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21. 发明授权

US06203659B1 Method and apparatus for controlling the quality of a photoresist stripper bath 有权
标题翻译：用于控制光致抗蚀剂剥离槽的质量的方法和装置
公开(公告)号：US06203659B1
公开(公告)日：2001-03-20
申请号：US09280505
申请日：1999-03-30
申请人： Yun-Hung Shen , Pin-Yin Shin , Shih-Chun Huang , Yu-Lun Lin
发明人： Yun-Hung Shen , Pin-Yin Shin , Shih-Chun Huang , Yu-Lun Lin
IPC分类号： B05C100
CPC分类号： H01L21/67086 , G03F7/3092 , G03F7/42 , H01L21/67057
摘要： A photoresist stripper bath includes a filter in a re-circulation line for filtering residual photoresist materials from said bath. The quality of the stripper and the concentration of the photoresist materials are sensed by passing infrared light transversely through the re-circulating line, detecting the intensity of the light passed through the line and comparing the detected level with a threshold value related to the concentration of the photoresist materials in said stripper.
摘要翻译：光致抗蚀剂洗涤槽包括用于从所述浴中过滤残余光致抗蚀剂材料的再循环管线中的过滤器。剥离器的质量和光致抗蚀剂材料的浓度通过红外光横向通过再循环线来检测，检测穿过线的光的强度，并将检测到的水平与与浓度相关的阈值进行比较所述剥离器中的光致抗蚀剂材料。

22. 发明授权

US06183561B2 Coat weight measuring and control apparatus 有权
标题翻译：涂重测量和控制装置
公开(公告)号：US06183561B2
公开(公告)日：2001-02-06
申请号：US09211883
申请日：1998-12-15
申请人： Edward Belotserkovsky
发明人： Edward Belotserkovsky
IPC分类号： B05C100
CPC分类号： G01G17/02 , G01B11/0625
摘要： A sensor and a method for determining the basis weight of a coating material containing latex on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
摘要翻译：描述了用于确定基材上含有胶乳的涂料的基重的传感器和方法。所确定的基重对于涂层下面的基底材料的量的变化是不敏感的。来自传感器的信号可以用于控制涂覆机构以提供具有均匀基重的涂层。

23. 发明授权

US06179918B2 Silicone coat weight measuring and control apparatus 有权
标题翻译：硅胶涂层重量测量和控制装置
公开(公告)号：US06179918B2
公开(公告)日：2001-01-30
申请号：US09196862
申请日：1998-11-20
申请人： Edward Belotserkovsky
发明人： Edward Belotserkovsky
IPC分类号： B05C100
CPC分类号： G01G17/02 , G01B11/0625
摘要： A sensor and a method for determining the coating weight of a coating material containing silicone on a substrate is described. The determined coating weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform weight.
摘要翻译：描述了用于确定在基材上含有硅酮的涂料的涂层重量的传感器和方法。确定的涂层重量对涂层下面的底物材料的量的变化不敏感。来自传感器的信号可以用于控制涂覆机构以提供具有均匀重量的涂层。

24. 发明授权

US06821345B2 Roller coater apparatus 有权
标题翻译：辊式涂布机
公开(公告)号：US06821345B2
公开(公告)日：2004-11-23
申请号：US10077217
申请日：2002-02-15
申请人： John A. Obermark
发明人： John A. Obermark
IPC分类号： B05C100
CPC分类号： B05C1/0813 , B05C9/04
摘要： An apparatus for coating sheet metal strip substrate with lubricant type laminate includes top and bottom roller coaters for pinching the metal therebetween to apply laminate. The roller coaters are movable between engaged and disengaged positions. Pneumatic cylinders for actuating the top and bottom roller coaters are operatively connected such that the top and bottom roller coaters can “float” or move vertically while at the same time pinching the metal strip therebetween. The roller coaters comprise roller coater carriages that carry applicator rolls between support rolls without the need to journal ends of the applicator roll. A spring biased applicator head applies laminate directly to one or more sections of the applicator roll.
摘要翻译：用于涂覆润滑剂型层压板的金属带材基板的设备包括用于在其间夹住金属的顶部和底部辊涂机，以施加层压板。辊式涂布机可在啮合和脱离位置之间移动。用于致动顶部和底部辊涂机的气动缸可操作地连接，使得顶部和底部辊涂机可以“浮动”或垂直移动，同时在其间夹住金属带。辊式涂布机包括辊式涂布机托架，其在支撑辊之间承载涂布辊，而不需要涂布辊的轴颈端部。弹簧偏压施加头将层压体直接施加到施用辊的一个或多个部分。

