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31. 发明授权

US5838453A Apparatus and method for measuring optical anisotropy 失效
标题翻译：用于测量光学各向异性的装置和方法
公开(公告)号：US5838453A
公开(公告)日：1998-11-17
申请号：US590814
申请日：1996-01-24
申请人： Yoshinori Ohsaki , Takashi Suzuki
发明人： Yoshinori Ohsaki , Takashi Suzuki
IPC分类号： G01N21/21 , G01N21/55 , G01J4/00
CPC分类号： G01N21/21 , G01N2021/212 , G01N2021/218
摘要： An apparatus for measuring an optical anisotropy of an object to be examined, such as a liquid crystal, based on an interaction of an evanescent wave occurring during total reflection of a beam with the object is disclosed. The apparatus includes a transparent member having a curved surface and a flat surface for mounting an object to be examined thereon; a light source disposed opposite to a first region of the curved surface of the transparent member so as to emit a beam incident through the first region and the transparent member to an outer surface of the object; a polarizer disposed on the emission side of the light source; an incident optical system disposed between the light source and the first region of the curved surface; a photodetector disposed opposite to a second region of the curved surface of the transparent member so as to detect a beam emitted from the light source, totally reflected at a proximity of the outer surface of the object and incident thereto through the second region; and an analyzer disposed between the photodetector and the second region of the curved surface. The object to be examined may be mounted movably on the flat surface of the transparent member via a liquid having a refractive index almost equal to that of the transparent member.
摘要翻译：本发明公开了一种用于测量待检测物体（诸如液晶）的光学各向异性的装置，其基于在与物体的全反射期间发生的ev逝波的相互作用。该装置包括具有弯曲表面的透明构件和用于安装待检测物体的平坦表面; 与所述透明构件的所述曲面的第一区域相对设置的光源，以将通过所述第一区域入射的光束和所述透明构件发射到所述物体的外表面; 设置在所述光源的发射侧的偏振器; 入射光学系统，设置在所述光源与所述曲面的所述第一区域之间; 光检测器，与所述透明构件的所述曲面的第二区域相对设置，以便检测从所述光源发射的光束，所述光束在所述物体的外表面附近经由所述第二区域被入射到其附近; 以及设置在光电检测器和曲面的第二区域之间的分析器。待检查的物体可以经由具有与透明构件的折射率几乎相同的折射率的液体可移动地安装在透明构件的平坦表面上。

32. 发明授权

US08130360B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08130360B2
公开(公告)日：2012-03-06
申请号：US11835035
申请日：2007-08-07
申请人： Shinichiro Hirai , Tetsuya Mori , Seiya Miura , Yoshinori Ohsaki
发明人： Shinichiro Hirai , Tetsuya Mori , Seiya Miura , Yoshinori Ohsaki
IPC分类号： G03B27/68
CPC分类号： G03F9/7034 , G03F9/7026 , G03F9/7088
摘要： An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light, which has passed through the mark, and the image of the mark formed by the measurement light reflected by the mark.
摘要翻译：曝光装置包括图像传感器，测量光学系统，被配置为引导测量光倾斜地进入投影光学系统，并且还将投影光学系统返回的测量光引导到图像传感器;以及控制单元，被配置为基于来自图像传感器的输出来计算基板的表面位置信息。控制单元基于由已经通过标记的测量光形成的在原始台上布置的标记的图像与由该标记形成的标记的图像之间的间隔来计算基板的表面位置信息测量光由标记反射。

33. 发明授权

US08013980B2 Exposure apparatus equipped with interferometer and exposure apparatus using the same 有权
标题翻译：配备有干涉仪的曝光装置和使用其的曝光装置
公开(公告)号：US08013980B2
公开(公告)日：2011-09-06
申请号：US11956747
申请日：2007-12-14
申请人： Yoshinori Ohsaki
发明人： Yoshinori Ohsaki
IPC分类号： G03B27/54 , G03B27/68 , G03B27/42
CPC分类号： G03F7/706
摘要： An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system, wherein the measuring apparatus includes an optical element having opposing first and second surfaces, wherein the first surface has a first measurement pattern, and the second surface has a second measurement pattern and is closer to the projection optical system than the first measurement pattern, and wherein the measuring apparatus introduces light into the projection optical system via first and second measurement patterns.
摘要翻译：曝光装置包括：投影光学系统，用于将曝光图案投影到待曝光的物体上;以及测量装置，用于测量投影光学系统的光学性能作为干涉条纹，其中测量装置包括具有相对的第一和第二表面，其中第一表面具有第一测量图案，并且第二表面具有第二测量图案，并且比第一测量图案更靠近投影光学系统，并且其中测量设备将光引入投影光学系统经由第一和第二测量模式。

34. 发明授权

US07148956B2 Exposure method 有权
公开(公告)号：US07148956B2
公开(公告)日：2006-12-12
申请号：US11433402
申请日：2006-05-15
申请人： Yoshinori Ohsaki
发明人： Yoshinori Ohsaki
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7026 , G03B27/42 , G03F9/7034
摘要： Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.

