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21. 发明申请

US20070002576A1 Prism sheet and backlight unit using the same 有权
标题翻译：棱镜片和背光单元使用相同
公开(公告)号：US20070002576A1
公开(公告)日：2007-01-04
申请号：US11314342
申请日：2005-12-22
申请人： Man Lee , Jae Kang , Ji Yoon , Sung Lee , Won Moon
发明人： Man Lee , Jae Kang , Ji Yoon , Sung Lee , Won Moon
IPC分类号： B60Q1/26 , B60Q1/00
CPC分类号： G02B6/0053 , G02F1/133606 , G02F2001/133607
摘要： A prism sheet capable of achieving an enhancement in light efficiency and viewing angle characteristics and a backlight unit using the prism sheet are disclosed. The prism sheet includes: a condensing film which transmits light incident to the condensing film; a plurality of prism crests on the condensing film having apexes; and a plurality of reflection patterns formed on the condensing film such that each of the reflection patterns faces a boundary of adjacent prism crests associated with the reflection pattern to reflect light incident onto the reflection patterns.
摘要翻译：公开了能够实现光效和视角特性提高的棱镜片以及使用该棱镜片的背光单元。棱镜片包括：透射入射到聚光膜的光的聚光膜; 在聚光膜上具有顶点的多个棱镜峰; 以及形成在聚光膜上的多个反射图案，使得每个反射图案面向与反射图案相关联的相邻棱镜波峰的边界，以反射入射到反射图案上的光。

22. 发明申请

US20060262044A1 Plasma display apparatus and driving method thereof 审中-公开
标题翻译：等离子体显示装置及其驱动方法
公开(公告)号：US20060262044A1
公开(公告)日：2006-11-23
申请号：US11265157
申请日：2005-11-03
申请人： Sung Lee , Won Kim , Wonsik Yoon , Yoonchang Choi , Hyun Do
发明人： Sung Lee , Won Kim , Wonsik Yoon , Yoonchang Choi , Hyun Do
IPC分类号： G09G3/28
CPC分类号： G09G3/296 , G09G3/292 , G09G3/293 , G09G2330/02
摘要： There is provided a plasma display apparatus and a driving method thereof. The plasma display apparatus includes a plasma display panel; and a scan driver commonly using a voltage source supplying a sustain pulse voltage, a setup bias voltage, a setdown pulse voltage, and a scan pulse voltage among a plurality of driving voltages supplied to a scan electrode of the plasma display panel.
摘要翻译：提供了一种等离子体显示装置及其驱动方法。等离子体显示装置包括等离子体显示面板; 以及扫描驱动器，通常使用提供给等离子体显示面板的扫描电极的多个驱动电压中的维持脉冲电压，设定偏置电压，下降脉冲电压和扫描脉冲电压的电压源。

23. 发明申请

US20060252459A1 Mobile terminal with personal video recorder 审中-公开
标题翻译：带个人录像机的移动终端
公开(公告)号：US20060252459A1
公开(公告)日：2006-11-09
申请号：US11417564
申请日：2006-05-03
申请人： Sung Lee
发明人： Sung Lee
IPC分类号： H04M1/00
CPC分类号： H04N7/17336 , H04L65/4084 , H04L65/80 , H04N21/2393 , H04N21/41407 , H04N21/44209 , H04N21/6131 , H04N21/6375 , H04N21/6582
摘要： A method for controlling recording at a mobile terminal includes receiving a video signal having stream data, determining signal quality of the stream data, and obtaining loss information associated with a lost portion of the stream data responsive to the signal quality. In addition, a mobile terminal includes a receiver for receiving a video signal having stream data. The controller may be configured to determine signal quality of the stream data and obtain loss information associated with a lost portion of the stream data responsive to the signal quality. Alternatively, the mobile terminal includes a controller configured to obtain previously stored loss information, such that the loss information is associated with a lost portion of stream data of a video signal, and a receiver for receiving lost stream data corresponding to the loss information from a video data server responsive to an information request.
摘要翻译：一种用于控制移动终端记录的方法包括接收具有流数据的视频信号，确定流数据的信号质量，以及响应信号质量获得与流数据的丢失部分相关联的丢失信息。此外，移动终端包括用于接收具有流数据的视频信号的接收器。控制器可以被配置为响应于信号质量来确定流数据的信号质量并且获得与流数据的丢失部分相关联的丢失信息。或者，移动终端包括被配置为获得预先存储的丢失信息的控制器，使得丢失信息与视频信号的流数据的丢失部分相关联，以及接收器，用于接收对应于来自响应于信息请求的视频数据服务器。

