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31. 发明申请

US20080311344A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US20080311344A1
公开(公告)日：2008-12-18
申请号：US11808922
申请日：2007-06-13
申请人： Antoine Gaston Marie Kiers , Arie Jeffrey Den Boef , Maurits Van Der Schaar
发明人： Antoine Gaston Marie Kiers , Arie Jeffrey Den Boef , Maurits Van Der Schaar
IPC分类号： B32B3/10 , B32B7/02 , B41L17/00 , G01N21/01 , G01N23/20
CPC分类号： G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70633 , Y10T428/24331 , Y10T428/24942
摘要： An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic array is desirably made of two interlaced gratings, one of the gratings having a different pitch from the other grating in order to create an asymmetry in the array. This asymmetry can then be measured by measuring the diffraction spectra of radiation reflected from the overlay target. Variation in the asymmetry indicates the presence of an overlay error in layers on the substrate, where overlay targets are printed on subsequent layers.
摘要翻译：公开了一种在衬底上的覆盖目标，覆盖目标包括周期性结构阵列，其中每第n个结构与其余结构不同。期望地由两个隔行光栅制成周期阵列，其中一个光栅与另一个光栅具有不同的间距，以便在阵列中产生不对称性。然后可以通过测量从覆盖目标反射的辐射的衍射光谱来测量该不对称性。不对称性的变化表示衬底上存在覆盖层错误，其中覆盖目标印刷在后续层上。

32. 发明申请

US20080212097A1 Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell 有权
标题翻译：检查方法，制造方法，检查装置，基板，掩模，光刻装置和平版印刷电池
公开(公告)号：US20080212097A1
公开(公告)日：2008-09-04
申请号：US11712556
申请日：2007-03-01
申请人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Each target used in a method of measuring overlay using a scatterometer includes a first portion and a second portion, the first portion has features varying only in a first direction and the second portion has features only varying in a second direction. The first and second directions are orthogonal, thus eliminating cross talk between the directions, and improving the accuracy of overlay error calculations.
摘要翻译：在使用散射仪测量覆盖层的方法中使用的每个目标包括第一部分和第二部分，第一部分具有仅在第一方向上变化的特征，并且第二部分具有仅在第二方向上变化的特征。第一和第二方向是正交的，从而消除了方向之间的串扰，并提高了重叠误差计算的准确性。

33. 发明申请

US20080128644A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US20080128644A1
公开(公告)日：2008-06-05
申请号：US11606376
申请日：2006-11-30
申请人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Thomas Leo Maria Hoogenboom
发明人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Thomas Leo Maria Hoogenboom
IPC分类号： G01V8/00
CPC分类号： G03F7/70991 , G03F7/70525 , G03F7/70533 , G03F7/70625 , G03F7/70633 , G03F9/7046
摘要： A fault detection and classification method is disclosed that uses raw back-focal-plane image data of radiation from a substrate surface, detected by a scatterometer detector, to determine a variation in the raw data and correlate the variation in the raw data with a possible fault in a lithographic apparatus or a process that patterned the substrate surface. The correlation is carried out by comparing the variation in the raw data with known metrology data. Once a fault has been determined, a user may be notified of the fault.
摘要翻译：公开了一种故障检测和分类方法，其使用由散射仪检测器检测的来自衬底表面的辐射的原始背焦平面图像数据来确定原始数据的变化并将原始数据的变化与可能的原始数据相关联光刻设备中的故障或图案化衬底表面的工艺。通过将原始数据的变化与已知计量数据进行比较来进行相关性。一旦确定故障，就可以向用户通知故障。

