会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 24. 发明授权
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • US06057190A
    • 2000-05-02
    • US880989
    • 1997-06-23
    • Naoyuki Yoshida
    • Naoyuki Yoshida
    • H01L27/04H01L21/822H01L21/8242H01L27/108
    • H01L27/10852H01L27/10817
    • In a semiconductor device manufacturing method, a first insulating film is formed on a semiconductor substrate. A contact hole is selectively formed in the first insulating film. A first conductive film is formed on the first insulating film to fill the interior of the contact hole. A second insulating film is formed on the first conductive film. A second conductive film is formed on the second insulating film. The second insulating film and the second conductive film are patterned to leave the second insulating film and the second conductive film only immediately above the contact hole. A third conductive film is formed on the surfaces of the first conductive film, the second insulating film, and the second conductive film. The third conductive film on the first and second conductive films is removed to form a cylindrical lower electrode consisting of the third conductive film left only on the side surfaces of the second insulating film and the second conductive film. An exposed portion of the first conductive film and the second conductive film are removed to expose the first and second insulating films. The second insulating film is removed to expose the first conductive film. A third insulating film and a fourth insulating film serving as an upper electrode are formed.
    • 在半导体器件制造方法中,在半导体衬底上形成第一绝缘膜。 在第一绝缘膜中选择性地形成接触孔。 在第一绝缘膜上形成第一导电膜以填充接触孔的内部。 在第一导电膜上形成第二绝缘膜。 在第二绝缘膜上形成第二导电膜。 图案化第二绝缘膜和第二导电膜,使第二绝缘膜和第二导电膜仅在接触孔的正上方。 在第一导电膜,第二绝缘膜和第二导电膜的表面上形成第三导电膜。 除去第一导电膜和第二导电膜上的第三导电膜,以形成由仅在第二绝缘膜和第二导电膜的侧表面上留下的第三导电膜构成的圆柱形下电极。 去除第一导电膜和第二导电膜的暴露部分以露出第一和第二绝缘膜。 去除第二绝缘膜以露出第一导电膜。 形成作为上电极的第三绝缘膜和第四绝缘膜。
    • 29. 发明授权
    • Process for producing optically active compounds
    • 光学活性化合物的制造方法
    • US4916074A
    • 1990-04-10
    • US113764
    • 1987-10-28
    • Naoyuki YoshidaHiroshi Morita
    • Naoyuki YoshidaHiroshi Morita
    • C09K19/12C12P7/62C12P13/00C12P41/00
    • C12P13/004C09K19/126C12P41/004C12P7/62
    • The present invention provides a process for producing optically active compounds by a biochemical method in which specific compounds having hydroxyl groups are reacted with esters in the presence of enzymes. The compounds have the following general formula. ##STR1## wherein Y is selected from the group consisting halogen atoms, alkyl groups having 1-3 carbon atoms, cyano groups, and trifluoromethyl groups, W is selected from the group consisting substituted phenyl groups, and halogen atoms, cyano, trifluoromethyl and amino groups and alkylamino and alkyloxycarbonyl groups in which alkyl groups have 1-20 carbon atoms, R is methylene and n is 0 or 1.The enzymes having ability of transesterification reaction is preferably lipase, lipoprotein lipase, esterase and so on, and micro-organisms can be used in the above process.
    • 本发明提供了通过生物化学方法制备光学活性化合物的方法,其中具有羟基的特定化合物在酯存在下与酯反应。 该化合物具有以下通式。 其中Y选自卤素原子,具有1-3个碳原子的烷基,氰基和三氟甲基,W选自取代的苯基,卤素原子,氰基,三氟甲基和氨基 基团和其中烷基具有1-20个碳原子的烷基氨基和烷氧基羰基,R是亚甲基,n是0或1.具有酯交换反应能力的酶优选为脂肪酶,脂蛋白脂肪酶,酯酶等,微生物 可用于上述过程。