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31. 发明申请

US20110170078A1 Projection System and Lithographic Apparatus 有权
标题翻译：投影系统和平版印刷设备
公开(公告)号：US20110170078A1
公开(公告)日：2011-07-14
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

32. 发明申请

US20110122376A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110122376A1
公开(公告)日：2011-05-26
申请号：US12796482
申请日：2010-06-08
申请人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/52 , G03B27/60
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译：光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

33. 发明申请

US20110096311A1 LITHOGRAPHIC APPARATUS AND PATTERNING DEVICE 有权
标题翻译：平面设备和图案设备
公开(公告)号：US20110096311A1
公开(公告)日：2011-04-28
申请号：US12913539
申请日：2010-10-27
申请人： Hans BUTLER , Erik Roelof Loopstra
发明人： Hans BUTLER , Erik Roelof Loopstra
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03F7/70358 , G03F7/70516
摘要： A lithographic apparatus includes a support to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus includes a projection transfer measurement system to measure an optical projection transfer information of the projection system. The projection transfer measurement arrangement includes: an optical device to direct a measurement beam into the projection system during a scanning movement, a detector to detect the measurement beam having passed through the projection system during the scanning movement, and a measurement processor to determine the optical projection transfer information from the detected measurement beam. The optical device and the detector are arranged at an upstream end of the projection system.
摘要翻译：光刻设备包括支撑件以支撑图案形成装置，图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，构造成保持衬底的衬底台和投影系统被配置为将所述图案化的辐射束投影到所述基板的目标部分上。光刻设备包括用于测量投影系统的光学投影传递信息的投影传递测量系统。投影传送测量装置包括：在扫描运动期间将测量光束引导到投影系统中的光学装置，用于检测在扫描运动期间通过投影系统的测量光束的检测器，以及用于确定光学器件的测量处理器来自检测的测量光束的投影传送信息。光学装置和检测器布置在投影系统的上游端。

34. 发明授权

US07804579B2 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product 有权
标题翻译：控制系统，光刻投影装置，控制支撑结构的方法以及计算机程序产品
公开(公告)号：US07804579B2
公开(公告)日：2010-09-28
申请号：US11812817
申请日：2007-06-21
申请人： Erik Roelof Loopstra , Engelbertus Antonlus Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Engelbertus Antonlus Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32 , G01B11/00 , G01B11/14
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.
摘要翻译：提供了一种用于控制光刻设备中的支撑结构的控制系统。控制系统包括第一测量系统，其布置成测量由支撑结构支撑的基板的位置，该位置在第一坐标系中被测量。所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置，基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构误差信号。

35. 发明授权

US07804575B2 Lithographic apparatus and device manufacturing method having liquid evaporation control 有权
标题翻译：具有液体蒸发控制的平版印刷设备和器件制造方法
公开(公告)号：US07804575B2
公开(公告)日：2010-09-28
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

36. 发明申请

US20100231890A1 Device Manufacturing Method, Lithographic Apparatus and a Computer Program 有权
标题翻译：设备制造方法，平版印刷设备和计算机程序
公开(公告)号：US20100231890A1
公开(公告)日：2010-09-16
申请号：US12531230
申请日：2008-03-14
申请人： Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
发明人： Alex Oudshoorn , Roland Blok , Erik Roelof Loopstra , Leon Martin Levasier
IPC分类号： G03B27/32
CPC分类号： G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
摘要翻译：本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。本发明还涉及光刻设备和计算机程序。

37. 发明授权

US07746447B2 Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus 有权
标题翻译：光刻设备，设备制造方法和校准光刻设备的方法
公开(公告)号：US07746447B2
公开(公告)日：2010-06-29
申请号：US11314157
申请日：2005-12-22
申请人： Koen Jacobus Johannes Maria Zaal , Johannes Henricus Wilhelmus Jacobs , Erik Roelof Loopstra , Joost Jeroen Ottens , Frederik Eduard De Jong
发明人： Koen Jacobus Johannes Maria Zaal , Johannes Henricus Wilhelmus Jacobs , Erik Roelof Loopstra , Joost Jeroen Ottens , Frederik Eduard De Jong
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
摘要翻译：浸没式光刻设备具有布置成保持基板的多个基板保持器，每个基板保持器具有用于使温度控制流体通过的导管。对不同衬底保持器的热响应进行校准，并计算和使用流量，以便所有保持器在同一时间内恢复到预定温度。

38. 发明授权

US07724351B2 Lithographic apparatus, device manufacturing method and exchangeable optical element 有权
标题翻译：光刻设备，器件制造方法和可交换光学元件
公开(公告)号：US07724351B2
公开(公告)日：2010-05-25
申请号：US11341894
申请日：2006-01-30
申请人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
发明人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
IPC分类号： G03B27/54 , G03B27/72 , G03B27/52
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译：光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。侧面基本上等于5,6或9英寸。

39. 发明授权

US07616383B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07616383B2
公开(公告)日：2009-11-10
申请号：US10847661
申请日：2004-05-18
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
IPC分类号： G02B3/12
CPC分类号： G03F7/70875 , B05C9/12 , G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
摘要翻译：公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。

40. 发明申请

US20090207397A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090207397A1
公开(公告)日：2009-08-20
申请号：US12411952
申请日：2009-03-26
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号： G03B27/32 , G03B27/60 , G03B27/58
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

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