专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US3334998A Magnesium base alloys 失效
公开(公告)号：US3334998A
公开(公告)日：1967-08-08
申请号：US40958464
申请日：1964-11-06
申请人： MAGNESIUM ELEKTRON LTD
发明人： ANDREW FISHER PHILIP
IPC分类号： C22C23/00 , C22C23/04 , C22C23/06 , C22C24/00 , C22C25/00 , C23C8/08 , C23C8/42
CPC分类号： C23C8/42 , C22C23/00 , C22C23/04 , C22C23/06 , C22C24/00 , C22C25/00 , C23C8/08

22. 发明授权

US2007977A Metal with phosphide case and method of producing same 失效
标题翻译：金属与磷化物壳及其制造方法
公开(公告)号：US2007977A
公开(公告)日：1935-07-16
申请号：US59584932
申请日：1932-02-29
申请人： MCCAULEY ROY B
发明人： MCCAULEY ROY B
IPC分类号： C23C8/06 , C23C8/08
CPC分类号： C23C8/06 , C23C8/08

23. 发明授权

US11325191B2 Method for additive manufacturing 有权
公开(公告)号：US11325191B2
公开(公告)日：2022-05-10
申请号：US15495250
申请日：2017-04-24
申请人： Arcam AB
发明人： Ulf Ackelid
IPC分类号： B22F12/00 , B23K15/00 , B23K15/02 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B23K15/10 , B23K26/12 , B33Y70/00 , B23K26/342 , B23K26/70 , B22F3/10 , B22F3/15 , B22F3/24 , B23K26/00 , C22C14/00 , C23C8/08 , B23K103/14 , C22C1/04 , B23K103/08 , B23K103/04 , B22F10/10
摘要： A method for forming a three-dimensional article through successive fusion of parts of a metal powder bed is provided, comprising the steps of: distributing a first metal powder layer on a work table inside a build chamber, directing at least one high energy beam from at least one high energy beam source over the work table causing the first metal powder layer to fuse in selected locations, distributing a second metal powder layer on the work table, directing at least one high energy beam over the work table causing the second metal powder layer to fuse in selected locations, introducing a first supplementary gas into the build chamber, which first supplementary gas comprising hydrogen, is capable of reacting chemically with or being absorbed by a finished three-dimensional article, and releasing a predefined concentration of the gas which had reacted chemically with or being absorbed by the finished three dimensional article.

24. 发明申请

US20220064777A1 ADHESION REMOVAL METHOD AND FILM-FORMING METHOD 有权
公开(公告)号：US20220064777A1
公开(公告)日：2022-03-03
申请号：US17414376
申请日：2019-12-03
申请人： SHOWA DENKO K.K.
发明人： Yosuke TANIMOTO , Shimon OSADA
IPC分类号： C23C8/08 , H01L21/322 , B08B9/08 , B08B9/027 , C23C8/80
摘要： Provided are an adhesion removal method capable of removing sulfur-containing adhesions that adhere onto the inner surface of a chamber or the inner surface of a pipe connected to the chamber without disassembly of the chamber and a film-forming method. Sulfur-containing adhesions adhering onto at least one of the inner surface of a chamber (10) and the inner surface of a discharge pipe (15) connected to the chamber (10) are removed by reaction with a cleaning gas containing a hydrogen-containing compound gas.

25. 发明授权

US10388762B2 Method of manufacturing semiconductor device 有权
公开(公告)号：US10388762B2
公开(公告)日：2019-08-20
申请号：US15613807
申请日：2017-06-05
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Masahito Kitamura , Hiroshi Ashihara
IPC分类号： C23C8/08 , C23C8/80 , H01L29/66 , H01L21/225 , H01L21/324 , H01L29/167
摘要： Described is a technique for uniformly doping a silicon substrate having a Fin structure with a dopant. A method of manufacturing a semiconductor device may includes: (a) forming a dopant-containing film containing a dopant on a silicon film by performing a cycle a predetermined number of times, the cycle including: (a-1) forming a first dopant-containing film by supplying a first dopant-containing gas containing the dopant and a first ligand to a substrate having thereon the silicon film and one of a silicon oxide film and a silicon nitride film; and (a-2) forming a second dopant-containing film by supplying a second dopant-containing gas containing the dopant and a second ligand different from and reactive with the first ligand to the substrate; and (b) forming a doped silicon film by annealing the substrate having the dopant-containing film thereon to diffuse the dopant into the silicon film.