24. 发明申请

US20060240673A1 Method of forming bit line in semiconductor device 失效
标题翻译：在半导体器件中形成位线的方法
公开(公告)号：US20060240673A1
公开(公告)日：2006-10-26
申请号：US11401585
申请日：2006-04-11
申请人： Sung Lee
发明人： Sung Lee
IPC分类号： H01L21/467
CPC分类号： H01L21/76802 , H01L21/31144 , H01L21/76831 , H01L27/10885
摘要： A method of forming a bit line of a semiconductor device wherein an etch-stop nitride film, a trench oxide film and a hard mask nitride film are formed on a semiconductor substrate. The hard mask nitride film and the trench oxide film are etched to a limited etch thickness of a photo mask. The remaining trench oxide film is etched using the hard mask nitride film as a mask, thus forming a trench. The etch-stop nitride film and the hard mask nitride film are etched on condition that an oxide film has a high selectivity with respect to a nitride film. Accordingly, the loss of a top surface of the trench oxide film can be minimized and a bit line can be formed to have a uniform height. In accordance with the invention, bit line resistance and capacitance variation can be reduced and the reliability of a device can be improved.
摘要翻译：一种形成半导体器件的位线的方法，其中在半导体衬底上形成蚀刻停止氮化物膜，沟槽氧化物膜和硬掩模氮化物膜。将硬掩模氮化物膜和沟槽氧化物膜蚀刻到光掩模的有限蚀刻厚度。使用硬掩模氮化物膜作为掩模蚀刻剩余的沟槽氧化膜，从而形成沟槽。在氧化膜相对于氮化物膜具有高选择性的条件下蚀刻蚀刻停止氮化物膜和硬掩模氮化物膜。因此，可以使沟槽氧化膜的上表面的损失最小化，并且可以形成具有均匀高度的位线。根据本发明，可以降低位线电阻和电容变化，并且可以提高器件的可靠性。

25. 发明申请

US20060214178A1 Light emitting diode package and fabrication method thereof 有权
标题翻译：发光二极管封装及其制造方法
公开(公告)号：US20060214178A1
公开(公告)日：2006-09-28
申请号：US11320968
申请日：2005-12-30
申请人： Sang Choi , Woong Hwang , Seog Choi , Ho Park , Sung Lee , Chang Lim
发明人： Sang Choi , Woong Hwang , Seog Choi , Ho Park , Sung Lee , Chang Lim
IPC分类号： H01L33/00
CPC分类号： H01L33/641 , H01L33/486 , H01L33/642 , H01L2224/16 , H01L2924/00011 , H01L2924/00014 , H01L2224/0401
摘要： The present invention provides a light emitting diode (LED) package and the fabrication method thereof. The LED package includes a lower metal layer, and a first silicon layer, a first insulation layer, a second silicon layer, a second insulation layer, and a package electrode pattern formed in their order on the lower metal layer. The LED package also includes a spacer having a cavity, formed on the electrode pattern. The LED package further includes an LED mounted in the cavity by flip-chip bonding to the electrode patterns, and an optical element attached to the upper surface of the spacer.
摘要翻译：本发明提供一种发光二极管（LED）封装及其制造方法。 LED封装包括下金属层，以及在下金属层上依次形成的第一硅层，第一绝缘层，第二硅层，第二绝缘层和封装电极图案。 LED封装还包括形成在电极图案上的具有空腔的间隔物。 LED封装还包括通过与电极图案倒装芯片结合而安装在腔中的LED以及附接到间隔件的上表面的光学元件。

26. 发明申请

US20060181928A1 Wired-or typed page buffer having cache function in a nonvolatile memory device and related method of programming 有权
公开(公告)号：US20060181928A1
公开(公告)日：2006-08-17
申请号：US11317079
申请日：2005-12-27
申请人： Sung Lee , Min Kim , Seung Lee
发明人： Sung Lee , Min Kim , Seung Lee
IPC分类号： G11C11/34 , G11C16/06
CPC分类号： G11C16/3459 , G11C16/0483 , G11C16/24 , G11C16/3454
摘要： Disclosed is a page buffer having a wired-OR type structure and a cache function which is adapted for use in a nonvolatile semiconductor memory device and a method of programming same. The page buffer embeds the cache latch block in relation to the cache function. Moreover, the nonvolatile semiconductor memory device includes an output driver enabling an internal output line to be unidirectional driven, thereby enabling a program-verifying operation using the wired-OR scheme.

