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21. 发明授权

US08519298B2 Split laser scribe 有权
标题翻译：分割激光刻章
公开(公告)号：US08519298B2
公开(公告)日：2013-08-27
申请号：US12731798
申请日：2010-03-25
申请人： Jianmin Wang , Craig Metzner , Gregory W. Schuh
发明人： Jianmin Wang , Craig Metzner , Gregory W. Schuh
IPC分类号： B23K26/00 , B23K26/14 , B23K26/02
CPC分类号： B23K26/0676 , B23K26/40 , B23K2101/40 , B23K2103/50 , G02B27/283
摘要： A dual-beam laser cutting system uses laser beam polarization to output two identical laser beams. The dual identical laser beams are spaced appropriately to simultaneously cut a water thus increasing the laser cutting system's throughput as compared to a single-laser cutting system. In one implementation, the dual-beam laser cutting system 100 utilizes a beam expander 220, two half-wave plates 224, 238, a polarizing beam splitter 228, a mirror 236, and two lenses 234, 242 to provide two identical laser beams 202, 204 from a single laser source 214. The identical laser beams 202, 204 are tuned to have the same power, cross-sectional diameter, and polarization direction. One of the half-wave plates 224 is rotated to yield laser beams with the same power. The other half-wave plate 238 is rotated to yield laser beams with the same polarization direction.
摘要翻译：双光束激光切割系统使用激光束偏振来输出两个相同的激光束。与单激光切割系统相比，双重相同的激光束被适当地间隔开以同时切割水，从而增加激光切割系统的吞吐量。在一个实施方案中，双光束激光切割系统100利用光束扩展器220，两个半波片224,238，偏振分束器228，反射镜236和两个透镜234,242来提供两个相同的激光束202 ，204来自单个激光源214.相同的激光束202,204被调谐为具有相同的功率，横截面直径和偏振方向。半波片224中的一个旋转以产生具有相同功率的激光束。旋转另一个半波片238以产生具有相同偏振方向的激光束。

22. 发明授权

US08328561B2 Electrical contacts for use with vacuum deposition sources 有权
标题翻译：与真空沉积源一起使用的电触点
公开(公告)号：US08328561B2
公开(公告)日：2012-12-11
申请号：US12539458
申请日：2009-08-11
申请人： Scott Wayne Priddy
发明人： Scott Wayne Priddy
IPC分类号： H01R41/00
CPC分类号： C23C14/243 , C23C14/0623
摘要： The present invention provides electrical contact assemblies can be used with vacuum deposition sources. In one exemplary application, the electrical contact assemblies of the present invention provide electrical contact to an arcuate or otherwise curved surface of a heating device used with a vacuum deposition source. In one embodiment, a set of power straps are each connected at one end to a power source feed-through wire and at the other end are urged by a pressure pin and a flat spring into electrical communication with one of the electrical contacts on the heating device.
摘要翻译：本发明提供电触头组件可以与真空沉积源一起使用。在一个示例性应用中，本发明的电接触组件提供与与真空沉积源一起使用的加热装置的弧形或其它弯曲表面的电接触。在一个实施例中，一组电源带的一端各自连接到电源直通电线，另一端由压脚和平板弹簧推压，与加热中的一个电触头电连通设备。

23. 发明申请

US20120248336A1 Apparatus and Method for Batch Non-Contact Material Characterization 有权
标题翻译：用于批次非接触材料表征的装置和方法
公开(公告)号：US20120248336A1
公开(公告)日：2012-10-04
申请号：US13495160
申请日：2012-06-13
申请人： Dong Seung Lee , Mikhail Belousov , Eric A. Armour , William E. Quinn
发明人： Dong Seung Lee , Mikhail Belousov , Eric A. Armour , William E. Quinn
IPC分类号： G01J3/443 , C23C16/52
CPC分类号： H01L21/6875 , G01N21/645 , G01N21/6489 , G01N2021/6417 , H01L21/68764 , Y10T117/1004 , Y10T117/1008
摘要： An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon.
摘要翻译：用于执行非接触材料表征的装置包括适于保持多个基板的晶片载体和材料表征装置，例如用于进行光致发光光谱的装置。该装置适于在晶片载体的至少一部分上执行非接触材料表征，包括设置在其上的基板。

