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    • 31. 发明授权
    • Method for chip testing
    • 芯片测试方法
    • US06730529B1
    • 2004-05-04
    • US09236183
    • 1999-01-25
    • Howard L. KalterH. Bernhard PoggeGeorge S. ProkopDonald L. Wheater
    • Howard L. KalterH. Bernhard PoggeGeorge S. ProkopDonald L. Wheater
    • G01R3126
    • H01L22/32G01R31/2884
    • Large area chip functionality is tested at an intermediate level in the manufacturing process. A process sequence is implemented in which a layer of insulator material is deposited over the chip. This layer is then processed to selectively open areas over existing vias which are to be used for chip level testing. The other vias remain covered with insulator. A sacrificial metal level is then deposited on the insulator layer and patterned to create adequately large test pad areas connected to exposed vias. This metal layer and the insulator layer covering the other buried vias are removed after testing to re-establish the full via set. As an extension to this basic test process, test circuits can be formed around or beside the chip to be tested in the kerf areas separating the chip from other chips on the semiconductor wafer. Connections to the test circuits is with a sacrificial metal layer over an insulator layer. The sacrificial metal layer and insulator layer are removed after testing. The test circuits are scribed off in the process of separating the chips after back end of line processing is completed.
    • 大面积芯片功能在制造过程的中间级别进行测试。 实现了在芯片上沉积绝缘体材料层的工艺顺序。 然后将该层处理成选择性地打开将用于芯片级测试的现有通孔上的区域。 其他通孔仍然用绝缘体覆盖。 然后将牺牲金属水平沉积在绝缘体层上并图案化以产生连接到暴露的通孔的足够大的测试焊盘区域。 在测试之后,该金属层和覆盖另一埋孔的绝缘体层被重新建立完整的通孔。 作为这个基本测试过程的延伸,测试电路可以在将芯片与半导体晶片上的其他芯片分开的切口区域中围绕或测试芯片周围形成。 与测试电路的连接在绝缘体层上具有牺牲金属层。 测试后去除牺牲金属层和绝缘体层。 在线路处理后端完成之后分离芯片的过程中,划线测试电路。
    • 32. 发明授权
    • Multi-level dram trench store utilizing two capacitors and two plates
    • 使用两个电容器和两个电路板的多层次的沟渠商店
    • US06429080B2
    • 2002-08-06
    • US09793517
    • 2001-02-27
    • Toshiharu FurukawaDavid V. HorakHoward L. Kalter
    • Toshiharu FurukawaDavid V. HorakHoward L. Kalter
    • H01L21336
    • G11C11/565G11C11/404H01L27/108H01L27/10864H01L27/1087H01L27/10882
    • A multi-level memory cell capable of storing two or three bits of digital data occupies only four lithographic squares and requires only one or two logic level voltage sources, respectively. High noise immunity derives from integration of the multi-level signal in the memory cell directly from logic level digital signals applied to two capacitors (as well as the bit line for the eight level mode of operation) by using capacitors having different values in order to avoid digital-to-analog conversion during writing. The capacitors can be simultaneously written and read to reduce memory cycle time. Transistor channels and capacitor connections are formed on adjacent semiconductor pillars using plugs of semiconductor material between pillars as common gate structures and connections. Opposite surfaces of the pillars also serve as storage nodes with common capacitor plates formed by conformal deposition between rows of plugs and pillars.
