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    • 36. 发明授权
    • Response-enhanced monolithic-hybrid pixel
    • 响应增强的单片混合像素
    • US08704145B2
    • 2014-04-22
    • US13652399
    • 2012-10-15
    • SiOnyx, Inc.
    • Kenton Veeder
    • H01L27/00H01L31/00
    • G01J1/4228H01L27/14609
    • A light-sensing pixel for detecting at least a portion of the electromagnetic spectrum includes a first detector element having a micro-structured surface for detecting an infrared range of wavelengths of the electromagnetic spectrum. The light-sensing pixel further includes a second detector element for detecting a second range of wavelengths of the electromagnetic spectrum, wherein the second range of wavelengths is shorter than the first range of wavelengths and the first and second detector element are formed monolithically on a silicon substrate.
    • 用于检测电磁光谱的至少一部分的感光像素包括具有用于检测电磁光谱的波长的红外范围的微结构表面的第一检测器元件。 光感测像素还包括用于检测电磁光谱的第二波长范围的第二检测器元件,其中第二波长范围比第一波长范围短,并且第一和第二检测器元件整体地形成在硅上 基质。
    • 38. 发明申请
    • LOW DAMAGE LASER-TEXTURED DEVICES AND ASSOCIATED METHODS
    • 低损耗激光设备和相关方法
    • US20140048899A1
    • 2014-02-20
    • US13764512
    • 2013-02-11
    • SIONYX, INC.
    • Jason SicklerChristopher VineisJames E. Carey
    • H01L31/18H01L31/0236
    • H01L31/02363B23K26/0624B23K26/355H01L21/268Y02E10/50
    • Methods for laser processing semiconductor materials for use in optoelectronic and other devices, including materials, devices, and systems associated therewith are provided. In one aspect, a method of minimizing laser-induced material damage while laser-texturing a semiconductor material can include delivering short pulse duration laser radiation to a target region of a semiconductor material to form a textured region having a reorganized surface layer, wherein the laser radiation has a wavelength from about 200 nm to about 600 nm and a pulse duration of from about 10 femtoseconds to about 400 picoseconds, and wherein defect density of the semiconductor material from beneath the reorganized surface layer up to a depth of about 1 micron is less than or equal to about 1012/cm3.
    • 提供了用于激光处理用于光电子器件和其他器件的半导体材料的方法,包括与其相关的材料,器件和系统。 在一个方面,一种在半导体材料的激光纹理化过程中最小化激光诱导的材料损伤的方法可以包括将短脉冲持续时间的激光辐射传送到半导体材料的目标区域,以形成具有重新组织的表面层的纹理区域,其中激光 辐射具有约200nm至约600nm的波长和约10飞秒至约400皮秒的脉冲持续时间,并且其中重组表面层下方的半导体材料的缺陷密度低至约1微米的深度较小 大于或等于约1012 / cm3。