35. 发明申请

US20060203219A1 Exposure method 有权
公开(公告)号：US20060203219A1
公开(公告)日：2006-09-14
申请号：US11433402
申请日：2006-05-15
申请人： Yoshinori Ohsaki
发明人： Yoshinori Ohsaki
IPC分类号： G03B27/52
CPC分类号： G03F9/7026 , G03B27/42 , G03F9/7034
摘要： Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.

36. 发明申请

US20050128455A1 Exposure apparatus, alignment method and device manufacturing method 审中-公开
标题翻译：曝光装置，对准方法和装置制造方法
公开(公告)号：US20050128455A1
公开(公告)日：2005-06-16
申请号：US11012711
申请日：2004-12-15
申请人： Yoshinori Ohsaki
发明人： Yoshinori Ohsaki
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7026 , G03F9/7088
摘要： An exposure apparatus for exposing a pattern on an exposure original onto a substrate using exposure light, includes a projection optical system for projecting the pattern on the exposure original onto the substrate, a first detection system that provides an alignment between the exposure original and the substrate in a plane orthogonal to an optical axis of the projection optical system, and a focus detecting system for detecting focusing condition of the projection optical system, the focus detection system includes a light intensity sensor for detecting light intensity of light which passed the projection optical system, wherein the focus detection system is calibrated based on the detection result of the first detection system.
摘要翻译：一种曝光装置，用于将曝光原稿上的图案曝光到基板上，使用曝光灯，包括用于将曝光原稿上的图案投影到基板上的投影光学系统，提供曝光原稿与基板之间的对准的第一检测系统在与投影光学系统的光轴正交的平面中，以及用于检测投影光学系统的聚焦状态的焦点检测系统，所述焦点检测系统包括：光强度传感器，用于检测通过所述投影光学系统的光的光强度; 其中，基于第一检测系统的检测结果来校准焦点检测系统。

37. 发明授权

US06646714B2 Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 失效
标题翻译：曝光装置，成像性能测量方法，装置制造方法，半导体制造工厂和曝光装置维护方法
公开(公告)号：US06646714B2
公开(公告)日：2003-11-11
申请号：US09954035
申请日：2001-09-18
申请人： Yoshinori Ohsaki
发明人： Yoshinori Ohsaki
IPC分类号： G03B2768
CPC分类号： G03F7/70483 , G03B27/68
摘要： An exposure apparatus for projecting and exposing through a projection optical system a transfer pattern formed on a master onto a substrate placed on a movable stage. The apparatus includes a mark placed on the movable stage and imparting a phase difference to incident light, based on an incident position, and then outputting the light, an image reception section, wherein the mark is imaged on the image reception section, using light of an exposure wavelength through the projection optical system, and a data processing section for calculating an imaging performance of the projection optical system on the basis of image data obtained by the image reception section.
摘要翻译：一种曝光装置，用于通过投影光学系统将形成在母板上的转印图案投影和曝光到放置在可移动台上的基板上。该装置包括放置在可移动台上的标记，并且基于入射位置对入射光施加相位差，然后使用光的图像输出光，图像接收部，其中标记被成像在图像接收部上通过投影光学系统的曝光波长，以及数据处理部，其基于由图像接收部获得的图像数据来计算投影光学系统的成像性能。

38. 发明授权

US5903352A Apparatus and method for measuring optical anisotropy 失效
标题翻译：用于测量光学各向异性的装置和方法
公开(公告)号：US5903352A
公开(公告)日：1999-05-11
申请号：US592861
申请日：1996-01-24
申请人： Yoshinori Ohsaki , Takashi Suzuki
发明人： Yoshinori Ohsaki , Takashi Suzuki
IPC分类号： G01N21/21 , G01J4/00 , G02F1/01
CPC分类号： G01N21/21
摘要： An optical anisotropy measurement apparatus including a light source emitting a light beam and a photodetector disposed opposite to the light source is provided for measuring an optical anisotropy of an object to be examined disposed between the light source and the photodetector so as to intersect a straight line connecting the light source and the photodetector. The apparatus further includes: a supporting member for supporting the object to be examined rotatably about a rotation axis extending perpendicular to the straight line, a polarizer positioned between the light source and the object to be examined, an analyzer positioned between the object to be examined and the photodetector, and an optical member disposed between the light source and the object to be examined so as to cause the beam to pass through an intersection of the straight line and the rotation axis. The optical member is preferably a pair of transparent members each having a curved surface and a flat surface disposed to sandwich the object to be examined with their opposing flat surfaces. The object to be examined may be a liquid crystal cell.
摘要翻译：提供了一种包括发射光束的光源和与光源相对设置的光电检测器的光学各向异性测量装置，用于测量被设置在光源和光电检测器之间的待检测物体的光学各向异性，以便与直线连接光源和光电检测器。该装置还包括：支撑构件，用于围绕垂直于直线延伸的旋转轴可旋转地支撑被检查物体;位于光源和被检体之间的偏振器;位于待检测对象之间的分析器以及光学元件，以及配置在光源与被检体之间的光学部件，使光束通过直线与旋转轴的交点。光学构件优选地是一对透明构件，每个透明构件具有弯曲表面和设置成以相对的平坦表面夹持被检查物体的平坦表面。待检查的对象可以是液晶单元。

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