25. 发明授权

US06722395B2 Depositing fluid specimens on substrates, resulting ordered arrays, techniques for analysis of deposited arrays 有权
标题翻译：在基板上沉积流体样品，产生有序阵列，分析沉积阵列的技术
公开(公告)号：US06722395B2
公开(公告)日：2004-04-20
申请号：US09862177
申请日：2001-05-21
申请人： James W. Overbeck , Peter T. Flowers , Jean I. Montagu , Myles L. Mace , Peter Honkanen
发明人： James W. Overbeck , Peter T. Flowers , Jean I. Montagu , Myles L. Mace , Peter Honkanen
IPC分类号： B05C100
CPC分类号： B01L3/0244 , B01J19/0046 , B01J2219/00315 , B01J2219/00364 , B01J2219/00387 , B01J2219/00527 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/0061 , B01J2219/00612 , B01J2219/00617 , B01J2219/00619 , B01J2219/00621 , B01J2219/00628 , B01J2219/0063 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00677 , B01J2219/00691 , B01J2219/00722 , B01J2219/00725 , B01J2219/00729 , B01L3/0251 , B01L99/00 , B82Y30/00 , C40B60/14 , G01N35/1065 , G01N2035/1034 , G01N2035/1037 , G02B21/34 , Y10T436/2575
摘要： For depositing fluid dots in an array, e.g., for microscopic analysis, a deposit device, e.g. a pin, cooperating with a fluid source defines a precisely sized drop of fluid of small diameter on a drop carrying surface. Transport mechanism positions the device precisely over the receiving surface and drive mechanism moves the deposit device toward and away from the surface. By repeated action, minute drops of fluid can be deposited precisely in a dense array, preferably under computer control. The drop-carrying surface shown has a diameter less than 375, preferably less than 300, preferably between about 15 and 250 micron, and is bound by a sharp rim that defines the perimeter of the fluid drop. The deposit device is compliant in the direction of deposition motion, e.g. by overcoming resistance of a resilient member. When depositing, the deposit device is laterally constrained to a reference position, e.g. by flexure mounting or the deposit device is mounted to displace from its mounting upon engagement with the receiving surface, and is subject to a lateral force or turning moment that engages the device with a lateral reference surface. A mobile-fluid storage device resupplies the deposit device along the array, e.g. in the immediate vicinity of the deposit locations. Mobile annular storage rings are lowered and raised to obtain a supply of fluid, or a mobile multiwell plate is used. Cleaning mechanism, sampling plans, and array products on microscope slides and fragile or soft membranes are disclosed as are many types of fluid and uses, e.g., in biotechnology, analysis and process control.
摘要翻译：为了在阵列中沉积流体点，例如用于显微分析，沉积装置，例如，与流体源协作的销在液滴承载表面上限定了精确尺寸的小直径流体。传送机构将设备精确地定位在接收表面上，并且驱动机构使沉积设备朝向和远离表面移动。通过重复的操作，可以精确地以密集阵列沉积微滴流体，优选在计算机控制下。所示的滴落表面的直径小于375，优选小于300，优选在约15和250微米之间，并且由限定流体液滴的周边的尖锐边界限定。沉积装置在沉积运动的方向上是顺应性的，例如通过克服弹性构件的阻力。当沉积时，沉积装置横向约束到参考位置，例如，通过弯曲安装或沉积装置被安装成在与接收表面接合时从其安装件移位，并且受到与侧面参考表面接合的装置的横向力或转动力矩。移动流体存储装置沿着阵列重新安置沉积装置，例如，在附近的存款处。移动的环形储存环被降低并升高以获得流体供应，或者使用移动的多孔板。公开了许多类型的流体，例如在生物技术，分析和过程控制中的清洁机构，采样计划和阵列产品在显微镜载玻片和脆弱或软膜上。

26. 发明授权

US06695916B1 Protective paint applications to tires 失效
标题翻译：防护漆应用于轮胎
公开(公告)号：US06695916B1
公开(公告)日：2004-02-24
申请号：US09979817
申请日：2001-12-20
申请人： George Jeffrey Lipczynski , John Michael Maloney , Robert Dean Irwin
发明人： George Jeffrey Lipczynski , John Michael Maloney , Robert Dean Irwin
IPC分类号： B05C100
CPC分类号： B29D30/0061 , B05C1/027 , B05C1/08 , B05C1/0808
摘要： A paint applying roller is positioned over the sidewall of a tire rotating about a vertical axis and the roller is vertically movable into contact with the sidewall to apply and spread protective paint over white sidewall surfaces.
摘要翻译：油漆施加辊定位在围绕垂直轴线旋转的轮胎的侧壁上方，并且辊可垂直移动以与侧壁接触，以将保护涂料施加并涂覆在白色侧壁表面上。

