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31. 发明授权

US08043787B2 Negative-working imageable elements with improved abrasion resistance 有权
标题翻译：具有改善耐磨性的负性可成像元件
公开(公告)号：US08043787B2
公开(公告)日：2011-10-25
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/00 , G03F7/26
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

32. 发明申请

US20110155009A1 PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 审中-公开
标题翻译：在完成溶液中加工具有疏水性聚合物的平版印刷板
公开(公告)号：US20110155009A1
公开(公告)日：2011-06-30
申请号：US12742459
申请日：2008-11-19
申请人： Bernd Strehmel , Christopher D. Simpson , Oliver Piestert , Harald Baumann
发明人： Bernd Strehmel , Christopher D. Simpson , Oliver Piestert , Harald Baumann
IPC分类号： B41N1/14 , B41N3/00
CPC分类号： B41N3/08 , G03F7/40
摘要： Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt. %, based on the total weight of the finisher, of a hydrophilic polymer comprising: (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from —COOH, —SO3H, —PO2H2 and PO3H2, and (m3) optionally alkylene oxide units —(CHR1—CH2—O)P—, wherein each R1 independently represents H or —CH3 and p is an integer from 1 to 50.
摘要翻译：制备平版印刷版的方法，包括（a）提供平版印刷版原版，其包含（i）基底; （ii）包含一层或多层的辐射敏感涂层和（iii）任选的不透氧外涂层; （b）将平版印刷版前体成像曝光于对辐射敏感涂层敏感的波长的辐射; （c）任选地使成像曝光的前体经受预热处理和/或用水冲洗; （d）通过碱性显影剂溶液从图像曝光的前体中除去非图像区域; （e）任选地使步骤（d）中获得的成像前体用水冲洗; （f）用整理剂溶液处理步骤（d）或（e）中获得的成像平版印刷版; 和（g）任选地将步骤（f）中获得的整理剂处理的板处理至少一个选自用水冲洗，干燥和烘烤的其它工艺步骤; 其特征在于整理剂溶液含有0.01至15wt。（m1）伯，仲和/或叔氨基和（m2）选自-COOH，-SO 3 H，-P 2 H 2和PO 3 H 2的酸基的亲水性聚合物，以及（m3）任选的环氧烷单元 - （CHR1-CH2-O）P-，其中每个R1独立地表示H或-CH3，p是1至50的整数。

33. 发明授权

US07858292B2 Imageable elements with components having 1H-tetrazole groups 有权
标题翻译：具有1H-四唑基团的成像元件
公开(公告)号：US07858292B2
公开(公告)日：2010-12-28
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

34. 发明申请

US20100304304A1 METHOD FOR MAKING LITHOGRAPHIC PLATES 有权
标题翻译：制作平板的方法
公开(公告)号：US20100304304A1
公开(公告)日：2010-12-02
申请号：US12677904
申请日：2008-09-24
申请人： Oliver Piestert , Harald Baumann , Ulrich Fiebag , Bernd Strehmel , Uwe Tondock , Philip Watkiss
发明人： Oliver Piestert , Harald Baumann , Ulrich Fiebag , Bernd Strehmel , Uwe Tondock , Philip Watkiss
IPC分类号： G03F7/20
CPC分类号： G03F7/322
摘要： Method for producing an imaged lithographic printing plate comprising the step of developing an imagewise exposed negative working precursor with a developer comprising an alkylene oxide derivative of formula (A), wherein R1 is a linear or branched C1 to C6 alkyl group or H, (n+m) is an integer from 2 to 30, and R2 R3 R4 and R5 are each independently selected from H, methyl and ethyl, with the proviso that at least one of R2 and R3 is not H, and with the further proviso that at least one of R4 and R5 is not H.
摘要翻译：一种成像平版印刷版的制造方法，其特征在于，包括用含有式（A）的烯化氧衍生物的显色剂显影成像曝光的负性前体的步骤，其中R1是直链或支链C1至C6烷基或H（n + m）是2至30的整数，并且R 2 R 3 R 4和R 5各自独立地选自H，甲基和乙基，条件是R 2和R 3中的至少一个不是H，条件是在 R4和R5中的至少一个不是H.

