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21. 发明授权

US08541310B2 CMP compositions containing a soluble peroxometalate complex and methods of use thereof 有权
标题翻译：含有可溶性过氧金属酸盐络合物的CMP组合物及其使用方法
公开(公告)号：US08541310B2
公开(公告)日：2013-09-24
申请号：US11800188
申请日：2007-05-04
申请人： Daniela White , John Parker
发明人： Daniela White , John Parker
IPC分类号： H01L21/32 , H01L21/461 , B44C1/22 , C23F1/00 , C23F15/00
CPC分类号： H01L21/3212 , C09G1/02
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition for polishing a ruthenium-containing substrate in the presence of hydrogen peroxide without forming a toxic level of ruthenium tetroxide during the polishing process. The composition comprises (a) a catalytic oxidant comprising a water-soluble peroxometalate complex, an oxidizable precursor of a peroxometalate complex, or a combination thereof, (b) a particulate abrasive; and (c) an aqueous carrier. The peroxometalate complex and the precursor thereof each have a reduced form that is oxidizable by hydrogen peroxide to regenerate the peroxometalate complex during chemical-mechanical polishing. CMP methods for polishing ruthenium-containing surfaces with the CMP composition are also provided.
摘要翻译：本发明提供了一种用于在过氧化氢存在下抛光含钌底物的化学机械抛光（CMP）组合物，而在抛光过程中不形成四氧化钌的毒性水平。组合物包含（a）催化氧化剂，其包含水溶性过氧金属酸盐络合物，过氧金属酸盐络合物的可氧化前体或其组合，（b）颗粒磨料; 和（c）水性载体。过氧金属酸盐络合物及其前体各自具有通过过氧化氢可氧化的还原形式，以在化学机械抛光期间再生过氧金属酸盐络合物。还提供了用CMP抛光含钌表面的CMP方法。

22. 发明授权

US08008202B2 Ruthenium CMP compositions and methods 有权
标题翻译：钌CMP组合物和方法
公开(公告)号：US08008202B2
公开(公告)日：2011-08-30
申请号：US11888406
申请日：2007-08-01
申请人： Daniela White , John Parker
发明人： Daniela White , John Parker
IPC分类号： B24D3/34 , H01L21/302
CPC分类号： H01L21/3212 , B24B37/044 , C09G1/02 , C09K3/1463 , C23F3/04
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition for polishing a ruthenium-containing substrate in the presence of an oxidizing agent such as hydrogen peroxide without forming a toxic level of ruthenium tetroxide during the polishing process. The composition comprises a particulate abrasive (e.g., silica, alumina, and/or titania) suspended in an aqueous carrier containing a ruthenium-coordinating oxidized nitrogen ligand (N—O ligand), such as a nitroxide (e.g., 4-hydroxy-TEMPO). In the presence of the oxidizing agent, the N—O ligand prevents the deposition of ruthenium species having an oxidation state of IV or higher on the surface of the substrate, and concomitantly forms a soluble Ru(II) N—O coordination complex with oxidized ruthenium formed during CMP of the substrate. CMP methods for polishing ruthenium-containing surfaces with the CMP composition are also provided.
摘要翻译：本发明提供了一种用于在氧化剂如过氧化氢存在下抛光含钌底物的化学机械抛光（CMP）组合物，而在抛光过程中不形成四氧化钌的毒性水平。该组合物包含悬浮在含有钌配位的氧化氮配体（N-O配体）如氮氧根（例如4-羟基-TEMPO）的含水载体中的颗粒磨料（例如二氧化硅，氧化铝和/或二氧化钛））。在氧化剂存在下，N-O配位体可以防止在基片表面沉积氧化态为Ⅳ或更高的钌物质，同时形成可氧化的Ru（II）N-O配位络合物在基板的CMP期间形成钌。还提供了用CMP抛光含钌表面的CMP方法。

23. 发明授权

US07994057B2 Polishing composition and method utilizing abrasive particles treated with an aminosilane 有权
标题翻译：使用用氨基硅烷处理的磨料颗粒的抛光组合物和方法
公开(公告)号：US07994057B2
公开(公告)日：2011-08-09
申请号：US12234173
申请日：2008-09-19
申请人： Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
发明人： Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1436 , H01L21/31053
摘要： The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.
摘要翻译：本发明的方法包括用本发明的抛光组合物对基材进行化学机械抛光，所述抛光组合物包括已经用氨基硅烷化合物处理的液体载体，阳离子聚合物，酸和磨料颗粒。

