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21. 发明授权

US07499162B2 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US07499162B2
公开(公告)日：2009-03-03
申请号：US11475667
申请日：2006-06-26
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

22. 发明授权

US07463350B2 Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal 失效
标题翻译：使用暗场信号和亮场信号来检测样本的缺陷的方法和装置
公开(公告)号：US07463350B2
公开(公告)日：2008-12-09
申请号：US10981721
申请日：2004-11-05
申请人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
发明人： Hidetoshi Nishiyama , Minoru Yoshida , Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/00
CPC分类号： G01N21/95684
摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.
摘要翻译：公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及那么由信号处理单元检测到缺陷。

23. 发明授权

US07274813B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US07274813B2
公开(公告)日：2007-09-25
申请号：US11204181
申请日：2005-08-16
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.
摘要翻译：检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像彼此进行比较，从而可以检查图案。

24. 发明授权

US06674890B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US06674890B2
公开(公告)日：2004-01-06
申请号：US09733092
申请日：2000-12-11
申请人： Shunji Maeda , Kenji Oka , Hiroshi Makihira , Yasuhiko Nakayama , Minoru Yoshida , Yukihiro Shibata , Chie Shishido
发明人： Shunji Maeda , Kenji Oka , Hiroshi Makihira , Yasuhiko Nakayama , Minoru Yoshida , Yukihiro Shibata , Chie Shishido
IPC分类号： G06K900
CPC分类号： G06T7/001 , G01R31/308 , G01R31/311 , G03F7/7065 , G06T7/0004 , G06T2207/10061 , G06T2207/30121 , G06T2207/30148
摘要： A pattern inspection method and apparatus in which an image of a first pattern formed on a sample and an image of a second pattern formed on the sample is detected. At least one of the first pattern image and the second pattern image is converted to a gray level so as to be substantially the same with each other by linear combination including a gain and offset. A defect of the sample is detected by using the first pattern image and the second pattern image at least one of which has been converted to the gray level and a result of the detection is outputted to an external storage or processor by a communication arrangement.
摘要翻译：检测形成在样本上的第一图案的图像和形成在样本上的第二图案的图像的图案检查方法和装置。第一图案图像和第二图案图像中的至少一个被转换为灰度级，以便通过包括增益和偏移的线性组合彼此基本相同。通过使用第一图案图像和其中至少一个已经被转换为灰度级的第二图案图像和通过通信装置将检测结果输出到外部存储器或处理器来检测样本的缺陷。

25. 发明授权

US6091075A Automatic focus detection method, automatic focus detection apparatus, and inspection apparatus 失效
标题翻译：自动对焦检测方法，自动对焦检测装置和检查装置
公开(公告)号：US6091075A
公开(公告)日：2000-07-18
申请号：US87901
申请日：1998-06-01
申请人： Yukihiro Shibata , Shunji Maeda , Hiroshi Makihara , Minoru Yoshida , Yasuhiko Nakayama , Kenji Oka
发明人： Yukihiro Shibata , Shunji Maeda , Hiroshi Makihara , Minoru Yoshida , Yasuhiko Nakayama , Kenji Oka
IPC分类号： G01N21/95 , G02B21/24 , G01N21/00 , G01N21/88
CPC分类号： G02B21/241 , G01N21/9501
摘要： An automatic focus detection method comprises the steps of: irradiating onto a single spot of a sample a plurality of beams of illuminating light transmitted and condensed through an objective lens in a symmetrically diagonal manner with respect to an optical axis of the objective lens; branching reflected light from the same spot of the illuminated sample after transmission through the objective lens, in directions of illumination symmetrical with respect to the optical axis so as to obtain a plurality of optical images; and causing a photoelectric conversion device to receive the branched optical images for conversion to an electric signal representing light intensity distribution of the images, whereby a defocus of the sample is detected based on a discrepancy between the optical axis and the center of the light intensity distribution.
摘要翻译：一种自动对焦检测方法，包括以下步骤：以相对于物镜的光轴对称对角线的方式，将通过物镜透射和聚光的多束照明光照射在样品的单个点上; 在相对于光轴对称的照明方向透射物镜之后，将来自照射样品的同一点的反射光分支，以获得多个光学图像; 并且使光电转换装置接收用于转换为表示图像的光强度分布的电信号的分支光学图像，由此基于光轴和光强度分布的中心之间的差异来检测样品的散焦。

26. 发明授权

US07916929B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US07916929B2
公开(公告)日：2011-03-29
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并且针对样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

27. 发明申请

US20090214102A1 DEFECT INSPECTION METHOD AND APPARATUS 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US20090214102A1
公开(公告)日：2009-08-27
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译：一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并指示到样本的不同部分上的相似图案，以便更紧密地匹配亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。

28. 发明申请

US20080101685A1 DEFECT INSPECTION METHOD AND APPARATUS 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US20080101685A1
公开(公告)日：2008-05-01
申请号：US11858215
申请日：2007-09-20
申请人： Shunji MAEDA , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji MAEDA , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns to detect a defect of the patterns by using information of a scattered diagram of brightness of said first and second images.
摘要翻译：通过使用所述第一和第二图像的亮度的散射图的信息来检查图案以检测图案的缺陷的方法。

29. 发明授权

US07092095B2 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US07092095B2
公开(公告)日：2006-08-15
申请号：US10761493
申请日：2004-01-20
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus can detect finer defects with high resolution optical images of those defects. The apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. A display displays the optical image detected by this lighting and detecting apparatus. An optical parameter setting device sets and displays optical parameters for the lighting and detecting apparatus on the display. An optical parameter adjusting apparatus adjusts optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus. A storage device stores comparative image data. A defect detecting device detects defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：缺陷检查装置可以利用这些缺陷的高分辨率光学图像检测更细的缺陷。该装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。显示器显示由该照明和检测装置检测的光学图像。光学参数设定装置在显示器上设置并显示照明和检测装置的光学参数。光学参数调整装置根据由光学参数设定装置设定的光学参数来调整对照明和检测装置设定的光学参数。存储装置存储比较图像数据。缺陷检测装置通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

30. 发明申请

US20060012780A1 Method and apparatus for inspecting pattern defects 失效
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20060012780A1
公开(公告)日：2006-01-19
申请号：US11180536
申请日：2005-07-14
申请人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
发明人： Hidetoshi Nishiyama , Yukihiro Shibata , Shunji Maeda , Minoru Yoshida
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译：检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。然后，在信号处理单元中检测到缺陷。此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。

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