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    • 22. 发明申请
    • Extreme ultraviolet light source apparatus and nozzle protection device
    • 极紫外光源设备和喷嘴保护装置
    • US20100019173A1
    • 2010-01-28
    • US12385955
    • 2009-04-24
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • G21F5/02F28D15/00
    • H05G2/003H05G2/006
    • A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    • 一种喷嘴保护装置,其能够保护目标喷嘴免受等离子体的热量的干扰,而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元,该冷却单元形成有用于使目标材料通过的开口,并且其形成有用于使冷却介质在内部循环的流路;以及致动器,其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间,同时确保所述目标材料在所述冷却单元中的路径。
    • 27. 发明授权
    • Extreme ultraviolet light source apparatus and nozzle protection device
    • 极紫外光源设备和喷嘴保护装置
    • US08003962B2
    • 2011-08-23
    • US12385955
    • 2009-04-24
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • Hiroshi SomeyaTamotsu AbeHideo Hoshino
    • A61N5/06G01J3/10H05G2/00
    • H05G2/003H05G2/006
    • A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    • 一种喷嘴保护装置,其能够保护目标喷嘴免受等离子体的热量的干扰,而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元,该冷却单元形成有用于使目标材料通过的开口,并且其形成有用于使冷却介质在内部循环的流路;以及致动器,其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间,同时确保所述目标材料在所述冷却单元中的路径。