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21. 发明申请

US20120312504A1 BOILING REFRIGERANT TYPE COOLING SYSTEM 有权
标题翻译：锅炉制冷式冷却系统
公开(公告)号：US20120312504A1
公开(公告)日：2012-12-13
申请号：US13494461
申请日：2012-06-12
申请人： Kazuaki Suzuki , Shigemasa Sato , Akio Idei
发明人： Kazuaki Suzuki , Shigemasa Sato , Akio Idei
IPC分类号： F28D15/02 , F25B49/00
CPC分类号： H05K1/0201 , F25B39/04 , F28D15/0266 , F28D15/046 , F28F13/187 , H01L23/427 , H01L2924/0002 , H05K7/20318 , H01L2924/00
摘要： A boiling refrigerant type cooling system to suppress overshoot upon start of heat generation and realize stable start of boiling. In the boiling refrigerant type cooling system, a metal boiling heat transfer unit has a base in thermal contact with a heat generating body. The boiling heat transfer unit is in contact with a liquid refrigerant. The boiling heat transfer unit has plural parallel tunnels communicating with the outside via holes or gaps under its surface, a groove deeper than a tunnel diameter formed through all the tunnels in an orthogonal direction to the tunnels, and a cover plate on the groove.
摘要翻译：沸腾的制冷剂型冷却系统，在发热开始时抑制过冲，实现稳定的沸腾开始。在沸腾制冷剂型冷却系统中，金属沸腾传热单元具有与发热体热接触的基部。沸腾传热单元与液体制冷剂接触。沸腾传热单元具有多个平行的隧道，其与其外表面上的通孔或间隙连通，比通过所有隧道在与隧道正交的方向上形成的隧道直径更深的沟槽以及沟槽上的盖板。

22. 发明申请

US20120249283A1 FLEX-RIGID WIRING BOARD AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译： FLEX-RIGID接线板及其制造方法
公开(公告)号：US20120249283A1
公开(公告)日：2012-10-04
申请号：US13145455
申请日：2010-01-14
申请人： Yuji Kimura , Takahiro Asada , Kazuaki Suzuki
发明人： Yuji Kimura , Takahiro Asada , Kazuaki Suzuki
IPC分类号： H01H37/76
CPC分类号： H01H37/761 , H01H1/5805 , H01H2037/768
摘要： A protection element is provided which is capable of stably retaining a flux on a soluble conductor at a predetermined position, enabling a speedy and precise blowout of the soluble conductor in the event of an abnormality. This protection element includes: a soluble conductor 13 which is disposed on an insulation baseboard 11 and is connected to a power supply path of a device targeted to be protected, to cause a blowout by means of a predetermined abnormal electric power; a flux 19 which is coated onto a surface of the soluble conductor 13; and an insulation cover 14 which is mounted on the baseboard 11 with the soluble conductor 13 being covered therewith. In addition, the protection element is provided with a protrusive stripe portion 20 which is formed on an interior face of the insulation cover 14 in opposite to the soluble conductor 13 and in which a stepped portion 20a for retaining the flux 19 is formed at a predetermined position while in contact with the flux 19. The soluble conductor 13 has a hole portion 13a at which the flux 19 is retained.
摘要翻译：提供一种保护元件，其能够在预定位置上稳定地保持可溶性导体上的助熔剂，从而能够在异常情况下快速且精确地喷出可溶性导体。该保护元件包括：可溶性导体13，其设置在绝缘基板11上并连接到被保护的装置的电源路径，以通过预定的异常电力引起井喷; 焊剂19，其涂覆在可溶性导体13的表面上; 以及绝缘盖14，其被安装在基板11上，可溶性导体13被覆盖。此外，保护元件设置有突出条形部分20，其形成在绝缘盖14的与可溶性导体13相对的内表面上，并且其中用于保持焊剂19的阶梯部分20a形成在预定的位置，同时与焊剂19接触。可溶性导体13具有孔部分13a，焊剂19保持在该孔部分13a。

