专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US5182495A Plasma processing method and apparatus using electron cyclotron resonance 失效
标题翻译：使用电子回旋共振的等离子体处理方法和装置
公开(公告)号：US5182495A
公开(公告)日：1993-01-26
申请号：US619338
申请日：1990-11-29
申请人： Takuya Fukuda , Michio Ohue , Tadasi Sonobe
发明人： Takuya Fukuda , Michio Ohue , Tadasi Sonobe
IPC分类号： C23C14/40 , C23C14/34 , C23C14/35 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31
CPC分类号： H01J37/32477 , H01J37/32192 , H01J37/32678 , H01J37/32706 , H01J2237/0206
摘要： In a plasma processing apparatus using ECR, faces in contact with plasma excepting a substance to be processed are covered by an insulating material. By such configuration, discharge caused between the plasma and the substance to be processed in plasma processing is prevented beforehand.
摘要翻译：在使用ECR的等离子体处理装置中，除了被处理物质以外的与等离子体接触的面被绝缘材料覆盖。通过这样的结构，可以预先防止等离子体和等离子体处理物质之间产生的放电。

22. 发明授权

US5162633A Microwave-excited plasma processing apparatus 失效
标题翻译：微波激发等离子体处理装置
公开(公告)号：US5162633A
公开(公告)日：1992-11-10
申请号：US372716
申请日：1989-06-27
申请人： Tadasi Sonobe , Kazuo Suzuki , Takuya Fukuda , Michio Ohue
发明人： Tadasi Sonobe , Kazuo Suzuki , Takuya Fukuda , Michio Ohue
IPC分类号： C23C14/34 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H05B6/80
CPC分类号： H01J37/32678 , H01J37/32192 , H01J37/32238 , H01J37/32697 , H05B6/80
摘要： The present invention relates to a plasma treatment apparatus for making plasma surface processing of a specimen such as thin-film formation, etching, sputtering or plasma oxidation by use of plasma produced through microwave discharge. In a specimen chamber provided with a specimen table for holding at least one specimen thereon, a microwave is introduced from a direction intersecting a magnetic line of force so as to propagate in the longitudinal direction of an ECR region or in a direction along the plane of the ECR region. Since the microwave is introduced from the transverse direction of the specimen chamber, the provision of a microwave introducing window at an upper portion of the specimen chamber is not required and hence a counter electrode for applying an electric field to the specimen can be disposed at the upper portion of the specimen chamber, thereby making it possible to apply a uniform electric field to the specimen so that the specimen is subjected to a uniform treatment.
摘要翻译：本发明涉及一种等离子体处理装置，其用于通过使用通过微波放电产生的等离子体来进行诸如薄膜形成，蚀刻，溅射或等离子体氧化等试样的等离子体表面处理。在设置有用于保持至少一个样本的样本台的样本室中，从与磁力线相交的方向引入微波，以沿ECR区域的纵向方向或沿着ECR区域的平面的方向传播微波 ECR地区。由于微波从试样室的横向导入，因此不需要在试样室的上部设置微波导入窗，因此可以在试样室的上部设置用于向试样施加电场的对电极从而能够对试样施加均匀的电场，使样品经受均匀的处理。