35. 发明申请

US20100015556A1 NEGATIVE-WORKING IMAGING ELEMENTS AND METHODS OF USE 失效
标题翻译：负面工作成像元素和使用方法
公开(公告)号：US20100015556A1
公开(公告)日：2010-01-21
申请号：US12173220
申请日：2008-07-15
申请人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Christopher D. Simpson , Bernd Strehmel , Michael Flugel
IPC分类号： G03F7/26 , B41N1/00
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1:1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译：负面工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。

36. 发明申请

US20090233227A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 有权
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：US20090233227A1
公开(公告)日：2009-09-17
申请号：US12048452
申请日：2008-03-14
申请人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
发明人： Gerhard Hauck , Celin Savariar-Hauck , Udo Dwars , Harald Baumann , Bernd Strehmel , Christopher D. Simpson
IPC分类号： G03F7/004 , G03F7/12
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

37. 发明申请

US20090202948A1 METHOD FOR DEVELOPING AND SEALING OF LITHOGRAPHIC PRINTING PLATES 有权
标题翻译：用于开发和密封平版印刷板的方法
公开(公告)号：US20090202948A1
公开(公告)日：2009-08-13
申请号：US12438160
申请日：2007-09-18
申请人： Christopher D. Simpson , Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Mathias Jarek
发明人： Christopher D. Simpson , Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Mathias Jarek
IPC分类号： G03F7/20
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/322
摘要： A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound copolymerizable with the free radical polymerizable group of (i) and comprising at least one functional group with pKs
摘要翻译：描述了一种用于生产成像平版印刷版的方法，其中显影剂包括亲水性聚合物，其包含（m1）衍生自至少一种包含聚环氧烷链和自由基可聚合基团的化合物的结构单元，和（m2）结构单元衍生自可与（i）的自由基可聚合基团共聚的至少一种化合物，并且包含至少一个pK <5的官能团。

38. 发明申请

US20090142695A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 有权
标题翻译：具有1H-四唑基的组分的成像元素
公开(公告)号：US20090142695A1
公开(公告)日：2009-06-04
申请号：US11949810
申请日：2007-12-04
申请人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
发明人： Harald Baumann , Udo Dwars , Bernd Strehmel , Christopher D. Simpson , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F7/028 , G03F7/30
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

39. 发明授权

US07524613B2 Material for the treatment of lithographic substrates and lithographic printing plates 失效
标题翻译：用于处理平版印刷基板和平版印刷版的材料
公开(公告)号：US07524613B2
公开(公告)日：2009-04-28
申请号：US11813678
申请日：2006-01-12
申请人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
发明人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
IPC分类号： G03C1/76 , G03F7/09 , G03F7/11 , G03F7/40 , C08G77/30
CPC分类号： C08G77/30 , B41N1/083 , B41N1/086 , B41N1/14 , B41N3/038 , B41N3/08 , C08G77/395 , C08K5/5406 , Y10S430/145
摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
摘要翻译：膦酰取代的硅氧烷适用于平版印刷基板中的中间层材料，并用于后处理显影的平版印刷版，其通过使（a）通式（I）的第一有机硅化合物和（b）第二有机硅化合物与通式（二）。

40. 发明申请

US20080206666A1 Material For The Treatment Of Lithographic Substrates And Lithographic Printing Plates 失效
标题翻译：用于光刻基板和平版印刷板的处理材料
公开(公告)号：US20080206666A1
公开(公告)日：2008-08-28
申请号：US11813678
申请日：2006-01-12
申请人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
发明人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
IPC分类号： B32B13/04 , G03F7/004
CPC分类号： C08G77/30 , B41N1/083 , B41N1/086 , B41N1/14 , B41N3/038 , B41N3/08 , C08G77/395 , C08K5/5406 , Y10S430/145
摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
摘要翻译：膦酰取代的硅氧烷适用于平版印刷基板中的中间层材料，并用于后处理显影的平版印刷版，其通过使（a）通式（I）的第一有机硅化合物和（b）第二有机硅化合物与通式（二）。

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