23. 发明授权

US08182795B2 Oil-in-water emulsion type sunscreen preparation 有权
标题翻译：水包油乳液型防晒剂
公开(公告)号：US08182795B2
公开(公告)日：2012-05-22
申请号：US12670744
申请日：2007-07-27
申请人： Yoshihito Takakura , Kazuaki Suzuki , Takayuki Omura
发明人： Yoshihito Takakura , Kazuaki Suzuki , Takayuki Omura
IPC分类号： A61K8/06 , A61K31/53 , A61K31/216 , A61K31/277 , A61K31/045 , A61Q17/04
CPC分类号： A61K8/062 , A61K8/345 , A61K8/35 , A61K8/37 , A61K8/375 , A61K8/40 , A61K8/4946 , A61K8/4966 , A61K8/4973 , A61K8/86 , A61K2800/52 , A61Q17/04 , Y10S514/937 , Y10S514/938 , Y10S514/941 , Y10S514/942
摘要： An oil-in-water emulsified sunscreen cosmetic which contains: (A) Containing the following three types of surfactants (A-1)-(A-3); (A-1) A POE stearic ester having a POE mole number of 20-120; (A-2) sorbitan tristearate; and (A-3) glyceryl stearate having a HLB of 5-8; (B) bis-ethylhexyloxyphenolmethoxyphenyltriazine and/or tert-butylmethoxybenzoylmethane, oil soluble ultraviolet absorbents, solid at room temperatures; (C) ethylhexyl methoxycinnamate and/or octocrylene, oil soluble ultraviolet absorbents, liquid at room temperature; (D) phenylbenzimidazolesulfonic acid, a water soluble ultraviolet absorbent; and (E) a higher alcohol having 14-24 carbon atoms.
摘要翻译：一种水包油乳化防晒化妆品，其含有：（A）含有以下三种表面活性剂（A-1） - （A-3）; （A-1）POE摩尔数为20-120的POE硬脂酸酯; （A-2）脱水山梨糖醇三硬脂酸酯; 和（A-3）HLB为5-8的硬脂酸甘油酯; （B）双 - 乙基己氧基苯酚甲氧基苯基三嗪和/或叔丁基甲氧基苯甲酰甲烷，油溶性紫外线吸收剂，室温固体; （C）甲氧基肉桂酸乙基己酯和/或辛酸，油溶紫外线吸收剂，室温液体; （D）苯基苯并咪唑磺酸，水溶性紫外线吸收剂; 和（E）具有14-24个碳原子的高级醇。

24. 发明授权

US07108735B2 Method and device for manufacturing metallic particulates, and manufactured metallic particulates 有权
标题翻译：用于制造金属颗粒的方法和装置，以及制造的金属微粒
公开(公告)号：US07108735B2
公开(公告)日：2006-09-19
申请号：US10473181
申请日：2002-03-26
申请人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
发明人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
IPC分类号： B22F9/08
CPC分类号： B22F9/082 , B22F9/02 , B22F9/08 , B22F2009/084 , B22F2009/0848 , B22F2009/086
摘要： Produce metal particles offering high purity and uniform granular shape and size: by forming a combustion chamber comprising an injector nozzle for mixture gas of oxygen and hydrogen, an ignition device and a material metal feeder in the upper space of a high-pressure water tank filled with inert gas; igniting inside the combustion chamber via the ignition device the injector nozzle for mixture gas of oxygen and hydrogen and melting (vaporize) the material fed by the material metal feeder; and then causing the produced molten metal droplets to contact high-pressure water and let the resulting metallic particles to precipitate in water.
摘要翻译：生产提供高纯度和均匀颗粒形状和尺寸的金属颗粒：通过形成燃烧室，其包括用于氧气和氢气的混合气体的喷射器喷嘴，在高压水箱的上部空间中的点火装置和材料金属进料器用惰性气体通过点火装置在燃烧室内点燃用于氧气和氢气的混合气体的喷射器喷嘴并熔化（蒸发）由材料金属进料器供给的材料; 然后使产生的熔融金属液滴接触高压水并使得到的金属颗粒在水中沉淀。

25. 发明申请

US20050191961A1 Wraparound canceller, relay system, and wraparound cancelling method 有权
标题翻译：绕组消除器，中继系统和环绕消除方法
公开(公告)号：US20050191961A1
公开(公告)日：2005-09-01
申请号：US10526476
申请日：2003-10-06
申请人： Yoshinori Kunieda , Hidekuni Yomo , Yoshihito Kawai , Kenichiro Hayashi , Kazuaki Suzuki
发明人： Yoshinori Kunieda , Hidekuni Yomo , Yoshihito Kawai , Kenichiro Hayashi , Kazuaki Suzuki
IPC分类号： H03H17/04 , H04B3/23 , H04B7/015 , H04B7/155 , H04H20/00 , H04H20/06 , H04H20/67 , H04J11/00 , H04B7/14
CPC分类号： H04B7/15585 , H04B3/23 , H04H20/06 , H04H20/67 , H04L5/0048 , H04L25/0204 , H04L25/0232
摘要： A loop interference canceller that carries out an adaptive operation of responding to time variations of the phase or level of loop interference wave or key station wave at high speed and with high accuracy and reduces the size of an apparatus. The loop interference canceller of the present invention limits the number of data pieces of the transmission path characteristic estimation section, realizes expansion to the entire band not through interpolation but through 0 insertion in a frequency domain and windowing after time domain transformation to reduce the number of data pieces processed and speed up the adaptive operation of the loop interference canceller, and can thereby realize high trackability for time variations of the phase and level of loop interference wave or key station wave, increase the accuracy of processing inside, perform high accuracy cancellation operation, reduce the circuit scale and achieve an advantageous effect of realizing miniaturization of the apparatus.
摘要翻译：一种环路干扰消除器，其执行响应于高速和高精度的环路干扰波或关键站波的相位或电平的时间变化的自适应操作并且减小设备的尺寸。本发明的环路干扰消除器限制了传输路径特性估计部分的数据段的数量，不是通过插值实现整个频带的扩展，而是通过频域中的0插入和时域变换后的窗口化来减少处理数据片并加快环路干扰消除器的自适应操作，从而实现对环路干扰波或关键站波的相位和电平的时间变化的高跟踪性，提高内部处理的精度，执行高精度的取消操作，减小电路规模，实现设备小型化的有利效果。

