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    • 24. 发明授权
    • Photoelectric conversion device comprising photoelectric conversion element
    • 光电转换装置包括光电转换元件
    • US09117958B2
    • 2015-08-25
    • US13162699
    • 2011-06-17
    • Yukinori ShimaAtsushi Hirose
    • Yukinori ShimaAtsushi Hirose
    • H01L31/00H01L31/105H01L31/0216H01L31/09
    • H01L31/105H01L31/02162H01L31/095H01L31/1055
    • It is an object to provide a photoelectric conversion device whose power consumption and a mounting area are reduced and yield is improved and further to provide a photoelectric conversion device whose number of manufacturing processes and manufacturing cost are reduced. A photoelectric conversion device includes a photoelectric conversion element for outputting photocurrent corresponding to illuminance, and a resistor changing resistance corresponding to illuminance. In the photoelectric conversion device, one terminal of the photoelectric conversion element and one terminal of the resistor are electrically connected in series; the other terminal of the photoelectric conversion element is connected to a high power supply potential; the other terminal of the resistor is connected to a low power supply potential; and a light intensity adjusting unit is provided on a light reception surface side of the photoelectric conversion element or the resistor to adjust illuminance.
    • 本发明的目的是提供一种光功率消耗和安装面积减小并且产率提高的光电转换装置,并且进一步提供一种减少制造工艺和制造成本的光电转换装置。 光电转换装置包括用于输出对应于照度的光电流的光电转换元件和对应于照度的电阻变化电阻。 在光电转换装置中,光电转换元件的一个端子和电阻器的一个端子串联电连接; 光电转换元件的另一个端子连接到高电源电位; 电阻的另一端连接到低电源电位; 并且在光电转换元件或电阻器的光接收表面侧设置光度调节单元以调节照度。
    • 30. 发明授权
    • Manufacturing method of thin film transistor
    • 薄膜晶体管的制造方法
    • US07537976B2
    • 2009-05-26
    • US11410259
    • 2006-04-25
    • Atsushi Hirose
    • Atsushi Hirose
    • H01L21/84H01L21/00H01L21/285H01L21/288H01L21/445
    • H01L29/41733H01L29/42384H01L29/66757H01L29/66765Y10T428/24421
    • The invention provides a manufacturing method of a circular thin film transistor of which shape is more controlled than the conventional case, while simplifying the steps and reducing the manufacturing time and cost by forming a circular thin film transistor by a maskless process such as a droplet discharge method. In the invention, a circular thin film transistor having a circular electrode is formed by stacking concentric circular thin films over a substrate by a maskless process such as a droplet discharge method. Moreover, a circular thin film transistor having a circular semiconductor layer may be formed by stacking concentric circular thin films over a substrate by a maskless process such as a droplet discharge method.
    • 本发明提供了一种圆形薄膜晶体管的制造方法,其形状比常规情况更受控制,同时通过诸如液滴放电的无掩膜工艺形成圆形薄膜晶体管来简化步骤并缩短制造时间和成本, 方法。 在本发明中,具有圆形电极的圆形薄膜晶体管通过诸如液滴喷射方法的无掩模工艺在衬底上堆叠同心圆形薄膜而形成。 此外,具有圆形半导体层的圆形薄膜晶体管可以通过诸如液滴排放法的无掩模工艺在衬底上堆叠同心圆形薄膜来形成。