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    • 36. 发明授权
    • Method for aligning a wafer and apparatus for performing the same
    • 用于对准晶片的方法和用于执行该晶片的装置
    • US07235411B2
    • 2007-06-26
    • US10883711
    • 2004-07-06
    • Kyu-Hong LimByung-Am LeeJoo-Woo KimChang-Hoon Lee
    • Kyu-Hong LimByung-Am LeeJoo-Woo KimChang-Hoon Lee
    • H01L21/00
    • G03F9/7092G03F7/70616
    • In a method of aligning a wafer, which is capable of precisely and rapidly aligning the wafer, and a wafer alignment apparatus using the method of aligning the wafer, a first wafer is aligned to form a first template pattern corresponding to an image of the first wafer. Image data of a second wafer is inputted. A kind of the second wafer is different from that of the first wafer. A second template pattern is formed by transforming the first template pattern in response to the image data of the second wafer. The second wafer is then aligned in response to the second template pattern. Accordingly, the template pattern is formed using the image data to align the wafer although wafers having different images are inspected, thereby rapidly forming the template pattern.
    • 在使用能够精确且快速地对准晶片的晶片和使用对准晶片的方法的晶片对准装置的对准方法中,对准第一晶片以形成对应于第一晶片的图像的第一模板图案 晶圆。 输入第二晶片的图像数据。 一种第二晶片与第一晶片不同。 通过响应于第二晶片的图像数据变换第一模板图案来形成第二模板图案。 然后响应于第二模板图案对准第二晶片。 因此,使用图像数据形成模板图案,以对晶片进行对准,尽管检查具有不同图像的晶片,从而快速形成模板图案。
    • 39. 发明申请
    • Apparatus for depositing thin film on wafer
    • 用于在薄片上沉积薄膜的装置
    • US20060096534A1
    • 2006-05-11
    • US11264993
    • 2005-11-02
    • Hong LimSahng LeeTae SeoHo Chang
    • Hong LimSahng LeeTae SeoHo Chang
    • C23C16/00
    • C23C16/4481
    • A thin film deposition apparatus that can effectively use a chemical source having a high vaporization temperature is provided. The thin film deposition apparatus includes a chamber for depositing a thin film on a wafer, a canister for accommodating a liquid chemical source to be supplied to the chamber, and a vaporizer for vaporizing the liquid chemical source bubbled in the canister and providing the vaporized chemical source to the chamber. The vaporizer is installed on a top surface or lateral surface of the chamber by an adaptor block to be incorporated into the chamber. A first gas line between the vaporizer and the chamber is formed within the adaptor block.
    • 提供了可以有效地使用具有高蒸发温度的化学源的薄膜沉积装置。 薄膜沉积设备包括用于在晶片上沉积薄膜的腔室,用于容纳要供应到腔室的液体化学源的罐,以及用于蒸发鼓泡在罐中的液体化学源并提供蒸发化学物质的蒸发器 来源到房间。 蒸发器通过适配器块安装在室的顶表面或侧表面上,以装入室中。 蒸发器和室之间的第一气体管线形成在适配器块内。