26. 发明授权

US06917048B2 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus 失效
标题翻译：用于控制由带电粒子束微光刻设备中的空间电荷效应和几何像差引起的模糊的方法和装置
公开(公告)号：US06917048B2
公开(公告)日：2005-07-12
申请号：US10132983
申请日：2002-04-26
申请人： Tomoharu Fujiwara , Kazuaki Suzuki
发明人： Tomoharu Fujiwara , Kazuaki Suzuki
IPC分类号： G03F7/20 , G03F9/02 , H01J37/305 , H01J37/317 , H01L21/027 , G21K5/10 , H01J37/08
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30455
摘要： Methods and devices are disclosed for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus. Based on the pattern-element densities of the exposure units to be transferred to the substrate, a relationship between the total blur and the beam semi-angle, the current density, and/or the beam-acceleration voltage is determined. An optimal beam semi-angle, current density, and/or beam-acceleration voltage is calculated to: (1) minimize the blur during the transfer-exposure of an exposure unit having a certain pattern-element density; (2) make the blur constant during the transfer-exposure of a group of exposure units having various pattern-element densities; or (3) maximize the patterned-beam current during the transfer-exposure of an exposure unit having a certain pattern-element density and blur tolerance. The beam semi-angle, current density, and/or acceleration voltage of the CPB-optical system is then adjusted to the calculated value.
摘要翻译：公开了用于控制由带电粒子束微光刻设备中的空间电荷效应和几何像差引起的模糊的方法和装置。基于要转印到基板的曝光单元的图案元素密度，确定总模糊与光束半角，电流密度和/或光束加速电压之间的关系。计算最佳光束半角，电流密度和/或光束加速电压：（1）使具有特定图案元素密度的曝光单元的转印曝光期间的模糊最小化; （2）在具有各种图案元素密度的一组曝光单元的转印曝光期间使模糊恒定; 或（3）在具有特定图案元素密度和模糊公差的曝光单元的转印曝光期间使图案束电流最大化。然后将CPB光学系统的光束半角，电流密度和/或加速电压调整到计算值。

27. 发明授权

US06657207B2 Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures 失效
标题翻译：带电粒子束微光刻设备和包括在子场曝光期间进行的光学校正的方法
公开(公告)号：US06657207B2
公开(公告)日：2003-12-02
申请号：US09805732
申请日：2001-03-13
申请人： Shintaro Kawata , Teruaki Okino , Kazuaki Suzuki , Noriyuki Hirayanagi
发明人： Shintaro Kawata , Teruaki Okino , Kazuaki Suzuki , Noriyuki Hirayanagi
IPC分类号： G21G500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30455 , H01J2237/31764
摘要： Charged-particle-beam (CPB) apparatus and methods are disclosed that achieve efficient correction of imaging conditions such as shape-astigmatic aberrations, etc., caused by differences in the distribution of pattern elements within respective subfields of the reticle. Indices based on the pattern-element distributions within subfields are stored, together with corresponding optical-correction data for the subfields. As the subfields are exposed, respective data are recalled and the exposure is performed with optical corrections made according to the data. The indices are determined beforehand from pattern data at time of reticle manufacture. The tabulated data are rewritable with changes in apparatus parameters such as beam-current density and beam-divergence angle. Intermediate data can be determined by interpolation of tabulated data.
摘要翻译：公开了充电粒子束（CPB）装置和方法，其实现由掩模版的各个子场内的图案元素分布的差异导致的成像条件（诸如形像像差等）的有效校正。基于子场内的图案元素分布的指数与子场的相应光学校正数据一起被存储。当子场曝光时，调用相应的数据，并根据数据进行光学校正来进行曝光。这些指标是从标线制造时的图形数据预先确定的。列表数据可以随设备参数的变化而改写，例如光束电流密度和光束发散角。中间数据可以通过插入表格数据来确定。

