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    • 22. 发明授权
    • Plasma display device
    • 等离子显示装置
    • US06747408B2
    • 2004-06-08
    • US09995386
    • 2001-11-26
    • Wen-Fa SungYao-Ching SuJin-Yuh Lu
    • Wen-Fa SungYao-Ching SuJin-Yuh Lu
    • H01J1749
    • H01J9/242H01J2211/36
    • A plasma display device is disclosed. The plasma display device has a first panel and a second panel parallel to each other. A dielectric layer is formed on the second panel, a plurality of barrier ribs are formed on the dielectric layer, and a plurality of buffer layers are formed opposite to the barrier ribs. The buffer layers have a first softening temperature, the barrier ribs have a second softening temperature, and the first softening temperature is lower than the second softening temperature. The buffer layers can be deformed and compressed at a temperature higher than the first softening temperature during a process for sealing the first and second panels, so as to unify heights of the barrier ribs.
    • 公开了一种等离子体显示装置。 等离子体显示装置具有彼此平行的第一面板和第二面板。 在第二面板上形成有电介质层,在电介质层上形成有多个阻挡肋,与阻挡肋相对地形成有多个缓冲层。 缓冲层具有第一软化温度,隔壁具有第二软化温度,第一软化温度低于第二软化温度。 在密封第一和第二面板的过程中,缓冲层可以在高于第一软化温度的温度下变形和压缩,以便统一隔壁的高度。
    • 23. 发明授权
    • Method of fabricating a front plate for a plasma display panel
    • 制造等离子体显示面板的前板的方法
    • US06113449A
    • 2000-09-05
    • US351969
    • 1999-07-12
    • Wen-Fa SungJin-Yuh LuYao-Ching Su
    • Wen-Fa SungJin-Yuh LuYao-Ching Su
    • H01J9/02
    • H01J9/02H01J2211/38H01J2217/49207
    • A front plate for a plasma display panel (PDP) and its modified fabricating method are provided using a backside exposure process and an appropriate processing sequence rearrangement to reduce the number of photomasks required and improve the accuracy of exposure and developing process. First, a light-shielding layer is patterned by performing a mesh printing process, or by performing an exposure and developing process using a first photomask, so as to form a light-shielding structure including black stripes and transparent electrodes' gaps. Next, using the light-shielding structure as a mask, a backside exposure and developing process as well as an etching process is performed to form a plurality of pairs of transparent electrodes on the substrate. Then, using a second photomask, another set of exposure, developing and etching processes are performed to form a plurality of pairs of metal electrodes on the corresponding transparent electrodes.
    • 使用背面曝光工艺和适当的处理顺序重排来提供用于等离子体显示面板(PDP)的前板及其改进的制造方法,以减少所需的光掩模的数量并提高曝光和显影处理的准确性。 首先,通过进行网状印刷工艺,或者通过使用第一光掩模进行曝光和显影处理来对遮光层进行图案化,以形成包括黑条纹和透明电极间隙的遮光结构。 接下来,使用遮光结构作为掩模,进行背面曝光和显影处理以及蚀刻处理,以在基板上形成多对透明电极。 然后,使用第二光掩模,执行另一组曝光,显影和蚀刻处理,以在相应的透明电极上形成多对金属电极。