24. 发明申请

US20090035942A1 Ruthenium CMP compositions and methods 有权
标题翻译：钌CMP组合物和方法
公开(公告)号：US20090035942A1
公开(公告)日：2009-02-05
申请号：US11888406
申请日：2007-08-01
申请人： Daniela White , John Parker
发明人： Daniela White , John Parker
IPC分类号： B24D3/34 , H01L21/302
CPC分类号： H01L21/3212 , B24B37/044 , C09G1/02 , C09K3/1463 , C23F3/04
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition for polishing a ruthenium-containing substrate in the presence of an oxidizing agent such as hydrogen peroxide without forming a toxic level of ruthenium tetroxide during the polishing process. The composition comprises a particulate abrasive (e.g., silica, alumina, and/or titania) suspended in an aqueous carrier containing a ruthenium-coordinating oxidized nitrogen ligand (N—O ligand), such as a nitroxide (e.g., 4-hydroxy-TEMPO). In the presence of the oxidizing agent, the N—O ligand prevents the deposition of ruthenium species having an oxidation state of IV or higher on the surface of the substrate, and concomitantly forms a soluble Ru(II) N—O coordination complex with oxidized ruthenium formed during CMP of the substrate. CMP methods for polishing ruthenium-containing surfaces with the CMP composition are also provided.
摘要翻译：本发明提供了一种用于在氧化剂如过氧化氢的存在下抛光含钌底物的化学 - 机械抛光（CMP）组合物，而在抛光过程中不形成四氧化钌的毒性水平。组合物包含悬浮在含有钌配位的氧化氮配体（N-O配体）如氮氧根（例如4-羟基-TEMPO）的含水载体中的颗粒磨料（例如二氧化硅，氧化铝和/或二氧化钛）。在氧化剂的存在下，NO配体防止了在基板表面上具有IV或更高氧化态的钌物质的沉积，同时形成了在CMP期间形成的氧化钌的可溶性Ru（II）NO配位络合物的基底。还提供了用CMP抛光含钌表面的CMP方法。

25. 发明授权

US06472085B2 Thermosetting compositions containing epoxy functional polymers prepared by atom transfer radical polymerization 失效
标题翻译：含有通过原子转移自由基聚合制备的环氧官能聚合物的热固性组合物
公开(公告)号：US06472085B2
公开(公告)日：2002-10-29
申请号：US09864904
申请日：2001-05-24
申请人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
发明人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
IPC分类号： B32B1508
CPC分类号： C08G59/3209 , C08G59/4207 , Y10T428/31699 , Y10T428/31928
摘要： A multi-component composite coating composition comprising a base coat deposited from a pigmented film-forming composition and a transparent top coat applied over the base coat in which the base coat is a thermosetting composition comprising a co-reactable solid, particulate mixture of (i) an epoxy functional polymer containing at least one of the polymer chain structures -[(M)p-(G)q]x- or -[(G)q-(M)p]x- wherein M is an oxirane-free residue of at least one ethylenically unsaturated monomer, G is a glycidyl-functional ethylenically unsaturated monomer, p and q each independently has a value of 0 to typically less than 100, and x has a value of at least 1 to typically less than 100, the total value of p, q and x selected such that said epoxy functional polymer has a number average molecular weight of at least 250, and (ii) a co-reactant having functional groups reactive with the epoxy groups of (i). The epoxy functional polymer is prepared by atom transfer radical polymerization and has a polydispersity index of less than 2.5.
摘要翻译：一种多组分复合涂料组合物，其包含从着色成膜组合物沉积的底涂层和涂覆在底涂层上的透明顶涂层，其中底涂层为热固性组合物，其包含可共反应的固体，（i ）包含至少一种聚合物链结构的环氧官能聚合物 - [（M）p-（G）q] x-或 - [（G）q-（M）p] x-，其中M是无环氧乙烷至少一种烯属不饱和单体的残基，G是缩水甘油基官能的烯属不饱和单体，p和q各自独立地具有0至典型地小于100的值，x具有至少1至通常小于100的值，所选择的p，q和x的总值使得所述环氧官能聚合物的数均分子量至少为250，和（ii）具有与（i）的环氧基反应的官能团的共反应物。环氧官能聚合物通过原子转移自由基聚合制备，多分散指数小于2.5。