28. 发明授权

US06585165B1 IC card having a mica capacitor 有权
标题翻译：具有云母电容器的IC卡
公开(公告)号：US06585165B1
公开(公告)日：2003-07-01
申请号：US09763453
申请日：2001-02-23
申请人： Nobukazu Kuroda , Kazuaki Suzuki
发明人： Nobukazu Kuroda , Kazuaki Suzuki
IPC分类号： G06K1906
CPC分类号： G06K19/0775 , G06K19/07749
摘要： An IC card 10A has a mica capacitor 5, an antenna coil 2 and an IC chip 3 formed on an insulating substrate 1, where the mica capacitor is composed of a mica film 6 and electrodes 7a and 7b formed on both sides of the mica film 6. terminal of the electrode 7b on one side of the mica capacitor 5 is formed on the other side of the mica capacitor 5, and this terminal and a terminal of the electrode 7a on the other side are connected on the insulating substrate 1 with the use of an anisotropic conductive adhesive 4. Thus, an IC card can be manufactured at low cost, in which the resonance frequency is stabilized and the antenna characteristics are improved.
摘要翻译： IC卡10A具有形成在绝缘基板1上的云母电容器5，天线线圈2和IC芯片3，其中云母电容器由云母膜6和形成在云母膜两侧的电极7a和7b组成在云母电容器5的另一侧上形成在云母电容器5的一侧上的电极7b的端子，并且该端子和另一侧的电极7a的端子在绝缘基板1上与使用各向异性导电粘合剂4.因此，可以以低成本制造IC卡，其中谐振频率稳定并且天线特性得到改善。

29. 发明授权

US06433347B1 Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern 失效
标题翻译：带电粒子束投影曝光方法和设备，其选择性地曝光标线图案的期望曝光单元
公开(公告)号：US06433347B1
公开(公告)日：2002-08-13
申请号：US09336866
申请日：1999-06-18
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： Methods and apparatus are disclosed for performing charged-particle-beam projection exposure of selected exposure units of a pattern, defined by a reticle, without compromising throughput or transfer accuracy. An illumination beam sequentially illuminates individual exposure units (e.g., subfields) of the reticle pattern to form a patterned beam. The patterned beam sequentially projects images of the illuminated exposure units on a sensitive substrate (e.g., resist-coated wafer). The images are formed on the substrate so as to be stitched together in a manner that reproduces the entire pattern over a large field on the substrate. Exposure is controllably performed according to data concerning whether the illumination beam should be ON or OFF, according to data concerning exposure-dose values, and/or according to data concerning focal position for each respective exposure unit.
摘要翻译：公开了用于执行由掩模版定义的图案的选定曝光单元的带电粒子束投影曝光，而不损害生产量或转印精度的方法和装置。照明光束顺序地照亮标线图案的各个曝光单元（例如，子场）以形成图案化的光束。图案化的光束顺序地将照射的曝光单元的图像投影在敏感基板（例如，抗蚀剂涂覆的晶片）上。图像形成在基板上，以便以在基板上的大场上再现整个图案的方式被缝合在一起。根据关于曝光剂量值的数据，和/或根据各个曝光单元的焦点位置的数据，根据关于照明光束是ON还是OFF的数据可控制曝光。

30. 发明授权

US06411364B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06411364B1
公开(公告)日：2002-06-25
申请号：US09249303
申请日：1999-02-12
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70225 , G03F7/70358 , G03F7/70433 , G03F7/70558 , G03F7/70716
摘要： An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a scanning device for scanning synchronously the mask and the photosensitive substrate, and a device for setting a width of an exposure area in a scan direction of the photosensitive substrate conjugate with an illumination area on the mask with respect to the projection optical system, to integer times as large as a distance which the photosensitive substrate moves during an interval between pulse emissions from the light source.
摘要翻译：用于将形成在掩模上的图案转印到感光基板上的曝光装置设置有用光束照射掩模上的局部区域的照明光学系统，用于将掩模的图案投影到感光基板的投影光学系统以及用于同时扫描掩模和感光基板的扫描装置，以及用于设置与掩模相对于投影光学系统的照明区域共轭的感光基板的扫描方向上的曝光区域的宽度的装置，在光源的脉冲发射间隔期间，感光基片移动的距离的整数倍。

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