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    • 32. 发明授权
    • Lithographic lens wavefront and distortion tester
    • 平版镜透镜波前和失真测试仪
    • US5815268A
    • 1998-09-29
    • US672291
    • 1996-06-28
    • L. David LaFleur
    • L. David LaFleur
    • G01J9/00G01B9/02
    • G01J9/00
    • A measurement device (2) for measuring a collimated wave front through a lithographic lens includes a radiant energy source (4), a lens group (6) for collimating light emitted from said radiant energy source and directing said collimated light (7) toward a reference surface (10). A first binary optic (12) disposed in line with said collimated light and located adjacent to an input conjugate of a lens under test. A second binary optic (18) is arranged in a spaced relationship and in line with said first binary optic for retroreflecting light passing through a lithographic lens disposed between said first and second binary optics. A recording system (8,9) is provided for recording an interference with the light retroreflected-reflected back through said lens and through said reference surface.
    • 用于通过光刻透镜测量准直波前的测量装置(2)包括辐射能源(4),用于准直从所述辐射能源发射的光的透镜组(6),并将所述准直光(7)朝向 参考表面(10)。 第一二进制光学器件(12),与所述准直光线对齐设置,并且与被测镜片的输入共轭相邻。 第二二进制光学器件(18)以间隔的关系布置并与所述第一二元光学器件一致,用于回射通过设置在所述第一和第二二元光学器件之间的光刻透镜的光。 提供一种记录系统(8,9),用于记录通过所述透镜并通过所述参考表面的后向反射回光的干涉。