23. 发明授权

US09242818B2 System for and method of transferring plate-shaped member with interleaving paper thereon 有权
标题翻译：用其上的交错纸转移板状构件的系统和方法
公开(公告)号：US09242818B2
公开(公告)日：2016-01-26
申请号：US14123342
申请日：2012-05-16
申请人： Kenji Bando , Takuya Fukuda , Akifumi Wakisaka
发明人： Kenji Bando , Takuya Fukuda , Akifumi Wakisaka
IPC分类号： B65H3/08 , B65G49/06 , B65H3/54 , B65G59/00 , B65G59/04
CPC分类号： B65H3/0816 , B65G49/069 , B65G59/005 , B65G59/04 , B65G2249/045 , B65H3/54 , B65H2701/18264
摘要： In a system for transferring a plate-shaped member with interleaving paper thereon, a suction adhesion device included in a suction adhesion unit includes suction pads that adhere to a surface of a glass plate by suction with interleaving paper in between the surface and the suction pads; an air blowing device blows air between the adhered glass plate and a glass plate positioned below the adhered glass plate; a robot moves the suction adhesion unit; a clamping device includes a pair of pushing members that are arranged at both sides, respectively, of the glass plates and move toward the glass plates to come close to each other; and at least before the suction adhesion unit lifts the adhered glass plate, a controller causes the pair of pushing members to move to push protruding portions of pieces of interleaving paper, the protruding portions protruding from the sides of the glass plates.
摘要翻译：在用于在其上传送具有交错纸的板状构件的系统中，包括在吸附粘合单元中的吸附粘合装置包括吸附垫，其通过抽吸粘附在玻璃板的表面上，其中交错纸位于表面和吸盘之间 ; 吹气装置在粘附的玻璃板和位于粘附玻璃板下方的玻璃板之间吹送空气; 机器人移动吸附粘合单元; 夹持装置包括分别布置在玻璃板的两侧并朝向玻璃板移动以彼此靠近的一对推动构件; 并且至少在吸附粘合单元提升粘附的玻璃板之前，控制器使一对推动构件移动以推动交错纸的突出部分，突出部分从玻璃板的侧面突出。

24. 发明授权

US06278148B1 Semiconductor device having a shielding conductor 失效
标题翻译：具有屏蔽导体的半导体器件
公开(公告)号：US06278148B1
公开(公告)日：2001-08-21
申请号：US09040457
申请日：1998-03-18
申请人： Takao Watanabe , Takuya Fukuda , Norio Hasegawa
发明人： Takao Watanabe , Takuya Fukuda , Norio Hasegawa
IPC分类号： H01L27108
CPC分类号： H01L27/10897 , G11C5/063 , G11C7/02 , G11C11/4097 , H01L23/5225 , H01L23/552 , H01L27/10805 , H01L27/10882 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to a semiconductor device that includes a dynamic memory and logic circuits that are integrated on a single chip and that can avoid noise problems and signal delay. The portion above the memory is shielded with a shielding conductor that is biased to an equipotential. Wirings between logical blocks and bonding pads or between logical blocks are passed over the conductive layer. Wiring for logic circuits can be done in the same metal wiring layer in which the shielding conductor is provided. The shielding conductor can have a mesh-like structure to improve its integrity and wirings can be passed over conductive portions of the shielding layer to be protected from noise. In addition to the dynamic memory, other memories and analog circuits can be used instead of or in combination with the dynamic memory.
摘要翻译：本发明涉及一种半导体器件，其包括集成在单个芯片上并且可以避免噪声问题和信号延迟的动态存储器和逻辑电路。存储器上方的部分用被偏置到等电位的屏蔽导体屏蔽。逻辑块和焊盘之间或逻辑块之间的布线通过导电层。逻辑电路的布线可以在设置有屏蔽导体的同一金属布线层中完成。屏蔽导体可以具有网状结构以改善其完整性，并且布线可以穿过屏蔽层的导电部分以防止噪声。除了动态存储器之外，可以使用其他存储器和模拟电路来代替动态存储器或与动态存储器组合使用。