27. 发明申请

US20060148149A1 Method for fabricating semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20060148149A1
公开(公告)日：2006-07-06
申请号：US11169708
申请日：2005-06-30
申请人： Sung Lee
发明人： Sung Lee
IPC分类号： H01L21/337
CPC分类号： H01L21/28273 , H01L21/28123 , H01L27/115 , H01L27/11521 , H01L29/1037 , H01L29/66636
摘要： A method for fabricating a semiconductor device is disclosed. The method provides etching a predetermined region of a semiconductor substrate prior to formation of a device isolation film defining an active region and forming a gate having a stepped gate channel.
摘要翻译：公开了一种制造半导体器件的方法。该方法在形成限定有源区的器件隔离膜并形成具有阶梯栅极通道的栅极之前，提供蚀刻半导体衬底的预定区域。

28. 发明申请

US20060147613A1 Deposition system and method for measuring deposition thickness in the deposition system 审中-公开
标题翻译：沉积系统和沉积系统沉积厚度测量方法
公开(公告)号：US20060147613A1
公开(公告)日：2006-07-06
申请号：US11325310
申请日：2006-01-05
申请人： Min Hwang , Sung Lee
发明人： Min Hwang , Sung Lee
IPC分类号： C23C14/54 , B05C11/00 , C23C16/00
CPC分类号： C23C14/24 , C23C14/042 , C23C14/12 , C23C14/546
摘要： A method of measuring a deposition thickness of a deposited material includes measuring an deposition rate of a material effused from an effusion cell using a sensor and calculating the deposition thickness of the material deposited on a substrate using a conversion formula that employs the measured deposition rate and the life value the time of use of the sensor as parameters.
摘要翻译：测量沉积材料的沉积厚度的方法包括使用传感器测量从渗出单元流出的材料的沉积速率，并使用采用测量的沉积速率的转换公式计算沉积在衬底上的材料的沉积厚度;以及使用传感器的寿命值作为参数。

29. 发明申请

US20060123895A1 Drive head and personal atomic force microscope having the same 审中-公开
标题翻译：驱动头和个人原子力显微镜具有相同的
公开(公告)号：US20060123895A1
公开(公告)日：2006-06-15
申请号：US11298041
申请日：2005-12-08
申请人： Sung Lee , Kang Park , Eun Kim
发明人： Sung Lee , Kang Park , Eun Kim
IPC分类号： G01B5/28
CPC分类号： G01Q10/04 , G01Q60/38
摘要： Provided are a drive head and a personal atomic force microscope having the same, and the drive head includes a cantilever provided with a bend detector and for moving a probe, a drive head for moving the cantilever up and down, and a scanner for moving a sample in x- and y-axis directions. The cantilever has a simple structure provided with the bend detector, and the drive head and the scanner are bi-directionally movable and have a large displacement due to the elasticity of the flexible hinge. The personal atomic force microscope has little hysteresis or creep due to its high linearity. Therefore, there is no necessity of a separate sensor system for calibration, and it is possible to obtain a desired image through a single initial calibration.
摘要翻译：提供具有该驱动头和个人原子力显微镜的驱动头和驱动头包括设置有弯曲检测器并用于移动探头的悬臂，用于上下移动悬臂的驱动头，以及用于移动样品在x轴和y轴方向。悬臂具有设置有弯曲检测器的简单结构，并且驱动头和扫描器是双向可移动的并且由于柔性铰链的弹性而具有大的位移。个人原子力显微镜由于其高线性度而具有很小的滞后或蠕变。因此，不需要用于校准的单独的传感器系统，并且可以通过单次初始校准获得期望的图像。

30. 发明申请

US20060114186A1 Plasma display apparatus and driving method thereof 失效
公开(公告)号：US20060114186A1
公开(公告)日：2006-06-01
申请号：US11289500
申请日：2005-11-30
申请人： Sung Lee , Ki-Duck Cho , Min Kim , Kyoung Jung
发明人： Sung Lee , Ki-Duck Cho , Min Kim , Kyoung Jung
IPC分类号： G09G3/28
CPC分类号： G09G3/2927 , G09G3/2022 , G09G2310/066 , G09G2320/0228 , G09G2320/0238
摘要： The present invention relates to a plasma display panel, and more particularly, to a plasma display apparatus and driving method thereof, in which power consumption can be reduced and contrast can be improved, so that a high contrast image can be displayed. The plasma display apparatus according to the present invention comprises a scan electrode, a sustain electrode, and a controller for applying a rising waveform and a falling waveform to the scan electrode in a reset period of a first subfield of a frame and applying the falling waveform to the scan electrode when a first time elapses, after a first sustain voltage is applied to the scan electrode during a sustain period. The sustain electrode is applied with a second sustain voltage when a second time is elapsed, after the first sustain voltage is applied.

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