专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US07881010B2 Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
标题翻译：在主极图案化之前，自对准耀斑和屏蔽喉定义的过程
公开(公告)号：US07881010B2
公开(公告)日：2011-02-01
申请号：US11956277
申请日：2007-12-13
申请人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315
摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
摘要翻译：一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

22. 发明申请

US20100163522A1 METHOD FOR MANUFACTURING A WRITE POLE OF A MAGNETIC WRITE HEAD FOR MAGNETIC DATA RECORDING 审中-公开
标题翻译：制造用于磁数据记录的磁头写入头的写入方法
公开(公告)号：US20100163522A1
公开(公告)日：2010-07-01
申请号：US12345804
申请日：2008-12-30
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22 , B05D5/12
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315
摘要： A method for manufacturing a magnetic write head. The write head is constructed by a method that includes depositing a magnetic write pole material and then depositing a hard mask over the magnetic material. An inorganic image transfer layer is formed over the hard mask. SiC, alumina, SiO2, SiN, Ta or TaOx. This image transfer is physically robust, so that it does not bend or tip over during manufacture. The image of a patterned photoresist layer can be transferred onto the underlying image transfer layer, and an ion milling can be performed to pattern the image of the image transfer layer onto the underlying hard mask and magnetic material, thereby forming a magnetic write pole.
摘要翻译：一种用于制造磁写头的方法。写头由包括沉积磁性写入磁极材料然后在磁性材料上沉积硬掩模的方法构成。在硬掩模上形成无机图像转印层。 SiC，氧化铝，SiO2，SiN，Ta或TaOx。这种图像传输是物理上坚固的，因此它在制造过程中不会弯曲或翻倒。图案化的光致抗蚀剂层的图像可以转移到下面的图像转印层上，并且可以执行离子研磨以将图像转印层的图像图案化到下面的硬掩模和磁性材料上，从而形成磁性写入极。

23. 发明申请

US20100155364A1 MAGNETIC WRITE HEAD HAVING A STEPPED TRAILING SHIELD AND WRITE POLE WITH A SLOPED TRAILING EDGE 审中-公开
标题翻译：带有斜坡跟踪边缘的步进式护栏和写字槽的磁性写头
公开(公告)号：US20100155364A1
公开(公告)日：2010-06-24
申请号：US12343726
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge.
摘要翻译：一种用于制造具有锥形后缘的写入极和具有偏离磁性写入极的倾斜凸起结构的后部缠绕磁屏蔽的磁性写入头的方法。该方法包括首先形成写磁极和非磁性侧隙层，然后沉积非磁性RIEable材料。在RIEable材料上形成掩模，并执行反应离子蚀刻（RIE）以将RIEable材料层形成为具有锥形前边缘的非磁性凸块。

24. 发明授权

US08189292B2 Method for manufacturing a magnetic write head having a write pole with a trailing edge taper using a Rieable hard mask 有权
标题翻译：一种使用可重构硬掩模制造具有后缘锥形的写极的磁写头的方法
公开(公告)号：US08189292B2
公开(公告)日：2012-05-29
申请号：US12343723
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
摘要翻译：一种用于制造磁头的方法，该写磁头具有带锥形的阶梯式后缘的写极。该方法包括将磁性写入磁极材料沉积在衬底上，然后在磁性写入磁极材料上形成磁性阶梯结构。然后形成掩模结构，其包括形成在磁性写入磁极材料和磁性步骤结构之上的多层硬掩模。然后执行离子铣削工艺以去除写入极材料的一部分以限定写入极。可以沉积非磁性材料并进行离子铣削以在写入极的两侧形成非磁性侧隙层。然后可以执行多步反应离子研磨过程，以从写极上去除剩余的硬掩模。

25. 发明申请

US20100155363A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A TRAILING EDGE TAPER USING A RIEABLE HARD MASK 有权
标题翻译：使用可弯曲硬掩模制造具有跟踪边缘的磁头的磁头写入头的方法
公开(公告)号：US20100155363A1
公开(公告)日：2010-06-24
申请号：US12343723
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole.
摘要翻译：一种用于制造磁头的方法，该写磁头具有带锥形的阶梯式后缘的写极。该方法包括将磁性写入磁极材料沉积在衬底上，然后在磁性写入磁极材料上形成磁性阶梯结构。然后形成掩模结构，其包括形成在磁性写入磁极材料和磁性步骤结构之上的多层硬掩模。然后执行离子铣削工艺以去除写入极材料的一部分以限定写入极。可以沉积非磁性材料并进行离子铣削以在写入极的两侧形成非磁性侧隙层。然后可以执行多步反应离子研磨过程，以从写极上去除剩余的硬掩模。