34. 发明申请

US20080074666A1 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US20080074666A1
公开(公告)日：2008-03-27
申请号：US11526243
申请日：2006-09-25
申请人： Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Both the 1st and 0th diffraction orders are detected in a scatterometer. The 1st diffraction orders are used to detect the overlay error. The 0th diffraction order is then used to flag if this is a false overlay error calculation of magnitude greater than the bias but smaller than the pitch of the grating.
摘要翻译：在散射仪中都检测到第1和第0和第0衍射级。 1＆lt; ST＆gt;衍射级用于检测重叠误差。然后，使用第0 衍射级标记，如果这是大于偏置但小于光栅间距的误差重叠误差计算。

35. 发明申请

US20080036984A1 Method and apparatus for angular-resolved spectroscopic lithography characterization 审中-公开
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US20080036984A1
公开(公告)日：2008-02-14
申请号：US11500494
申请日：2006-08-08
申请人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
发明人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G01N21/4788 , G01N21/95607 , G03F7/70516 , G03F7/70616 , G03F7/70633
摘要： A combined alignment and overlay target to be applied to a substrate to enable measurement of the alignment of the substrate with respect to its surroundings, and measurement of the relative alignment of a series of layers on the substrate, is disclosed. In an embodiment, the target comprises an array of structures substantially equidistant apart except for a portion of the structures that are offset by a specific amount in a first direction, and a second portion of the structures that are offset by the same amount in the opposite direction. This target on the substrate may be used to measure its alignment and the same target applied to a second layer, superposed on a first layer, may be used to measure overlay.
摘要翻译：公开了一种组合的对准和覆盖目标，其被施加到衬底以使得能够相对于其周围环境对衬底的对准进行测量，并且测量衬底上的一系列层的相对对准。在一个实施例中，目标包括基本上等距离的结构的阵列，除了在第一方向上偏移了特定量的结构的一部分，以及在相反的位置上被相同量偏移的结构的第二部分方向。衬底上的该目标可以用于测量其对准，并且应用于叠加在第一层上的第二层的相同目标可用于测量覆盖层。

36. 发明授权

US08908147B2 Method and apparatus for determining an overlay error 有权
标题翻译：用于确定覆盖误差的方法和装置
公开(公告)号：US08908147B2
公开(公告)日：2014-12-09
申请号：US13181932
申请日：2011-07-13
申请人： Arie Jeffrey Den Boef , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans , Kaustuve Bhattacharyya , Stephen Peter Morgan , Michael Kubis
发明人： Arie Jeffrey Den Boef , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans , Kaustuve Bhattacharyya , Stephen Peter Morgan , Michael Kubis
IPC分类号： G03F7/20 , A01H1/06 , G03B27/52 , G03B27/53 , A01G1/00 , C12N15/82
CPC分类号： A01H1/06 , A01G22/00 , C12N15/8201 , G03B27/52 , G03B27/53 , G03F7/705 , G03F7/70633
摘要： A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.
摘要翻译：确定重叠错误的方法。测量具有过程引起的不对称性的覆盖目标。构建目标模型。修改模型，例如通过移动结构之一来补偿不对称性。使用修改的模型计算不对称引起的覆盖误差。通过从测量的重叠错误中减去不对称引起的覆盖误差来确定生产目标中的重叠错误。在一个示例中，通过改变不对称p（n'），p（n“）来修改模型，并且针对多个散射仪测量配方重复计算不对称引起的重叠误差，并且确定在生产目标使用计算的不对称引起的重叠误差来选择用于测量生产目标的最佳散射仪测量配方。

37. 发明授权

US08553230B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US08553230B2
公开(公告)日：2013-10-08
申请号：US13249566
申请日：2011-09-30
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01B9/02
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译：通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

