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    • 37. 发明授权
    • Plating
    • 电镀
    • US07090750B2
    • 2006-08-15
    • US10228505
    • 2002-08-26
    • Salman AkramDavid R. Hembree
    • Salman AkramDavid R. Hembree
    • C25D17/00
    • H01L21/67086C25D5/08C25D17/001C25F7/00H01L21/67051H01L21/67057H01L21/6708
    • An apparatus and method for treating a substrate to deposit, clean or etch material on a substrate using a first horizontal chuck to which a plurality of substrates is attached and electrically charged. Spaced closely to the first horizontal chuck is a coextensive horizontal second chuck which receives and showers reaction solution over all portions of each substrate. During the reaction process, both chucks are substantially submerged in reaction solution within a tank. At least one of the chucks is attached and controllable from a control arm. At least one of the chucks is rotated about a vertical axis at a slow speed during the reaction process. The axes of rotation of the two chucks may be coincident, or the axes may be offset from each other, and/or one or both axes may be offset from the chuck centerpoint(s). One of the chucks may also be periodically moved in a vertical direction relative to the other chuck.
    • 一种用于使用第一水平卡盘处理衬底以沉积,清洁或蚀刻衬底上的材料的装置和方法,多个衬底附着并带电的第一水平卡盘。 与第一个水平卡盘密切相邻的是一个共同延伸的水平第二卡盘,它在每个基板的所有部分上接收和反射反应溶液。 在反应过程中,两个卡盘基本上浸没在罐内的反应溶液中。 至少一个卡盘从控制臂附接和控制。 在反应过程中,至少一个卡盘以垂直轴线以慢速旋转。 两个卡盘的旋转轴线可以重合,或者轴线可能彼此偏移,和/或一个或两个轴线可能偏离卡盘中心点。 其中一个卡盘也可以相对于另一个卡盘在垂直方向周期性地移动。