    • 能够存储两位或三位数字数据的多级存储器单元仅占用四个光刻平面,并且仅分别仅需要一个或两个逻辑电平电压源。 通过使用具有不同值的电容器,可以直接从施加到两个电容器的逻辑电平数字信号(以及八电平工作模式的位线)将存储单元中的多电平信号集成到高抗噪声性能 避免在写入过程中进行数模转换。 电容器可以同时写入和读取,以减少存储周期时间。 晶体管通道和电容器连接使用在柱之间的半导体材料的塞子作为公共栅极结构和连接形成在相邻的半导体柱上。 支柱的相对表面还用作具有通过塞子和柱之间的共形沉积形成的公共电容器板的存储节点。
    • 33. 发明授权
    • Multi-level DRAM trench store utilizing two capacitors and two plates
    • 使用两个电容器和两个板的多级DRAM沟槽存储器
    • US06282115B1
    • 2001-08-28
    • US09469275
    • 1999-12-22
    • Toshiharu FurukawaDavid V. HorakHoward L. Kalter
    • Toshiharu FurukawaDavid V. HorakHoward L. Kalter
    • G11C1124
    • G11C11/565G11C11/404H01L27/108H01L27/10864H01L27/1087H01L27/10882
    • A multi-level memory cell capable of storing two or three bits of digital data occupies only four lithographic squares and requires only one or two logic level voltage sources, respectively. High noise immunity derives from integration of the multi-level signal in the memory cell directly from logic level digital signals applied to two capacitors (as well as the bit line for the eight level mode of operation) by using capacitors having different values in order to avoid digital-to-analog conversion during writing. The capacitors can be simultaneously written and read to reduce memory cycle time. Transistor channels and capacitor connections are formed on adjacent semiconductor pillars using plugs of semiconductor material between pillars as common gate structures and connections. Opposite surfaces of the pillars also serve as storage nodes with common capacitor plates formed by conformal deposition between rows of plugs and pillars.
    • 能够存储两位或三位数字数据的多级存储器单元仅占用四个光刻平面,并且仅分别仅需要一个或两个逻辑电平电压源。 通过使用具有不同值的电容器,可以直接从施加到两个电容器的逻辑电平数字信号(以及八电平工作模式的位线)将存储单元中的多电平信号集成到高抗噪声性能 避免在写入过程中进行数模转换。 电容器可以同时写入和读取,以减少存储周期时间。 晶体管通道和电容器连接使用在柱之间的半导体材料的塞子作为公共栅极结构和连接形成在相邻的半导体柱上。 支柱的相对表面还用作具有通过塞子和柱之间的共形沉积形成的公共电容器板的存储节点。
    • 36. 发明授权
    • Method for chip testing
    • 芯片测试方法
    • US5899703A
    • 1999-05-04
    • US827207
    • 1997-03-28
    • Howard L. KalterH. Bernhard PoggeGeorge S. ProkopDonald L. Wheater
    • Howard L. KalterH. Bernhard PoggeGeorge S. ProkopDonald L. Wheater
    • G01R31/28H01L23/58G01R31/26H01L21/66
    • H01L22/32G01R31/2884
    • Large area chip functionality is tested at an intermediate level in the manufacturing process. A process sequence is implemented in which a layer of insulator material is deposited over the chip. This layer is then processed to selectively open areas over existing vias which are to be used for chip level testing. The other vias remain covered with insulator. A sacrificial metal level is then deposited on the insulator layer and patterned to create adequately large test pad areas connected to exposed vias. This metal layer and the insulator layer covering the other buried vias are removed after testing to re-establish the full via set. As an extension to this basic test process, test circuits can be formed around or beside the chip to be tested in the kerf areas separating the chip from other chips on the semiconductor wafer. Connections to the test circuits is with a sacrificial metal layer over an insulator layer. The sacrificial metal layer and insulator layer are removed after testing. The test circuits are scribed off in the process of separating the chips after back end of line processing is completed.
    • 大面积芯片功能在制造过程的中间级别进行测试。 实现了在芯片上沉积绝缘体材料层的工艺顺序。 然后将该层处理成选择性地打开将用于芯片级测试的现有通孔上的区域。 其他通孔仍然用绝缘体覆盖。 然后将牺牲金属水平沉积在绝缘体层上并图案化以产生连接到暴露的通孔的足够大的测试焊盘区域。 在测试之后,该金属层和覆盖另一埋孔的绝缘体层被重新建立完整的通孔。 作为这个基本测试过程的延伸,测试电路可以在将芯片与半导体晶片上的其他芯片分开的切口区域中围绕或测试芯片周围形成。 与测试电路的连接在绝缘体层上具有牺牲金属层。 测试后去除牺牲金属层和绝缘体层。 在线路处理后端完成之后分离芯片的过程中,划线测试电路。