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    • 24. 发明申请
    • VAPOR PHASE DEPOSITION PROCESSES FOR DOPING SILICON
    • 用于掺硅的蒸气相沉积工艺
    • US20110124187A1
    • 2011-05-26
    • US12625835
    • 2009-11-25
    • Ali Afzali-ArdakaniDamon B. FarmerLidija Sekaric
    • Ali Afzali-ArdakaniDamon B. FarmerLidija Sekaric
    • H01L21/22
    • H01L21/2254
    • A process of doping a silicon layer with dopant atoms generally includes reacting a vapor of a dopant precursor with oxide and/or hydroxide reactive sites present on the silicon layer to form a self assembled monolayer of dopant precursor; hydrolyzing the self assembled monolayer of the dopant precursor with water vapor to form pendant hydroxyl groups on the dopant precursor; capping the self assembled monolayer with an oxide layer; and annealing the silicon layer at a temperature effective to diffuse dopant atoms from the dopant precursor into the silicon layer. Additional monolayers can be formed in a similar manner, thereby providing controlled layer-by-layer vapor phase deposition of the dopant precursor compounds for controlled doping of silicon.
    • 用掺杂剂原子掺杂硅层的方法通常包括使掺杂剂前体的蒸气与存在于硅层上的氧化物和/或氢氧化物反应性位点反应以形成掺杂剂前体的自组装单层; 用水蒸汽水解掺杂剂前体的自组装单层以在掺杂剂前体上形成侧基羟基; 用氧化物层封闭自组装单层; 以及在有效地将掺杂剂原子从掺杂剂前体扩散到硅层中的温度下退火硅层。 可以以类似的方式形成另外的单层,由此提供受控的掺杂剂前体化合物的逐层气相沉积用于硅的受控掺杂。