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    • 22. 发明授权
    • Method of computing wiring capacitance, method of computing signal propagation delay due to cross talk and computer-readable recording medium storing such computed data
    • 计算布线电容的方法,计算由串扰引起的信号传播延迟的方法以及存储这种计算数据的计算机可读记录介质
    • US06530066B1
    • 2003-03-04
    • US09666863
    • 2000-09-21
    • Yuko ItoSatoru Isomura
    • Yuko ItoSatoru Isomura
    • G06F1750
    • G06F17/5036H01L23/5222H01L2924/0002H01L2924/00
    • The present invention is to provide a method of computing wiring capacitance to be able to get parasitic capacity depending on the wiring at high speed and with great accuracy, and to provide a method of computing signal propagation delay due to cross talk to be able to remove surplus margins at high speed when delay is predicted. In design of LSIs such as microprocessors or the like, total capacity Ctotal per unit length is determined about each of a plurality of models altering adjacent wiring ((a) no adjacent wiring, (b) one-side adjacent wiring, and (c) both-sides adjacent wiring) and/or crossing ratios ((i) 0%, (ii) 33%, (iii) 67%, and (iv) 100%) and, thereby, a library is formed from these to design the LSI. Regarding characteristic of this total capacity per unit length, the capacity depending on increase of the crossing ratio has a high increase rate in an area of a low crossing ratio, while the capacity depending on increase of the crossing ratio has the low increase rate in high crossing ratio. Regarding a case of no adjacent wiring, the capacity depending on increase of crossing ratio has a high increase rate in comparison to a case of one-side or both-sides adjacent wiring.
    • 本发明提供一种计算布线电容的方法,其能够根据高速和高精度的布线获得寄生电容,并且提供一种计算由串扰引起的信号传播延迟的方法,以能够去除 延迟预测时高速的剩余利润。 在诸如微处理器等的LSI的设计中,关于改变相邻布线((a)没有相邻布线,(b)单面相邻布线)的多个模型中的每一个模型确定每单位长度的总容量Ctotal,(c) 两侧相邻布线)和/或交叉比((i)0%,(ii)33%,(iii)67%和(iv)100%),由此形成文库以设计 LSI。 关于该单位长度的总容量的特性,与交叉比的增加相关的容量在低交叉比的面积上具有高的增加率,而根据交叉比的增加的容量具有较高的增加率 交叉比。 关于没有相邻布线的情况,与一侧或两侧相邻布线的情况相比,与交叉比的增加相关的容量具有高的增加率。
    • 23. 发明授权
    • Semiconductor integrated circuit and its fabrication method
    • 半导体集成电路及其制造方法
    • US06359472B2
    • 2002-03-19
    • US09791831
    • 2001-02-26
    • Michiaki NakayamaMasato HamamotoKazutaka MoriSatoru Isomura
    • Michiaki NakayamaMasato HamamotoKazutaka MoriSatoru Isomura
    • H01L2704
    • H01L27/1104H01L27/0921H01L27/0928
    • An integrated circuit having a CMOS circuit constituted by electrically connecting an n-type well 2, in which p-channel transistor Tp of the CMOS circuit is set, with a supply line Vdd through switching transistor Tps, and electrically connecting a p-type well 3, in which n-channel transistor Tn of the CMOS circuit is set, with supply line Vss through switching transistor Tns. Thermal runaway due to leakage current can be controlled by turning off switching transistors Tps and Tns and supplying potentials suitable for a test to the n-type well 2 and the p-type well 3 from an external unit when the integrated circuit is being tested. Fluctuations of the latch-up phenomenon and operation speed can be prevented by turning on switching transistors Tps and Tns and setting the n-type well 2 and the p-type well 3 to the voltages Vdd and Vss, respectively.
    • 具有CMOS电路的集成电路,其通过将n型阱2(其中CMOS电路的p沟道晶体管Tp被置位)与通过开关晶体管Tps的电源线Vdd电连接而构成,并且电连接p型阱 如图3所示,其中CMOS电路的n沟道晶体管Tn被设置,电源线Vss通过开关晶体管Tns。 当集成电路被测试时,可以通过关断开关晶体管Tps和Tns并从外部单元向n型阱2和p型阱3提供适合于测试的电位来控制由于泄漏电流引起的热失控。 通过接通开关晶体管Tps和Tns并分别将n型阱2和p型阱3分别设置为电压Vdd和Vss可以防止闩锁现象和操作速度的波动。
    • 24. 发明授权
    • Semiconductor integrated circuit device and process for manufacturing the same
    • 半导体集成电路器件及其制造方法
    • US06194915B1
    • 2001-02-27
    • US09077829
    • 1998-06-04
    • Michiaki NakayamaMasato HamamotoKazutaka MoriSatoru Isomura
    • Michiaki NakayamaMasato HamamotoKazutaka MoriSatoru Isomura
    • H01L2704
    • H01L27/1104H01L27/0921H01L27/0928
    • To provide a semiconductor integrated circuit having a CMOS circuit constituted by electrically connecting an n-type well 2, in which one transistor Tp for constituting the CMOS circuit is set, with a first power-supply-voltage line Vdd through a switching transistor Tps, and electrically connecting a p-type well 3 in which the other transistor Tn for constituting the CMOS circuit is set with a second power-supply-voltage line Vss through a switching transistor Tns. Moreover, the semiconductor integrated circuit is constituted so that thermal runaway due to leakage current can be controlled by turning off the switching transistors Tps and Tns and supplying a potential suitable for a test to the n-type well 2 and the p-type well 3 from an external unit when the semiconductor integrated circuit is being tested. Furthermore, the semiconductor integrated circuit is constituted so that fluctuations of the latch-up phenomenon and operation speed can be prevented by turning on the switching transistors Tps and Tns and setting the n-type well 2 and the p-type well 3 to the power supply voltages Vdd and Vss, respectively.
    • 为了提供具有CMOS电路的半导体集成电路,该CMOS电路通过电连接构成CMOS电路的一个晶体管Tp与通过开关晶体管Tps的第一电源电压线Vdd电连接的n型阱2, 并且通过开关晶体管Tns将构成CMOS电路的另一个晶体管Tn与p型阱3电连接到第二电源电压线Vss。 此外,半导体集成电路被构造成使得可以通过关断开关晶体管Tps和Tns并且向n型阱2和p型阱3提供适合于测试的电位来控制由漏电流引起的热失控 当半导体集成电路被测试时,从外部单元。 此外,半导体集成电路构成为通过接通开关晶体管Tps和Tns并将n型阱2和p型阱3设置为功率来防止闩锁现象和操作速度的波动 电源电压Vdd和Vss。