26. 发明授权

US08136228B2 Method for manufacturing a magnetic write head 有权
标题翻译：磁写头制造方法
公开(公告)号：US08136228B2
公开(公告)日：2012-03-20
申请号：US12343713
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.
摘要翻译：一种用于制造写磁头的磁头的方法，其避免了写磁极定义期间与栅栏结构的形成有关的挑战。沉积磁性写入极材料。掩模结构沉积在磁性写入极材料上。掩模结构包括第一硬掩模，标记层，物理上坚固的无机RIEable图像转印层，图像转印层上方的第二硬掩模结构和在第二硬掩模上的光致抗蚀剂层。可以使用反应离子蚀刻工艺将光致抗蚀剂掩模和第二硬掩模层的图像转印到图像转印层上。执行离子铣削以限定写入极。沉积一层非磁性材料如氧化铝。进行离子研磨直到达到标记层，并执行另一反应离子蚀刻以除去剩余的硬掩模。

27. 发明申请

US20100155367A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A HARD MASK DEFINED WRITE POLE TRAILING EDGE STEP 有权
标题翻译：制造具有硬掩模的磁头写入头的方法定义的写入轨迹边缘步
公开(公告)号：US20100155367A1
公开(公告)日：2010-06-24
申请号：US12343720
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/315 , G11B5/3163 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.
摘要翻译：一种用于制造具有具有锥形后缘台阶的写极的磁写头的方法。所产生的锥形后沿步骤通过防止磁极尖端的写极的磁饱和而使非常小的位尺寸的写入场最大化。该方法包括沉积磁性写入磁极材料，然后在磁性写入磁极材料上沉积磁性材料。 RIE掩模和硬掩模沉积在磁性凸块材料上。在RIE掩模和硬掩模上形成抗蚀剂掩模，并且执行反应离子蚀刻以将抗蚀剂掩模的图案转移到下面的硬掩模上。然后执行离子铣削以形成具有锥形边缘的磁性阶梯层，其限定了写入极的锥形后缘阶梯结构。

28. 发明申请

US20100155232A1 METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE TRAILING EDGE TAPER 审中-公开
标题翻译：制造具有写波纹边缘磁头的磁头写头的方法
公开(公告)号：US20100155232A1
公开(公告)日：2010-06-24
申请号：US12343014
申请日：2008-12-23
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： C23C14/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , G11B5/315 , H01F41/34
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic data recording, having a write pole with a tapered trailing edge for improved write field at small bit lengths. The trailing edge taper is formed by a deposition process that can be performed after the write pole flare point has already been formed, and especially after a wrap around shield side gap has been formed. This advantageously allows the distance between the write pole flare point and the trailing edge taper to be closely controlled.
摘要翻译：一种用于制造用于垂直磁数据记录的磁写头的方法，具有带有锥形后缘的写极，以便以较小的位长改善写入场。后缘锥形是通过可以在已经形成写入磁极扩张点之后进行的沉积工艺形成的，特别是在形成了围绕屏蔽侧间隙之后。这有利地允许密切控制写磁极扩张点和后缘锥度之间的距离。

29. 发明申请

US20090152234A1 PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING 有权
标题翻译：自动对准点的过程和主要绘图前的屏蔽定义
公开(公告)号：US20090152234A1
公开(公告)日：2009-06-18
申请号：US11956277
申请日：2007-12-13
申请人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315
摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
摘要翻译：一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

30. 发明申请

US20090139080A1 FENCELESS MAIN POLE DEFINITION FOR ADVANCED PERPENDICULAR MAGNETIC WRITE HEAD 有权
标题翻译：高级磁性写字头的无缝主要定义
公开(公告)号：US20090139080A1
公开(公告)日：2009-06-04
申请号：US12343713
申请日：2008-12-24
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.
摘要翻译：一种用于制造写磁头的磁头的方法，其避免了写磁极定义期间与栅栏结构的形成有关的挑战。沉积磁性写入极材料。掩模结构沉积在磁性写入极材料上。掩模结构包括第一硬掩模，标记层，物理上坚固的无机RIEable图像转印层，图像转印层上方的第二硬掩模结构和在第二硬掩模上的光致抗蚀剂层。可以使用反应离子蚀刻工艺将光致抗蚀剂掩模和第二硬掩模层的图像转印到图像转印层上。执行离子铣削以限定写入极。沉积一层非磁性材料如氧化铝。进行离子研磨直到达到标记层，并执行另一反应离子蚀刻以除去剩余的硬掩模。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式