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    • 32. 发明授权
    • Two-step etching process for forming self-aligned contacts
    • 用于形成自对准触点的两步蚀刻工艺
    • US6025255A
    • 2000-02-15
    • US105106
    • 1998-06-25
    • Bi-Ling ChenErik S. JerryDaniel Hao-Tien Lee
    • Bi-Ling ChenErik S. JerryDaniel Hao-Tien Lee
    • H01L21/311H01L21/60H01L21/306
    • H01L21/76897H01L21/31116
    • The practice of forming self-aligned contacts in MOSFETs using a silicon nitride gate sidewall and a silicon nitride gate cap has found wide acceptance, particularly in the manufacture of DRAMs, where bitline contacts are formed between two adjacent wordlines, each having a nitride sidewall. The contact etch requires a an RIE etch having a high oxide/nitride selectivity. Current etchants rely upon the formation of a polymer over nitride surfaces which enhances oxide/nitride selectivity. However, for contact widths of less than 0.35 microns, as are encountered in high density DRAMs, the amount of polymer formation required to attain a high selectivity causes the contact opening to close over with polymer before the opening is completely etched. This results in opens or unacceptably resistive contacts. On the other hand, if the etchant is adjusted to produce too little polymer, the nitride cap and sidewalls are thinned or etched through, producing gate to source/drain shorts. The invention describes a two step etching process whereby the contact opening is initially etched at high selectivity, and then, as the contact channel narrows, the polymer formation rate is reduced to prevent polymer pinch off and assure clearance of insulator in the contact area. The method performs both etch steps and the polymer and photoresist removal successively within the same RIE tool.
    • 在使用氮化硅栅极侧壁和氮化硅栅极帽的MOSFET中形成自对准接触的做法已经被广泛接受,特别是在DRAM的制造中,其中在两个相邻字线之间形成位线接触,每个具有氮化物侧壁。 接触蚀刻需要具有高氧化物/氮化物选择性的RIE蚀刻。 目前的蚀刻剂依赖于在氮化物表面上形成聚合物,这增强了氧化物/氮化物的选择性。 然而,如在高密度DRAM中遇到的小于0.35微米的接触宽度,获得高选择性所需的聚合物形成量使得在开口被完全蚀刻之前,接触开口与聚合物结合。 这导致打开或不可接受的电阻触点。 另一方面,如果蚀刻剂被调节以产生太少的聚合物,则氮化物盖和侧壁被薄化或蚀刻穿过,产生栅极到源极/漏极短路。 本发明描述了一种两步蚀刻工艺,其中最初以高选择性蚀刻接触开口,然后随着接触通道变窄,降低聚合物形成速率以防止聚合物夹断并确保绝缘体在接触区域中的间隙。 该方法在相同的RIE工具内连续执行蚀刻步骤和聚合物和光致抗蚀剂去除。
    • 33. 发明授权
    • Compulsory discharging device for exhaust of vehicle
    • 车辆排气强制排放装置
    • US5896744A
    • 1999-04-27
    • US1879
    • 1997-12-31
    • Yuan-Tien Lee
    • Yuan-Tien Lee
    • F02B35/02F02B35/00F01N3/02
    • F02B35/02Y02T10/146
    • The present invention relates to a compulsory discharging device for exhaust of vehicle of the type in which a driving motor which has a propeller is mounted at the end portion of the exhaust pipe such that the exhaust within said exhaust pipe can be compulsorily discharged. The operation of the driving motor is controlled by a digital controller which uses a signal line to pick up the frequency of a high voltage line of an igniting coil. The rpm of said driving motor can be proportionally controlled with respect to the rpm of the engine. The output shaft of the driving motor is coaxially mounted with a propeller and a mixing propeller with which the exhaust can be mixed with fresh air to reduce the concentration of the exhaust. Then the diluted exhaust is discharged. The exhaust generated from the combustion within the cylinder can be effectively and completely withdrawn such that the performance of the engine can be increased. The residue of carbon is reduced and the power of the engine is increased.
    • 本发明涉及一种用于这种类型的排气的强制排放装置,其中具有螺旋桨的驱动电机安装在排气管的端部,使得排气管内的排气能被强制排出。 驱动电动机的操作由数字控制器控制,该数字控制器使用信号线来拾取点火线圈的高压线的频率。 可以相对于发动机的转速成比例地控制所述驱动马达的转速。 驱动电动机的输出轴同轴安装有螺旋桨和混合螺旋桨,排气可以与新鲜空气混合,以减少排气的浓度。 然后稀释的废气排放。 可以有效地且完全地抽出从气缸内的燃烧产生的废气,从而可以提高发动机的性能。 碳的残渣减少,发动机的功率增加。
    • 34. 发明授权
    • Testchip design for process analysis in sub-micron DRAM fabrication
    • 用于亚微米DRAM制造过程分析的芯片设计
    • US5872018A
    • 1999-02-16
    • US851596
    • 1997-05-05
    • Daniel Hao-Tien Lee
    • Daniel Hao-Tien Lee
    • H01L23/544H01L21/66
    • H01L22/34H01L2924/0002
    • Integrated circuit chips having large regions of different device density and topography are susceptible to local processing variations which give rise to systematic failures affecting some circuit regions and not others. Over simplified test structures cannot signal these failures during processing. Memory chips have large regions of storage cell arrays serviced by sizeable peripheral regions consisting of logic circuits. The device density and configuration in each of these regions on the chip are quite different. During processing steps these regions present differently to the process agents such as chemical etchants and plasmas producing in local variations of processing rates occur which result in systematic under processing in one region or over processing in another. Memory chips are particularly prone to such variations and also lend themselves well to the design of product specific test structures for flagging these aberrations. Several test structures are described which are formed from regions of the integrated circuit product itself. The structures are designed to monitor specific process steps where such local variations occur. The invention teaches the use of product specific test structures for process monitoring of sub-micron DRAM integrated circuits. The structures described are portions of the cell array outfitted with test probe pads and are capable of measuring opens and shorts in wordlines and bitlines. Another structure comprises a testable string of bitline contacts.
