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    • 29. 发明授权
    • Photosensitive composition and a pattern forming process using the same
    • 光敏组合物和使用其的图案形成方法
    • US06197473B1
    • 2001-03-06
    • US09154733
    • 1998-09-17
    • Naoko KiharaSatoshi SaitoToru Ushirogouchi
    • Naoko KiharaSatoshi SaitoToru Ushirogouchi
    • G03F7023
    • G03F7/0045G03F7/022Y10S430/106
    • The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.
    • 本发明的目的是提供一种对有机溶剂以及碱性显影剂或pH11或更低的水基显影剂具有高溶解度的光敏组合物,并提供用于获得高分辨抗蚀剂图案的图案形成方法 这些目的通过光敏组合物实现,该组合物包含在室温下为玻璃状的化合物,并且具有带有三个或更多个含有酸可分解取代基的芳环的环状结构,以及图案形成方法,其中使用所述感光 组合物暴露于光图案,并用碱的水溶液或pH11或更低的水性显影剂显影。