会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 35. 发明授权
    • Methods of manufacturing multiple gate CMOS transistors having different gate dielectric materials
    • 制造具有不同栅极电介质材料的多栅极CMOS晶体管的方法
    • US07462538B2
    • 2008-12-09
    • US11273747
    • 2005-11-15
    • Hong-Jyh LiThomas Schulz
    • Hong-Jyh LiThomas Schulz
    • H01L21/336H01L29/80
    • H01L21/823857H01L21/823821H01L21/845H01L27/1211H01L29/4908H01L29/66795H01L29/785H01L29/78645
    • Semiconductor devices with transistors having different gate dielectric materials and methods of manufacture thereof are disclosed. One embodiment includes a semiconductor device including a workpiece, the workpiece including a first region and a second region proximate the first region. A first transistor is disposed in the first region of the workpiece, the first transistor having at least two first gate electrodes. A first gate dielectric is disposed proximate each of the at least two first gate electrodes, the first gate dielectric comprising a first material. A second transistor is disposed in the second region of the workpiece, the second transistor having at least two second gate electrodes. A second gate dielectric is disposed proximate each of the at least two second gate electrodes, the second gate dielectric comprising a second material. The second material is different than the first material.
    • 公开了具有不同栅介电材料的晶体管的半导体器件及其制造方法。 一个实施例包括包括工件的半导体器件,所述工件包括第一区域和靠近第一区域的第二区域。 第一晶体管设置在工件的第一区域中,第一晶体管具有至少两个第一栅电极。 第一栅极电介质设置在所述至少两个第一栅电极中的每一个附近,所述第一栅极电介质包括第一材料。 第二晶体管设置在工件的第二区域中,第二晶体管具有至少两个第二栅电极。 第二栅极电介质设置在所述至少两个第二栅电极中的每一个附近,所述第二栅极电介质包括第二材料。 第二种材料与第一种材料不同。