    • 具有不同器件密度和形貌的较大区域的集成电路芯片容易受到本地处理变化的影响,这些变化引起影响一些电路区域而不是其他电路区域的系统故障。 在简化的测试结构中,处理过程中无法表明这些故障。 存储器芯片具有由逻辑电路组成的相当大的外围区域所服务的存储单元阵列的大区域。 芯片上每个这些区域的器件密度和配置是完全不同的。 在处理步骤期间,这些区域与处理剂不同地呈现,例如在处理速率的局部变化中产生的化学蚀刻剂和等离子体,这导致在一个区域中系统地处理或在另一个区域中处理过程。 存储芯片特别容易发生这种变化,并且也适用于用于标记这些像差的产品特定测试结构的设计。 描述了由集成电路产品本身的区域形成的几个测试结构。 这些结构被设计为监测发生这种局部变化的具体过程步骤。 本发明教导了使用产品特定的测试结构来进行亚微米DRAM集成电路的过程监控。 所描述的结构是配备有测试探针垫的单元阵列的部分,并且能够测量字线和位线中的开口和短路。 另一种结构包括可测试的位线触点串。
    • 36. 发明申请
    • POWER CONVERSION APPARATUS FOR CORRECTING POWER FACTOR
    • 用于校正功率因数的功率转换装置
    • US20120014142A1
    • 2012-01-19
    • US12838791
    • 2010-07-19
    • KUN-NAN TSAIFu-Tien Lee
    • KUN-NAN TSAIFu-Tien Lee
    • H02M3/335
    • H02M1/4258Y02B70/126Y02P80/112
    • A power conversion apparatus for correcting power factor, which converts an input voltage to an output voltage, comprises: an inductive component, a unidirectional conducting component, a switch, an energy storage component, a capacitive component, and an output circuit. The unidirectional conducting component connects to the inductive component and the switch in series. The energy storage component connects to the switch and the capacitive component in series. The capacitive component has a bias voltage. The output circuit couples to the energy storage component for outputting the output voltage. Wherein, the switch in a conduction state is capable of charging the inductive component by applying the input voltage and charging the energy storage component by applying the bias voltage, and the switch in a cutoff state is capable of discharging the capacitive component and the energy storage component to the output circuit and discharging the inductive component to the capacitive component.
    • 一种用于校正将输入电压转换为输出电压的功率因数的功率转换装置,包括:电感元件,单向导通元件,开关,能量存储元件,电容元件和输出电路。 单向导电元件串联连接到电感元件和开关。 能量存储部件串联连接到开关和电容部件。 电容元件具有偏置电压。 输出电路耦合到能量存储组件以输出输出电压。 其中,处于导通状态的开关能够通过施加输入电压来对感应分量进行充电,并通过施加偏置电压对能量存储部件进行充电,并且处于截止状态的开关能够放电电容性部件和能量存储器 并将电感元件放电到电容元件。
    • 37. 发明申请
    • STEREOSCOPIC DISPLAY APPARATUS AND METHOD AND STEREOSCOPIC DISPLAY WALL
    • 立体显示装置和方法和立体显示墙
    • US20100283839A1
    • 2010-11-11
    • US12512993
    • 2009-07-31
    • Chunfeng LiuChi-Tien Lee
    • Chunfeng LiuChi-Tien Lee
    • H04N13/04
    • G09G3/003H04N13/315H04N13/368H04N13/376H04N13/383
    • A stereoscopic display apparatus includes a display, a raster, a positioning unit, an information processing unit and a drive unit. The display displays a 2-dimensional image. The raster, situated in front of the display and having size-adjustable openings, opens and closes the openings and generates a left-eye view and a right-eye view from the 2-dimensional image. The positioning unit obtains and sends location information of a viewer. The information processing unit calculates, based on the location information of the viewer, sizes of the openings located in different areas of the raster and sizes of corresponding display areas on the display and sends a calculation result. The drive unit adjusts the sizes of the openings located in different areas of the raster and the sizes of corresponding display areas on the display according to the calculation result.
    • 立体显示装置包括显示器,光栅,定位单元,信息处理单元和驱动单元。 显示屏显示二维图像。 位于显示器前面并且具有尺寸可调的开口的光栅打开和关闭开口,并从二维图像产生左眼视图和右眼视图。 定位单元获取并发送观看者的位置信息。 信息处理单元基于观看者的位置信息,计算位于不同区域的开口的尺寸和显示器上相应的显示区域的大小,并且发送计算结果。 驱动单元根据计算结果调整位于光栅的不同区域中的开口的尺寸和显示器上相应的显示区域的尺寸。