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    • 29. 发明申请
    • VERTICAL CROSS POINT RERAM FORMING METHOD
    • 垂直交叉点RERAM形成方法
    • US20150269998A1
    • 2015-09-24
    • US14732766
    • 2015-06-07
    • SanDisk 3D LLC
    • Chang SiauTianhong Yan
    • G11C13/00
    • G11C13/0069G11C13/0097G11C2213/71G11C2213/77
    • Methods for forming non-volatile storage elements in a non-volatile storage system are described. In some embodiments, a plurality of forming operations may be performed in which non-volatile storage elements located near the far end of a plurality of word line fingers associated with a word line comb are formed prior to forming other non-volatile storage elements. In one example, non-volatile storage elements may be formed in each of the plurality of word line fingers in parallel and in an order that forms non-volatile storage elements in each of the plurality of word line fingers that are located near the far ends of the plurality of word line fingers before forming other non-volatile storage elements. Each non-volatile storage element that is formed during a forming operation may be current limited while a forming voltage is applied across the non-volatile storage element.
    • 描述了在非易失性存储系统中形成非易失性存储元件的方法。 在一些实施例中,可以执行多个形成操作,其中在形成其他非易失性存储元件之前形成位于与字线梳相关联的多个字线手指的远端附近的非易失性存储元件。 在一个示例中,非易失性存储元件可以并行地形成在多个字线手指中的每一个中,并且以在多个字线手指中的远端附近形成非易失性存储元件的顺序 在形成其他非易失性存储元件之前的多个字线指。 在成形操作期间形成的每个非易失性存储元件可以是电流限制的,同时在非易失性存储元件上施加形成电压。