerizable organic functional group, a photoactive monomer capable of forming a polymer or/and a photochemical initiator monomer initiating polymerization by forming a dimer at the time of illuminating a light on a substrate; and forming a micro-optical element having the structure of a desired shape by illuminating a light on the photoimageable hybrid coating layer.
摘要翻译：本发明提供了一种制造微光学元件的方法，包括：形成含有可聚合有机官能团的低聚硅氧烷的光可成像混合涂层，能够形成聚合物的光活性单体或/和光化学引发剂单体引发聚合反应在照射基板上的光时形成二聚体; 以及通过照射可光成像的混合涂层上的光来形成具有所需形状的结构的微光学元件。

40. 发明申请

US20060231753A1 Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles 有权
标题翻译：计算机程序产品用于使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的临界尺寸
公开(公告)号：US20060231753A1
公开(公告)日：2006-10-19
申请号：US11426713
申请日：2006-06-27
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

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