26. 发明授权

US10211457B2 Metal hydride alloys with improved rate performance 有权
公开(公告)号：US10211457B2
公开(公告)日：2019-02-19
申请号：US15046104
申请日：2016-02-17
申请人： CALIFORNIA INSTITUTE OF TECHNOLOGY
发明人： Nicholas J. Weadock , Hongjin Tan , Brent T. Fultz , Heng Yang
IPC分类号： C23C8/08 , H01M4/38 , C22C14/00 , C22C27/02 , C22C1/02 , C22F1/18 , C21D1/60 , C21D1/58 , C21D1/613 , B22D18/06 , B22D11/06 , C23C8/80 , H01M4/62 , C22C1/04 , B22F9/04 , H01M10/34 , H01M12/08
摘要： Methods of preparing improved metal hydride alloy materials are provided. The alloys include a mixture of at least four of vanadium, titanium, nickel, chromium, and iron. The alloy is processed by at least one of thermal and physical treatment to generate a refined microstructure exhibiting improved kinetics when used as electrodes in MH batteries (e.g., higher discharge current). The thermal treatment includes rapid cooling of the alloy at greater than 104 K/s. The physical treatment includes mechanical pulverization of the alloy after cooling. The microstructure is a single phase (body centered cubic) with a heterogeneous composition including a plurality of primary regions having a lattice parameter selected from the range of 3.02 Å to 3.22 Å and a plurality of secondary regions having a lattice parameter selected from the range of 3.00 Å to 3.22 Å and at least one physical dimension having a maximum average value less than 1 μm.

27. 发明申请

US20170058390A1 NOVEL MASK FORMULATION TO PREVENT ALUMINIZING ONTO THE PRE-EXISTING CHROMIDE COATING 审中-公开
标题翻译：新型掩模配方，以防止预镀铬涂层上的铝化
公开(公告)号：US20170058390A1
公开(公告)日：2017-03-02
申请号：US15243152
申请日：2016-08-22
申请人： Zhihong Tang , Kevin E Garing
发明人： Zhihong Tang , Kevin E Garing
IPC分类号： C23C8/04 , F01D5/28 , C09D5/10 , C23C8/08 , C09D1/00
CPC分类号： C23C8/04 , C09D1/00 , C09D5/10 , C22C19/057 , C23C8/08 , C23C10/04 , C23C10/08 , F01D5/288 , F05D2220/32 , F05D2300/175 , F05D2300/177
摘要： A novel dual layer mask formulation is provided. In particular, the mask has a unique composition that protects the integrity of an underlying chromide coating, prevents chromium depletion from the chromide coating and prevents a subsequent aluminide coating from being deposited thereon.
摘要翻译：提供了一种新颖的双层掩模配方。特别地，掩模具有独特的组合物，其保护下面的铬化物涂层的完整性，防止从铬酸盐涂层中的铬消耗，并防止随后的铝化物涂层沉积在其上。

28. 发明申请

US20160279739A1 METHOD FOR DETERMINING CHARACTERISTIC STRESS OF WELDING STRUCTURE, METHOD FOR DESIGNING WELDED STRUCTURE, AND METHOD FOR MANUFACTURING WELDED STRUCTURE 有权
标题翻译：用于确定焊接结构特性应力的方法，设计焊接结构的方法和制造焊接结构的方法
公开(公告)号：US20160279739A1
公开(公告)日：2016-09-29
申请号：US15029905
申请日：2014-11-18
申请人： MITSUBISHI HEAVY INDUSTRIES, LTD.
发明人： Hiroshi Kanasaki , Naoki Ogawa , Takaharu Maeguchi , Takao Tsuruta , Takafumi Hiro , Tomoyuki Inoue , Kosuke Kitamura , Tomohisa Ota
IPC分类号： B23K31/12 , B23K31/02 , C23C8/08 , G01N3/08
CPC分类号： B23K31/12 , B23K9/0256 , B23K9/232 , B23K31/02 , B23K31/125 , B23K2101/12 , B23K2101/34 , B23K2103/04 , B23K2103/05 , B23K2103/18 , C23C8/08 , G01L1/2218 , G01L5/0033 , G01N3/08 , G01N2203/0067 , G01N2203/0236 , G01N2203/0296 , G01N2203/0298
摘要： A test piece preparation step of preparing a test piece (50) including a welding structure in which a welding material formed of an austenitic alloy is welded to a member formed of low-alloy steel or low-carbon steel, a hydrogen supply step of supplying hydrogen to the test piece (50), and a characteristic stress acquisition step of applying a load (F) to the test piece (50) to which hydrogen was supplied and acquiring a characteristic stress showing material mechanical properties of the test piece (50) are executed.
摘要翻译：一种制备包括焊接结构的试件（50）的试件制备步骤，其中由奥氏体合金形成的焊接材料焊接到由低合金钢或低碳钢制成的部件，氢供给步骤向所述试验片（50）施加氢气，以及将负载（F）施加到供给氢的所述试验片（50）的特征应力取得步骤，获取表示所述试验片（50）的材料机械特性的特征应力，被执行。

