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    • 30. 发明授权
    • Apparatus for low-temperature epitaxy on a plurality semiconductor substrates
    • 用于在多个半导体衬底上进行低温外延的装置
    • US08932405B2
    • 2015-01-13
    • US11579276
    • 2005-05-10
    • Thomas GrabollaGeorge RitterBernd Tillack
    • Thomas GrabollaGeorge RitterBernd Tillack
    • C23C16/00C23C16/54C30B25/08
    • C23C16/54C30B25/08
    • A reactor arrangement for layer deposition on a plurality of substrates (hereafter substrates) comprising a first reactor chamber for simultaneous cleaning the substrates, at least one second reactor chamber for depositing at least one layer on each of the substrates, a first heating device for setting the substrate temperature of the substrates in the first reactor chamber, a second heating device for setting the substrate temperature of the substrates in the second reactor chamber, a device for producing a gas atmosphere of predetermined composition and predetermined pressure, a transport device for transporting the substrates simultaneously from the first to the second reactor chamber, and a control device for controlling the heating devices and device for producing the gas atmosphere in such a way that the substrates are moved or stored in an interruption-free manner in a reducing gas atmosphere as long as the substrate temperature is above critical temperature Tc.
    • 一种反应器装置,用于在多个基板(以下称为基板)上层压沉积,该基板包括用于同时清洁基板的第一反应器室,用于在每个基板上沉积至少一层的至少一个第二反应室,用于设定的第一加热装置 第一反应器室中的基板的基板温度,用于设定第二反应器室中的基板的基板温度的第二加热装置,用于制造预定组成和预定压力的气体气氛的装置,用于输送 基板同时从第一反应室到第二反应室,以及控制装置,用于控制加热装置和用于产生气体气氛的装置,使得基板在还原气体气氛中以无中断的方式移动或储存,如 只要衬底温度高于临界温度Tc。