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    • 21. 发明授权
    • Process for producing sulfuric acid with low levels of niter
    • 生产硫酸水平低的方法
    • US09499405B2
    • 2016-11-22
    • US14642840
    • 2015-03-10
    • E I DU PONT DE NEMOURS AND COMPANY
    • Hasan Dindi
    • C01B17/90C01B17/94
    • C01B17/90
    • This disclosure relates to a process for producing sulfuric acid with reduced levels of niter. The process involves (a) providing an absorption tower wherein sulfur trioxide is absorbed in a sulfuric acid feed having a first sulfuric acid solution to produce a sulfuric acid effluent having (i) a second sulfuric acid solution which has a higher concentration than the first sulfuric acid solution, (ii) a niter concentration greater than about 5 ppm (as NO3), and (iii) a temperature greater than 100° C.; and (b) contacting a first purifying agent comprising sulfamic acid and a second purifying agent comprising hydrogen peroxide with the sulfuric acid effluent to form a treated sulfuric acid effluent, the treated sulfuric acid effluent being maintained at a temperature of greater than 100° C. for a maintenance period of at least about 1 minute.
    • 本公开涉及一种生产硫酸水平降低的方法。 该方法包括(a)提供吸收塔,其中三氧化硫被吸收在具有第一硫酸溶液的硫酸进料中以产生硫酸流出物,其具有(i)比第一硫酸更高的浓度的第二硫酸溶液 酸溶液,(ii)大于约5ppm的硝酸盐浓度(作为NO 3),和(iii)大于100℃的温度; 和(b)使包含氨基磺酸的第一纯化剂和包含过氧化氢的第二纯化剂与硫酸流出物接触以形成经处理的硫酸流出物,处理的硫酸流出物保持在大于100℃的温度。 维持期至少约1分钟。
    • 26. 发明申请
    • PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    • 用于制造包含层的工艺和材料及其制品
    • US20130323880A1
    • 2013-12-05
    • US13981327
    • 2012-02-10
    • Nora Sabina RaduKyung-Ho ParkAdam FennimoreKerwin D. Dobbs
    • Nora Sabina RaduKyung-Ho ParkAdam FennimoreKerwin D. Dobbs
    • H01L51/00
    • H01L51/0002G03F7/038G03F7/0755G03F7/325H01L51/0003H01L51/0059H01L51/56
    • There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer. The priming material has at least one unit of Formula I In Formula I: R1 through R6 are D, alkyl, aryl, or silyl, where adjacent R groups can join together to form an aromatic ring; X is a single bond, H, D, or a leaving group; Y is H, D, alkyl, aryl, silyl, or vinyl; a-f are an integer from 0-4; m, p and q are an integer of 0 or greater.
    • 提供了一种用于在第一层上形成包含的第二层的方法,包括以下步骤:形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层,导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层,从而产生具有显影起泡层图案的第一层,其中显影起始层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的显影起始层的图案上的液体沉积形成第二层。 起始材料具有式I中至少一个单元。在式I中:R 1至R 6为D,烷基,芳基或甲硅烷基,其中相邻的R基团可以连接在一起形成芳环; X是单键,H,D或离去基团; Y是H,D,烷基,芳基,甲硅烷基或乙烯基; a-f是0-4的整数; m,p和q是0以上的整数。
    • 27. 发明申请
    • PROCESS FOR CONTROLLING PARTICLE SIZE AND ADDITIVE COVERAGE IN THE PREPARATION OF TITANIUM DIOXIDE
    • 二氧化钛制备过程中颗粒尺寸和添加剂含量的控制
    • US20130284067A1
    • 2013-10-31
    • US13978279
    • 2012-01-06
    • Charles David MusickRobert A. Johns
    • Charles David MusickRobert A. Johns
    • C09C3/06
    • C09C3/063C01G23/07C01P2002/52C01P2004/84C08K3/22C09C1/3653
    • The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising: reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid titanium dioxide precursor and a liquid or finely divided solid compound comprising a element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, 5, K, Ca, Sc, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, and Pb, into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200 ° C. to about 1600 CC to produce titanium dioxide particles that are coated by the oxide formed from the element.
    • 本公开内容涉及用于生产基本上无锐钛型二氧化钛颜料的气相方法,其包括:在反应器中使蒸气二氧化钛前体和含氧气体反应; 并引入液态二氧化钛前体和液体或微细固体化合物的混合物,其包含选自Li,Be,B,Na,Mg,Al,P,5,K,Ca,Sc,V, Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge,As,Se,Rb,Sr,Y,Zr,Nb,Mo,Ru,Rh,Pd,Ag,Cd,In,Sn,Sb, Te,Cs,Ba,La,Ce,Pr,Nd,Sm,Eu,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu,Hf,Ta,W,Re,Os,Ir,Pt,Au, Hg,Tl和Pb在加入气态二氧化钛前体和含氧气体的下游一点处加入反应器中,并且在约1200℃至约1600℃的温度下生产二氧化钛颗粒 其被由元件形成的氧化物涂覆。