27. 发明授权

US06497785B2 Wet chemical process tank with improved fluid circulation 有权
公开(公告)号：US06497785B2
公开(公告)日：2002-12-24
申请号：US09761402
申请日：2001-01-16
申请人： Yi-Chen Huang , Chun-Hsiung Chen
发明人： Yi-Chen Huang , Chun-Hsiung Chen
IPC分类号： B05C100
CPC分类号： H01L21/67086
摘要： A wet chemical process tank, or a wet etch tank, that has improved fluid circulation and improved uniformity in the fluid concentration in the tank is disclosed. In a preferred embodiment, a tank body is provided which has a liquid dispenser positioned therein with a plurality of liquid outlets in a vertical surface of the dispenser each having a different diameter opening for compensating the different fluid pressure in the dispenser. A more uniform liquid concentration is thus achieved in the tank cavity to perform a more uniform chemical process on the plurality of wafers. The tank body is further provided with a second endwall which has a second distance from the plurality of wafers that is at least twice the first distance between a first endwall and the plurality of wafers. When the second endwall is at least 0.5 cm shorter than the first endwall, the larger second distance together with the shorter height of the second endwall induces a large volume of liquid to overflow the second endwall and to carry away any film residues or flakes, such as that of a photoresist material, from the tank cavity and thus preventing any possible redeposition of the film residues on the wafer surface and any contamination problems.

28. 发明授权

US06464784B1 Coating apparatus having a coating, recirculation and cleaning arrangement 失效
标题翻译：具有涂层，再循环和清洁装置的涂覆装置
公开(公告)号：US06464784B1
公开(公告)日：2002-10-15
申请号：US09470065
申请日：1999-12-22
申请人： Ralph L. Piccinino, Jr. , Kevin H. Blakely
发明人： Ralph L. Piccinino, Jr. , Kevin H. Blakely
IPC分类号： B05C100
CPC分类号： G03D15/025 , G03D15/06
摘要： An apparatus and method for applying at least one coating solution of a predetermined viscosity to a photosensitive material. The apparatus includes at least an application roller which is adapted to apply the coating solution onto the photosensitive material. A solution supply guide is positioned relative to the application roller to supply coating solution onto the application roller. The apparatus and method further includes a washing arrangement for washing the coating apparatus in an efficient manner. The washing arrangement includes a movable scrubber bar arrangement which retracts away from the application roller when the coating apparatus is in a coating mode of operation, and is movable to contact the application roller by way of brushes in a cleaning mode of operation. The apparatus and method further includes a recirculation system which alternatively supplies coating solution to the supply guide and cleaning solution to at least the washing arrangement.
摘要翻译：一种用于将至少一种具有预定粘度的涂布溶液施加到感光材料上的装置和方法。该装置至少包括适用于将涂布溶液施加到感光材料上的施加辊。溶液供应引导件相对于施加辊定位，以将涂布溶液供应到涂布辊上。该装置和方法还包括用于以有效的方式清洗涂布装置的清洗装置。洗涤装置包括可移动的洗涤器杆装置，当涂覆装置处于涂覆操作模式时，可移动的擦拭器杆装置从施加辊缩回，并且可移动以在清洁操作模式下通过刷子与施加辊接触。该装置和方法还包括再循环系统，其可将涂料溶液交替地供应至至少洗涤装置的供应导管和清洁溶液。

29. 发明授权

US06447610B1 Coating inside of syringe 失效
标题翻译：注射器内涂层
公开(公告)号：US06447610B1
公开(公告)日：2002-09-10
申请号：US09618442
申请日：2000-07-18
申请人： Udo J. Vetter
发明人： Udo J. Vetter
IPC分类号： B05C100
CPC分类号： A61M5/3129 , A61M2005/3131 , B05C7/08
摘要： An inside wall of an elongated syringe body is coated by supplying at least an outer surface of an applicator ring with a coating of silicon oil while displacing a rod carrying the coated ring from a rear end to a front end of the body with the ring in continuous annular engagement with the inside wall thereof so as to transfer the oil from the ring to the inside wall. Thereafter a scraper ring also carried on the rod is displaced from the front end to the rear end of the body with the scraper ring in continuous annular engagement with the inside wall so as to scrape excess silicone oil from the inside wall.
摘要翻译：通过向涂抹器环的至少外表面供应硅油涂层，同时将携带涂覆环的杆从后端移动到主体的前端，使环的内部位于与其内壁连续环形接合，以便将油从环转移到内壁。此后，还带有杆上的刮环从主体的前端移动到后端，刮刀环与内壁连续环形接合，从而从内壁刮去多余的硅油。

30. 发明授权

US06398440B1 Apparatus for forming a guide coat and replacement parts thereof 有权
公开(公告)号：US06398440B1
公开(公告)日：2002-06-04
申请号：US09494573
申请日：2000-01-31
申请人： Robin William Hills
发明人： Robin William Hills
IPC分类号： B05C100
CPC分类号： B05C17/10 , B05D1/28 , B05D5/00 , B05D5/005 , B05D5/06 , B05D2401/00 , B05D2401/32
摘要： The apparatus has a first container part within which material for distributing over a surface as a guide coat is held in a substantially loose, finely divided particulate form; a perforated element through which the particulate material can be sprinkled or shaken; and a second container part for receiving an applicator, e.g., in the form of a sponge, on which the particulate material is to be sprinkled or shaken. The apparatus may be provided with the applicator or as a replacement part or “re-fill” for existing apparatus. Particulate material may also be provided for re-charging such apparatus.

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