26. 发明授权

US06339126B1 Thermosetting compositions containing carboxylic acid functional polymers prepared by atom transfer radical polymerization 失效
公开(公告)号：US06339126B1
公开(公告)日：2002-01-15
申请号：US09375014
申请日：1999-08-16
申请人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
发明人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
IPC分类号： C08L5100
CPC分类号： C09D133/02 , C09D133/064 , Y10T428/31551 , Y10T428/31725 , Y10T428/31786 , Y10T428/31855 , C08L2666/36
摘要： A thermosetting composition comprising a co-reactable solid, particulate mixture of (a) beta-hydroxyalkylamide crosslinking agent, e.g., bis(N,N-di-2-hydroxyethyl)adipamide, and (b) polycarboxylic acid functional polymer, is described. The polycarboxylic acid functional polymer is prepared by atom transfer radical polymerization and has well defined polymer chain architecture and polydispersity index of less than 2.5. The thermosetting compositions of the present invention have utility as powder coatings compositions.

27. 发明授权

US06306965B1 Thermosetting compositions containing carbamate-functional polylmers prepared using atom transfer radical polymerization 失效
标题翻译：含有使用原子转移自由基聚合制备的氨基甲酸酯官能聚合物的热固性组合物
公开(公告)号：US06306965B1
公开(公告)日：2001-10-23
申请号：US09375020
申请日：1999-08-16
申请人： Lawrence G. Anderson , James B. O'Dwyer , Dennis A. Simpson , Daniela White
发明人： Lawrence G. Anderson , James B. O'Dwyer , Dennis A. Simpson , Daniela White
IPC分类号： C08F830
CPC分类号： C08F220/36 , C08G18/3831 , C09D201/025
摘要： A thermosetting composition is provided comprising: (a) a crosslinking agent having at least two functional groups that are reactive with carbamates; and (b) a non-gelled, carbamate functional polymer prepared by atom transfer radical polymerization, in the presence of an initiator having at least one radically transferable group. The polymer contains at least one of the following polymer chain structures: —{(M)p—(G)q}x— or —{(G)q—(M)p}x— wherein M is a residue, that is free of carbamate functionality, of at least one ethylenically unsaturated radically polymerizable monomer; G is a residue, that has carbamate functionality, of at least one ethylenically unsaturated radically polymerizable monomer; p and q represent average numbers of residues occurring in a block of residues in each polymer chain structure; and p, q, and x are each independently selected for each structure such that the carbamate functional polymer has a number average molecular weight of at least 250. Also provided by the present invention are methods of coating a substrate using compositions of the present invention and substrates coated by such methods, as well as color-plus-clear composite coatings.
摘要翻译：提供一种热固性组合物，其包括：（a）具有至少两个与氨基甲酸酯反应的官能团的交联剂; 和（b）在具有至少一个可自由基转移基团的引发剂的存在下通过原子转移自由基聚合制备的非胶凝的氨基甲酸酯官能聚合物。所述聚合物含有至少一种以下聚合物链结构：或其中M是不含氨基甲酸酯官能团的至少一种烯属不饱和自由基聚合单体的残基; G是具有氨基甲酸酯官能团的至少一种烯属不饱和自由基聚合单体的残基; p和q表示在每个聚合物链结构的残基块中发生的残基的平均数目; 对于每种结构，p，q和x各自独立地选择，使得氨基甲酸酯官能聚合物的数均分子量至少为250.本发明还提供了使用本发明的组合物涂覆底物的方法和通过这些方法涂覆的基材，以及彩色 - 透明复合涂层。