38. 发明申请

US20130059240A1 Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method 有权
标题翻译：用于计量，计量方法和器件制造方法的基板和图案化装置
公开(公告)号：US20130059240A1
公开(公告)日：2013-03-07
申请号：US13401882
申请日：2012-02-22
申请人： Maurits Van Der Schaar , Patrick Warnaar , Kaustuve Bhattacharyya , Hendrik Jan Hidde Smilde , Michael Kubis
发明人： Maurits Van Der Schaar , Patrick Warnaar , Kaustuve Bhattacharyya , Hendrik Jan Hidde Smilde , Michael Kubis
IPC分类号： G01B11/14 , G03F7/20 , G03B27/00
CPC分类号： G03F9/7042 , G03F7/70616 , G03F7/70633 , G03F7/70683 , H01L23/544 , H01L23/58 , H01L2924/0002 , H01L2924/00
摘要： A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.
摘要翻译：来自图案形成装置的图案通过光刻装置施加到基板。应用模式包括产品功能和计量目标。测量目标包括大目标和小目标，用于测量覆盖。一些较小的目标分布在较大目标之间的位置，而其他小目标则放置在与大目标相同的位置。通过比较在相同位置使用小目标和大目标测量的值，可以校正使用所有小目标测量的参数值以获得更高的精度。大型目标主要位于划线范围内，而小目标则分布在产品区域内。

39. 发明申请

US20110292365A1 Calibration Method, Inspection Method and Apparatus, Lithographic Apparatus, and Lithographic Processing Cell 有权
标题翻译：校准方法，检验方法和装置，平版印刷设备和平版印刷加工单元
公开(公告)号：US20110292365A1
公开(公告)日：2011-12-01
申请号：US13132011
申请日：2009-12-01
申请人： Hugo Augustinus Joseph Cramer , Maurits Van Der Schaar
发明人： Hugo Augustinus Joseph Cramer , Maurits Van Der Schaar
IPC分类号： G03B27/54 , G01N21/00
CPC分类号： G03F7/70633 , G01N21/4785 , G03F7/70516 , G03F7/70616 , G03F7/70625
摘要： Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of different measurements, a residual error indicative of the error in a scatterometer may be calculated. This error is an error in measurements of substrate parameters caused by irregularities of the scatterometer. The residual error may manifest itself as an asymmetry in the diffraction spectra.
摘要翻译：公开了用于校准检查装置的方法，装置和光刻系统。辐射被投影到基板的目标位置的图案上。通过对图案进行多次测量并比较从不同测量图案反射的辐射的测量的第一或更高的衍射级数，可以计算指示散射仪中的误差的残差。该误差是由散射仪的不规则引起的衬底参数的测量误差。残余误差可能表现为衍射光谱中的不对称性。

40. 发明申请

US20110255066A1 Apparatus and Method for Inspecting a Substrate 有权
标题翻译：用于检查基板的装置和方法
公开(公告)号：US20110255066A1
公开(公告)日：2011-10-20
申请号：US12996211
申请日：2009-06-04
申请人： Andreas Fuchs , Maurits Van Der Schaar
发明人： Andreas Fuchs , Maurits Van Der Schaar
IPC分类号： G03B27/74 , G03B27/32 , G01B11/14
CPC分类号： G03F7/70633
摘要： An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (−d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation. Further, a module is configured to determine an overlay value for each first target based on at least the obtained asymmetry value and the predetermined offsets and determine a polynomial fit across a plurality of first targets of a corresponding plurality of fields of the substrate for a relationship between the obtained asymmetry value and determined overlay value of each first target.
摘要翻译：一种装置测量分成多个场的衬底的性质，例如覆盖误差。该装置包括被配置为将辐射引导到衬底的每个场的第一靶上的辐射源。每个第一目标（T4G）具有至少第一光栅和具有相应预定偏移的第二光栅，第一光栅的预定偏移（+ d）在与第二光栅的预定偏移（-d）相反的方向上。检测器被配置为检测从每个第一目标反射的辐射，并且从检测到的辐射获得每个第一目标的不对称值。此外，模块被配置为基于至少所获得的不对称值和预定偏移来确定每个第一目标的覆盖值，并且确定跨越衬底的相应多个场的多个第一目标的多项式拟合，以获得关系在获得的不对称值和确定的每个第一目标的覆盖值之间。

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