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    • 27. 发明授权
    • Carrier head with retaining ring and carrier ring
    • 带保护环和承载环的承载头
    • US07654888B2
    • 2010-02-02
    • US11862096
    • 2007-09-26
    • Steven M. ZunigaAndrew J. NagengastJeonghoon Oh
    • Steven M. ZunigaAndrew J. NagengastJeonghoon Oh
    • B24B41/06
    • B24B37/32B24B37/30
    • A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.
    • 描述了具有壳体,基座组件,保持环,载体环和柔性膜的承载头。 基座组件相对于外壳可垂直移动。 保持环相对于基座组件连接并且可垂直移动,并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。 承载环相对于基座组件连接并且垂直固定,周向地包围保持环以防止保持环的横向运动,并且具有构造成接触抛光垫的底表面。
    • 29. 发明授权
    • Substrate retainer
    • 基板保持架
    • US08298047B2
    • 2012-10-30
    • US12987709
    • 2011-01-10
    • Steven M. ZunigaHung Chih Chen
    • Steven M. ZunigaHung Chih Chen
    • B24B5/35
    • B24B37/32B24B37/28
    • A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
    • 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面,基本上圆形的周边。 该装置具有抛光垫,该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面,用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。