25. 发明授权

US5745336A Capacitor for semiconductor integrated circuit 失效
标题翻译：半导体集成电路电容器
公开(公告)号：US5745336A
公开(公告)日：1998-04-28
申请号：US417839
申请日：1995-04-06
申请人： Katsuaki Saito , Michio Ohue , Takuya Fukuda , JaiHo Choi , Yukinobu Miyamoto
发明人： Katsuaki Saito , Michio Ohue , Takuya Fukuda , JaiHo Choi , Yukinobu Miyamoto
IPC分类号： H01G7/06 , H01L21/02 , H01L27/115 , H01G4/06
CPC分类号： H01L27/11502 , H01G7/06 , H01L28/55
摘要： A semiconductor integrated circuit apparatus according to the present invention has a capacitor formed in such a manner that a ferroelectric thin film is formed after a MOS transistor has been formed on a substrate thereof, a ferroelectric thin film made of, for example, PbZrTiO.sub.3 or SrTiO.sub.3 or the like is formed into a columnar shape to form electrodes positioned in direct contact with the side wall portions of said columnar ferroelectric thin film and the top portion is removed. As a result, a fact that an oxide of each electrode, which deteriorates the relative permittivity, is formed on the interface between the electrode and the ferroelectric material is prevented, and a large capacity can be realized with respect to the area of the substrate because the ferroelectric thin film is formed into the columnar and elongated shape, resulting in that the capacitance of the capacitor is not reduced in which the electrodes and the oxide dielectric material having a high permittivity are, in series, connected to each other. The capacitor is formed into a DRAM or an FRAM memory cell so as to realize a semiconductor memory revealing a high degree of integration and a high processing speed.
摘要翻译：根据本发明的半导体集成电路装置具有电容器，其形成为在其基板上形成MOS晶体管之后形成铁电薄膜，由例如PbZrTiO 3或SrTiO 3制成的铁电薄膜或类似物形成为柱状，以形成与所述柱状铁电薄膜的侧壁部分直接接触的电极，并且去除顶部部分。结果，防止了在电极和铁电材料之间的界面上形成各种电极的氧化物，导致相对介电常数下降的事实，因此能够相对于基板的面积实现大容量，因为铁电薄膜形成为柱状和细长形状，导致电容器的电容不降低，其中具有高介电常数的电极和氧化物介电材料串联连接。电容器形成为DRAM或FRAM存储单元，以实现显示高集成度和高处理速度的半导体存储器。

26. 发明授权

US5211825A Plasma processing apparatus and the method of the same 失效
标题翻译：等离子体处理装置及其方法相同
公开(公告)号：US5211825A
公开(公告)日：1993-05-18
申请号：US764161
申请日：1991-09-23
申请人： Katsuaki Saito , Takuya Fukuda , Michio Ohue , Tadasi Sonobe
发明人： Katsuaki Saito , Takuya Fukuda , Michio Ohue , Tadasi Sonobe
IPC分类号： C23C16/50 , C23C16/44 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H05H1/46
CPC分类号： H01J37/32862 , C23C16/4405 , C23C16/511 , H01J37/32192 , H01J37/3266 , H05H1/46
摘要： A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:(1) The plasma diameter during the cleaning processing is made larger than that during the sample processing. The end of the plasma during cleaning processing is made to reach the inside wall of the vacuum vessel.(2) The cleaning gas plasma is scanned within the vacuum vessel.
摘要翻译：等离子体处理装置进行样品处理和清洗处理。通过使用电子回旋共振激发在装置的真空容器内产生反应气体等离子体来进行样品处理。进行清洁处理以通过在真空容器内产生清洁气体等离子体来清洁真空容器的内壁。清洁气体等离子体的产生通过使用以下任一方法进行：（1）清洁处理期间的等离子体直径大于样品处理期间的等离子体直径。在清洁处理期间等离子体的末端到达真空容器的内壁。（2）在真空容器内扫描清洁气体等离子体。

27. 发明授权

US08650965B2 Robot, robot system, robot control device, and state determining method 有权
标题翻译：机器人，机器人系统，机器人控制装置和状态确定方法
公开(公告)号：US08650965B2
公开(公告)日：2014-02-18
申请号：US13221868
申请日：2011-08-30
申请人： Yukio Hashiguchi , Shingo Ando , Takuya Fukuda , Takenori Oka , Shinji Murai , Takeomi Hidaka , Manabu Okahisa
发明人： Yukio Hashiguchi , Shingo Ando , Takuya Fukuda , Takenori Oka , Shinji Murai , Takeomi Hidaka , Manabu Okahisa
IPC分类号： G01L1/00
CPC分类号： B25J9/1633 , B25J9/0087 , B25J13/085
摘要： A robot according to an embodiment includes an arm, a strain sensor, one or more actuator, and a sensor fixing jig. The strain sensor includes a piezoelectric body that has a natural frequency higher than a natural frequency of a structural material forming the arm. The one or more actuators are provided in the arm to drive the arm. The sensor fixing jig is provided in a base of the actuator, among the actuators in the arm, closest to a base end of the arm. The strain sensor is provided in the sensor fixing jig.
摘要翻译：根据实施例的机器人包括臂，应变传感器，一个或多个致动器和传感器固定夹具。应变传感器包括具有比形成臂的结构材料的固有频率高的固有频率的压电体。一个或多个致动器设置在臂中以驱动臂。传感器固定夹具设置在致动器的基部中，臂中的致动器最靠近臂的基端。应变传感器设置在传感器固定夹具中。