24. 发明授权

US08192547B2 Thermally isolated cryopanel for vacuum deposition systems 有权
标题翻译：用于真空沉积系统的隔热冷冻板
公开(公告)号：US08192547B2
公开(公告)日：2012-06-05
申请号：US11903727
申请日：2007-09-24
申请人： David William Gotthold , Richard Charles Bresnahan , Scott Wayne Priddy , Mark Lee O'Steen
发明人： David William Gotthold , Richard Charles Bresnahan , Scott Wayne Priddy , Mark Lee O'Steen
IPC分类号： C23C16/00
CPC分类号： F04B37/08
摘要： The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy.
摘要翻译：本发明涉及真空沉积系统和相关沉积方法。提供使用一个或多个细胞浆进行局部泵送位于衬底的沉积区域的真空沉积系统。本发明特别适用于在分子束外延期间泵送和最小化高蒸气压沉积材料的再蒸发。

25. 发明授权

US08158016B2 Methods of operating an electromagnet of an ion source 有权
标题翻译：操作离子源电磁铁的方法
公开(公告)号：US08158016B2
公开(公告)日：2012-04-17
申请号：US12037598
申请日：2008-02-26
申请人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
发明人： Alan V. Hayes , Rustam Yevtukhov , Viktor Kanarov , Boris L. Druz
IPC分类号： G01L21/30 , B44C1/22
CPC分类号： H01J37/08 , H01J27/18 , H01J37/3053 , H01J2237/061 , H01J2237/083 , H01J2237/24542 , H01L21/67069
摘要： Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
摘要翻译：操作离子源的电磁体的方法，用于产生具有可控离子电流密度分布的离子束。所述方法可以包括在离子源的放电空间中产生等离子体，通过向有效限定等离子体密度分布的电磁体施加电流来产生和放电放电空间中的磁场，从等离子体提取离子束，测量离子束密度的分布曲线，并将实际分布分布与用于离子束密度的期望分布分布进行比较。基于比较，可以手动或自动地调节施加到电磁体的电流，以改变放电空间中的磁场，从而改变等离子体密度分布。

26. 发明申请

US20120040097A1 ENHANCED WAFER CARRIER 有权
标题翻译：增强型拖车
公开(公告)号：US20120040097A1
公开(公告)日：2012-02-16
申请号：US12855739
申请日：2010-08-13
申请人： Boris Volf , Yuliy Rashkovsky
发明人： Boris Volf , Yuliy Rashkovsky
IPC分类号： C23C16/458 , C23C16/00
CPC分类号： H01L21/68764 , C23C16/4586 , H01L21/68728 , H01L21/68771
摘要： A wafer carrier used in wafer treatments such as chemical vapor deposition has pockets for holding the wafers and support surfaces for supporting the wafers above the floors of the pockets. The carrier is provided with locks for restraining wafers against upward movement away from the support surfaces. Constraining the wafers against upward movement limits the effect of wafer distortion on the spacing between the wafer and the floor surfaces, and thus limits the effects of wafer distortion on heat transfer. The carrier may include a main portion and minor portions having higher thermal conductivity than the main portion, the minor portions being disposed below the pockets.
摘要翻译：用于晶片处理（例如化学气相沉积）中的晶片载体具有用于保持晶片和支撑表面的口袋，以支撑位于口袋的地板上方的晶片。载体设有用于限制晶片的锁，以防止远离支撑表面的向上移动。限制晶片对向上移动限制晶片失真对晶片和地板表面之间的间隔的影响，从而限制晶片失真对热传递的影响。载体可以包括主要部分和具有比主要部分更高的热导率的次要部分，次要部分设置在口袋下方。

27. 发明申请

US20110297076A1 APPARATUS AND METHOD FOR BATCH NON-CONTACT MATERIAL CHARACTERIZATION 审中-公开
公开(公告)号：US20110297076A1
公开(公告)日：2011-12-08
申请号：US13208905
申请日：2011-08-12
申请人： Dong Seung Lee , Mikhail Belousov , Eric A. Armour , William E. Quinn
发明人： Dong Seung Lee , Mikhail Belousov , Eric A. Armour , William E. Quinn
IPC分类号： C30B25/16 , C30B25/08 , G01B11/14
CPC分类号： H01L21/6875 , G01N21/645 , G01N21/6489 , G01N2021/6417 , H01L21/68764 , Y10T117/1004 , Y10T117/1008
摘要： An apparatus for performing non-contact material characterization includes a wafer carrier adapted to hold a plurality of substrates and a material characterization device, such as a device for performing photoluminescence spectroscopy. The apparatus is adapted to perform non-contact material characterization on at least a portion of the wafer carrier, including the substrates disposed thereon.

