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    • 39. 发明授权
    • EEPROM cell structure and array architecture
    • EEPROM单元结构和阵列架构
    • US06906376B1
    • 2005-06-14
    • US10170492
    • 2002-06-13
    • Fu-Chang HsuHsing-Ya Tsao
    • Fu-Chang HsuHsing-Ya Tsao
    • G11C11/34G11C16/04H01L27/115H01L29/788
    • H01L27/115G11C16/0433
    • An EEPROM cell device on a substrate is achieved. The device comprises, first, a selection transistor having gate, drain, source, and channel. The drain is defined as a cell bit line. An isolation transistor has gate, drain, source, and channel. The source is defined as a cell source line. Finally, a floating gate transistor has control gate, floating gate, drain, source, and channel. The drains and sources of each transistor comprise a diffusion layer in the substrate. The channels of each transistor comprise the substrate. The floating gate transistor drain is coupled to the selection transistor source. The floating gate transistor source is coupled to the isolation transistor drain. The device is programmed and erased by charge tunneling between the floating gate and the floating gate transistor channel. The device may further comprise an isolation well underlying the diffusion layer. A two transistor EEPROM cell is disclosed. Several array architectures using the EEPROM cell are disclosed.
    • 实现了基板上的EEPROM单元装置。 该器件首先包括具有栅极,漏极,源极和沟道的选择晶体管。 漏极定义为单元位线。 隔离晶体管具有栅极,漏极,源极和沟道。 源被定义为单元格源行。 最后,浮栅晶体管具有控制栅极,浮栅,漏极,源极和沟道。 每个晶体管的漏极和源极在衬底中包括扩散层。 每个晶体管的通道包括衬底。 浮栅晶体管漏极耦合到选择晶体管源极。 浮栅晶体管源耦合到隔离晶体管漏极。 该器件通过浮置栅极和浮动栅晶体管沟道之间的电荷隧道进行编程和擦除。 该装置还可以包括扩散层下面的隔离阱。 公开了一种双晶体管EEPROM单元。 公开了使用EEPROM单元的几种阵列架构。