28. 发明申请

US20120048027A1 ROBOT, ROBOT SYSTEM, ROBOT CONTROL DEVICE, AND STATE DETERMINING METHOD 有权
标题翻译：机器人，机器人系统，机器人控制装置和状态确定方法
公开(公告)号：US20120048027A1
公开(公告)日：2012-03-01
申请号：US13221868
申请日：2011-08-30
申请人： Yukio HASHIGUCHI , Shingo Ando , Takuya Fukuda , Takenori Oka , Shinji Murai , Takeomi Hidaka , Manabu Okahisa
发明人： Yukio HASHIGUCHI , Shingo Ando , Takuya Fukuda , Takenori Oka , Shinji Murai , Takeomi Hidaka , Manabu Okahisa
IPC分类号： G01L1/16
CPC分类号： B25J9/1633 , B25J9/0087 , B25J13/085
摘要： A robot according to an embodiment includes arm and a strain sensor. The strain sensor includes a piezoelectric body that has a natural frequency higher than a natural frequency of a structural material forming the arm.
摘要翻译：根据实施例的机器人包括臂和应变传感器。应变传感器包括具有比形成臂的结构材料的固有频率高的固有频率的压电体。

29. 发明授权

US06576946B1 Semiconductor device comprising capacitor cells, bit lines, word lines, and MOS transistors in a memory cell area over a semiconductor substrate 失效
标题翻译：半导体器件包括在半导体衬底上的存储单元区域中的电容器单元，位线，字线和MOS晶体管
公开(公告)号：US06576946B1
公开(公告)日：2003-06-10
申请号：US09356705
申请日：1999-07-20
申请人： Misuzu Kanai , Yuzuru Ohji , Takuya Fukuda , Shinpei Iijima , Ryouichi Furukawa , Yasuhiro Sugawara , Hideharu Yahata
发明人： Misuzu Kanai , Yuzuru Ohji , Takuya Fukuda , Shinpei Iijima , Ryouichi Furukawa , Yasuhiro Sugawara , Hideharu Yahata
IPC分类号： H01L27108
CPC分类号： H01L28/91 , H01L27/10814
摘要： Capacitors are stretched over a plurality of memory cells in the direction of a bit line in order to effectively utilize spaces between adjacent cells. In addition, by creating a cubic structure of each capacitor by adoption of a self-matching technique, the structure can be utilized more effectively. As a result, it is possible to assure a sufficient capacitor capacitance in spite of a limitation imposed by the fabrication technology and obtain an assurance of sufficient space between cells in a shrunk area of a memory cell accompanying high-scale integration and miniaturization of a semiconductor device.
摘要翻译：电容器沿着位线的方向在多个存储单元上被拉伸，以有效地利用相邻单元之间的空间。此外，通过采用自匹配技术来形成每个电容器的立方结构，可以更有效地利用结构。结果，尽管制造技术受到限制，但是可以确保足够的电容器电容，并且可以确保伴随高精度集成的存储单元的收缩区域中的单元之间的足够的空间以及半导体的小型化设备。

30. 发明授权

US06360142B1 Random work arranging device 失效
标题翻译：随机工作安排装置
公开(公告)号：US06360142B1
公开(公告)日：2002-03-19
申请号：US09689182
申请日：2000-10-12
申请人： Katsuya Miura , Yoshiki Kariya , Takuya Fukuda , Akira Shouji
发明人： Katsuya Miura , Yoshiki Kariya , Takuya Fukuda , Akira Shouji
IPC分类号： G06F1900
CPC分类号： B25J9/1682 , G05B2219/39102 , G05B2219/40007 , G05B2219/40307 , Y10T29/53313
摘要： A random work arranging device that arranges randomly conveyed works by using a robot and carries out the arranged works, wherein the robot comprises a plurality of arms and a single robot controller for controlling respective arms independently one another to arrange and transfer the works from a conveying position to a carry-out position.
摘要翻译：一种随机工作布置装置，其通过使用机器人布置随机输送的作品，并执行布置的作品，其中所述机器人包括多个臂和单个机器人控制器，用于彼此独立地控制各自的臂，以便从输送位置到执行位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式