28. 发明授权

US06268433B1 Thermosetting compositions containing epoxy functional polymers prepared by atom transfer radical polymerization 失效
标题翻译：含有通过原子转移自由基聚合制备的环氧官能聚合物的热固性组合物
公开(公告)号：US06268433B1
公开(公告)日：2001-07-31
申请号：US09375013
申请日：1999-08-16
申请人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
发明人： Karen A. Barkac , Simion Coca , James R. Franks , Kurt A. Humbert , Paul H. Lamers , Roxalana L. Martin , James B. O'Dwyer , Kurt G. Olson , Daniela White
IPC分类号： C08L3314
CPC分类号： C08G59/3209 , C08G59/4207 , Y10T428/31699 , Y10T428/31928
摘要： A thermosetting composition useful as a powder coating comprises a co-reactable solid, particulate mixture of (a) an epoxy functional polymer containing at least one of the polymer chain structures -[(M)p-(G)q]x- or -[(G)q-(M)p]x- wherein M is an oxirane-free residue of at least one ethylenically unsaturated monomer, G is a glycidyl-functional ethylenically unsaturated monomer, p and q each independently has a value of 0 to typically less than 100, and x has a value of at least 1 to typically less than 100, the total value of p, q and x selected such that said epoxy functional polymer has a number average molecular weight of at least 250, and (b) a co-reactant having functional groups reactive with the epoxy groups of (a), e.g., dodecanedioic acid. The epoxy functional polymer is prepared by atom transfer radical polymerization and a polydispersity index of less than 2.5.
摘要翻译：可用作粉末涂料的热固性组合物包含（a）包含至少一种聚合物链结构 - [（M）p-（G）q] x - 或 - 的聚环氧官能聚合物的可共反应的固体颗粒混合物， [（G）q-（M）p] x-其中M是至少一种烯键式不饱和单体的不含环氧乙烷的残基，G是缩水甘油基官能的烯属不饱和单体，p和q各自独立地为0至通常小于100，并且x具有至少1至通常小于100的值，选择p，q和x的总值使得所述环氧官能聚合物的数均分子量为至少250，并且（b ）具有与（a）的环氧基反应的官能团的共反应物，例如十二烷二酸。环氧官能聚合物通过原子转移自由基聚合和小于2.5的多分散指数制备。

29. 发明授权

US10988718B2 Tungsten post-CMP cleaning composition 有权
公开(公告)号：US10988718B2
公开(公告)日：2021-04-27
申请号：US16308053
申请日：2017-03-09
申请人： ENTEGRIS, INC. , Thomas Parson , Shrane-Ning Jenq , Steven Medd , Daniela White , Michael White , Donald Frye
发明人： Thomas Parson , Shrane-Ning Jenq , Steven Medd , Daniela White , Michael White , Donald Frye
IPC分类号： C11D7/32 , C11D11/00 , C11D3/20 , C11D3/37 , H01L21/02 , C11D1/08 , C11D1/00 , C23F1/26 , C23F1/28 , B08B3/08 , C11D3/04 , C11D3/30 , C11D3/32 , C11D3/33
摘要： A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.

30. 发明授权

US07955520B2 Copper-passivating CMP compositions and methods 有权
标题翻译：铜钝化CMP组合物和方法
公开(公告)号：US07955520B2
公开(公告)日：2011-06-07
申请号：US11986921
申请日：2007-11-27
申请人： Daniela White , Jason Keleher , John Parker
发明人： Daniela White , Jason Keleher , John Parker
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1409 , C23F3/04 , C23F3/06
摘要： The present invention provides chemical-mechanical polishing (CMP) methods and compositions for polishing copper-containing substrates. The methods of the present invention entail abrading a surface of a copper-containing substrate with a CMP composition of the invention, preferably in the presence of an oxidizing agent (e.g., hydrogen peroxide). The CMP compositions of the invention comprise a particulate abrasive, a copper-complexing agent, a copper-passivating agent bearing an acidic OH group and an additional oxygen substituent in a 1,6 relationship to the acidic OH group, and an aqueous carrier. A preferred composition of the invention comprises about 0.01 to about 1 percent by weight of the particulate abrasive, about 0.1 to about 1 percent by weight of the copper-complexing agent, about 10 to about 1000 ppm of the copper-passivating agent.
摘要翻译：本发明提供用于抛光含铜基材的化学机械抛光（CMP）方法和组合物。本发明的方法需要用本发明的CMP组合物，优选在氧化剂（例如过氧化氢）的存在下研磨含铜基材的表面。本发明的CMP组合物包含颗粒磨料，铜络合剂，带有酸性OH基团的铜钝化剂和与酸性OH基团1,6关系的另外的氧取代基和水性载体。本发明的优选组合物包含约0.01至约1重量％的颗粒磨料，约0.1至约1重量％的铜络合剂，约10至约1000ppm的铜钝化剂。

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