29. 发明申请

US20150129088A1 GASEOUS SULFUR TREATMENT METHODS FOR COPPER ZINC ALLOYS 审中-公开
标题翻译：用于铜合金的气相硫处理方法
公开(公告)号：US20150129088A1
公开(公告)日：2015-05-14
申请号：US14600673
申请日：2015-01-20
申请人： NIBCO INC.
发明人： Benjamin L. Lawrence
IPC分类号： C23C8/08
CPC分类号： C23C8/08 , C23C8/42
摘要： A method of making a corrosion resistant brass component that includes the steps: forming a gaseous atmosphere containing labile sulfur by combustion of potassium bisulfate or hydrogen sulfide; and contacting surfaces of a finished brass component with the gaseous atmosphere containing labile sulfur. The surfaces of the brass component are contacted with the gaseous atmosphere at an elevated temperature for a time sufficient to form a metal-sulfide rich layer of at least 5 microns in thickness. Further, the brass component is corrosion resistant after the contacting step as determined by standardized testing that yields dezincification penetration of less than 200 microns in depth.
摘要翻译：一种制造耐腐蚀黄铜组分的方法，包括以下步骤：通过硫酸氢钾或硫化氢的燃烧形成含有不稳定硫的气态气氛; 并使成品黄铜组分的表面与含有不稳定硫的气态气氛接触。黄铜组分的表面在高温下与气态气体接触一段足以形成至少5微米厚的金属硫化物富集层的时间。此外，在通过标准测试确定的接触步骤之后，黄铜组分是耐腐蚀性的，其产生深度小于200微米的脱锌渗透。

30. 发明申请

US20140290801A1 HYDRIDE ASSEMBLING SYSTEM AND METHOD OF MAKING A HYDRIDE BATCH 有权
标题翻译：液压组装系统和制造液压批料的方法
公开(公告)号：US20140290801A1
公开(公告)日：2014-10-02
申请号：US13852746
申请日：2013-03-28
申请人： KIDDE TECHNOLOGIES, INC.
发明人： Kenneth Frazer Bell , Steven Patrick Wallace
IPC分类号： C23C8/08
CPC分类号： C23C8/08 , C01B3/0005 , F17C11/005 , Y02E60/321 , Y02E60/324
摘要： A hydride assembling system includes a first spool configured to support a sensor tube assembly comprising a wire disposed within a sensor tube. Also included is a hydrogen inlet fluidly coupled to the first spool for providing hydrogen from a hydrogen plenum. Further included is a second spool configured to receive the sensor tube assembly as the sensor tube assembly is fed from the first spool. Yet further included is a heated section at a temperature above an ambient temperature and configured to heat the sensor tube assembly as the sensor tube assembly is fed through the heated section.
摘要翻译：氢化物组装系统包括构造成支撑包括布置在传感器管内的导线的传感器管组件的第一卷轴。还包括与第一阀芯流体耦合的氢气入口，用于从氢气室提供氢气。进一步包括第二卷轴，其构造成当传感器管组件从第一卷轴进给时接收传感器管组件。还包括在高于环境温度的温度下的加热部分，并且构造成当传感器管组件被馈送通过加热部分时加热传感器管组件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式