28. 发明申请

US20110287635A1 WAFER CARRIER WITH HUB 失效
标题翻译：带框架的拖车
公开(公告)号：US20110287635A1
公开(公告)日：2011-11-24
申请号：US13188605
申请日：2011-07-22
申请人： Vadim Boguslavskiy , Alexander I. Gurary
发明人： Vadim Boguslavskiy , Alexander I. Gurary
IPC分类号： H01L21/302
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.
摘要翻译：用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。在清洁板时可以拆下轮毂。

29. 发明申请

US20110233176A1 SPLIT LASER SCRIBE 有权
标题翻译：分体激光扫描
公开(公告)号：US20110233176A1
公开(公告)日：2011-09-29
申请号：US12731798
申请日：2010-03-25
申请人： Jianmin Wang , Craig Metzner , Gregory W. Schuh
发明人： Jianmin Wang , Craig Metzner , Gregory W. Schuh
IPC分类号： B23K26/00 , G02B5/30 , G02B27/28
CPC分类号： B23K26/0676 , B23K26/40 , B23K2101/40 , B23K2103/50 , G02B27/283
摘要： A dual-beam laser cutting system uses laser beam polarization to output two identical laser beams. The dual identical laser beams are spaced appropriately to simultaneously cut a water thus increasing the laser cutting system's throughput as compared to a single-laser cutting system. In one implementation, the dual-beam laser cutting system 100 utilizes a beam expander 220, two half-wave plates 224, 238, a polarizing beam splitter 228, a mirror 236, and two lenses 234, 242 to provide two identical laser beams 202, 204 from a single laser source 214. The identical laser beams 202, 204 are tuned to have the same power, cross-sectional diameter, and polarization direction. One of the half-wave plates 224 is rotated to yield laser beams with the same power. The other half-wave plate 238 is rotated to yield laser beams with the same polarization direction.
摘要翻译：双光束激光切割系统使用激光束偏振来输出两个相同的激光束。与单激光切割系统相比，双重相同的激光束被适当地间隔开以同时切割水，从而增加激光切割系统的吞吐量。在一个实施方案中，双光束激光切割系统100利用光束扩展器220，两个半波片224,238，偏振分束器228，反射镜236和两个透镜234,242来提供两个相同的激光束202 ，204来自单个激光源214.相同的激光束202,204被调谐为具有相同的功率，横截面直径和偏振方向。半波片224中的一个旋转以产生具有相同功率的激光束。旋转另一个半波片238以产生具有相同偏振方向的激光束。

30. 发明授权

US07898672B1 Real-time scanner-nonlinearity error correction for HDVSI 有权
标题翻译： HDVSI的实时扫描仪 - 非线性误差校正
公开(公告)号：US07898672B1
公开(公告)日：2011-03-01
申请号：US12082846
申请日：2008-04-15
申请人： Dong Chen
发明人： Dong Chen
IPC分类号： G01B11/02
CPC分类号： G01B9/02079 , G01B9/02071 , G01B9/02083 , G01B9/0209 , G01B11/2441
摘要： An error correction for scanner position is implemented by adjusting the filter parameters of the quadrature demodulation module of an HDVSI algorithm using a reference signal from an independent position measurement device (PMD). The step size generated by the PMD at each scanner step is substituted for the nominal scanner step in the quadrature demodulation algorithm calculating phase and in the coherent envelope algorithm calculating peak. This substitution eliminates all errors produced by scanner nonlinearities. Furthermore, over the large number of steps carried out during a normal scanning range, random scanner-position errors (such as produced by vibration and other system noise) are automatically corrected by integration over their normal distribution around the noise-free position value. Therefore, a complete correction of scanner-position error may be achieved using the reference signal.
摘要翻译：通过使用来自独立位置测量装置（PMD）的参考信号调整HDVSI算法的正交解调模块的滤波器参数来实现扫描器位置的纠错。由PMD在每个扫描步骤产生的步长代替正交解调算法计算阶段中的标称扫描步长，以及相干包络算法计算峰值。此替代消除了扫描仪非线性产生的所有错误。此外，在正常扫描范围内执行的大量步骤中，通过在其无噪声位置值周围的正态分布上的积分自动校正随机扫描仪位置误差（例如由振动和其他系统噪声产生的）误差。因此，可以使用参考信号来实现扫描仪位置误差的完全校正。

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