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    • 23. 发明授权
    • Carousel wafer transfer system
    • 旋转木片转印系统
    • US06287386B1
    • 2001-09-11
    • US09332207
    • 1999-06-12
    • Ilya PerlovAlexey GoderEugene Gantvarg
    • Ilya PerlovAlexey GoderEugene Gantvarg
    • C23C1600
    • H01L21/67196H01L21/67126H01L21/67742H01L21/67745H01L21/68764H01L21/68771H01L21/68792Y10S414/135Y10S414/137Y10S414/139Y10S414/141
    • The present invention generally provides a rotary wafer carousel and related wafer handler for moving wafers or other workpieces through a processing system, i.e., a semiconductor fabrication tool. Generally, the present invention includes a rotary wafer carousel having a plurality of wafer seats disposed thereon to support one or more wafers. The rotary carousel is preferably disposed through the lid in a transfer chamber opposite the robot which is preferably disposed through the bottom of the transfer chamber. The rotary carousel and the robot cooperate to locate wafers adjacent to process chambers and move wafers into and out of various chambers of the system. The invention improves the throughput of the system by positioning wafers adjacent to the appropriate chamber to reduce the amount of movement required of the robot for transporting wafers between chambers.
    • 本发明通常提供一种用于通过处理系统即半导体制造工具移动晶片或其他工件的旋转晶片转盘和相关晶片处理器。 通常,本发明包括旋转晶片转盘,其具有设置在其上的多个晶片座,以支撑一个或多个晶片。 旋转传送带优选地通过盖子设置在与机器人相对的传送室中,传送室优选地布置在传送室的底部。 旋转圆盘传送带和机器人协调定位与处理室相邻的晶片,并将晶片移入和移出系统的各个腔室。 本发明通过将晶片定位在适当的腔室附近来改善系统的生产量,以减少机器人在腔室之间传送晶片所需的移动量。
    • 25. 发明授权
    • Carrier head with a flexible membrane to form multiple chambers
    • 载体头部具有柔性膜以形成多个腔室
    • US06648740B2
    • 2003-11-18
    • US10251302
    • 2002-09-19
    • Ilya PerlovEugene GantvargSen-Hou Ko
    • Ilya PerlovEugene GantvargSen-Hou Ko
    • B24B2900
    • B24B37/30B24B37/32B24B47/10B24B47/12B24B49/16
    • A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the outer portion may be significantly less than the width of the middle portion. The carrier head may also include a flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.
    • 具有连接到基座以限定第一室,第二室和第三室的柔性构件的承载头。 柔性构件的下表面提供了具有与第一腔室相关联的内部部分的基底接收表面,围绕内部部分并与第二腔室相关联的基本上环形的中间部分,以及围绕中间部分和相关联的基本上环形的外部部分 与第三个房间。 外部部分的宽度可以明显小于中间部分的宽度。 承载头还可以包括连接到驱动轴的凸缘和将凸缘枢转地连接到基座的万向架。
    • 27. 发明授权
    • Method and apparatus for improved substrate handling
    • 改善基板处理的方法和装置
    • US06468353B1
    • 2002-10-22
    • US09538013
    • 2000-03-29
    • Ilya PerlovAlexey GoderEugene GantvargHoward E. Grunes
    • Ilya PerlovAlexey GoderEugene GantvargHoward E. Grunes
    • C23C1600
    • H01L21/67766H01L21/67103H01L21/67109H01L21/67126H01L21/67196H01L21/67742H01L21/67745H01L21/68764H01L21/68771H01L21/68785H01L21/68792Y10S414/135Y10S414/137Y10S414/139
    • A method and apparatus are provided for substrate handling. In a first aspect, a temperature adjustment plate is located below a substrate carriage and is configured such that a substrate may be transferred between the temperature adjustment plate and the substrate carriage by lifting and lowering the substrate carriage above and below the top surface of the temperature adjustment plate. The temperature adjustment plate may be configured to heat and/or cool a substrate positioned thereon. In a second aspect, the substrate carriage is magnetically coupled so as to rotate and/or lift and lower magnetically, thereby reducing particle generation via contact between moving parts (and potential chamber contamination therefrom). In a third aspect, a substrate handler positioned below the substrate carriage is both magnetically coupled and magnetically levitated, providing further particle reduction. The magnetic levitation is preferably achieved via four radially disposed and vertically arranged magnet pairs having distance sensors for maintaining desired spacing therebetween. In a most preferred embodiment, one substrate is heated/degassed on a first portion of a temperature adjustment plate in preparation for processing while a second substrate is processed, and a third processed substrate is cooled on a second portion of the temperature adjustment plate.
    • 提供了一种用于基板处理的方法和装置。 在第一方面,温度调节板位于衬底托架下方,并且被构造成使得衬底可以通过升高和降低衬底托架在温度上表面之上和之下而在温度调节板和衬底托架之间传递 调整板。 温度调节板可以被配置为加热和/或冷却其上定位的基板。 在第二方面,衬底托架被磁耦合以便磁性地旋转和/或升高和降低,从而通过移动部件之间的接触(和潜在的室内污染)减少了颗粒的产生。 在第三方面,位于衬底托架下方的衬底处理器磁耦合并磁悬浮,从而提供进一步的颗粒减少。 磁悬浮优选通过具有距离传感器的四个径向布置和垂直排列的磁体对来实现,以保持它们之间所需的间隔。 在最优选的实施方案中,在温度调节板的第一部分上加热/脱气一个基板,以准备加工第二基板,并在第二部分温度调节板上冷却第三加工基板。
    • 28. 发明授权
    • Method and apparatus for orienting substrates
    • 用于定向基板的方法和装置
    • US06393337B1
    • 2002-05-21
    • US09482362
    • 2000-01-13
    • Ilya PerlovEugene GantvargLeonid Tertitski
    • Ilya PerlovEugene GantvargLeonid Tertitski
    • G06F700
    • H01L21/681Y10S414/136Y10S414/138
    • A multiple substrate orienter is provided that includes a rotatable substrate handler having a plurality of substrate support portions, each adapted to support a substrate. The multiple substrate orienter also includes a plurality of stacked substrate supports, each adapted to support a substrate. A plurality of substrate orientation marking (SOM) detectors are provided, and each SOM detector is coupled to a different one of the substrate supports and is adapted to identify a presence of an SOM of a substrate positioned close enough to the SOM detector to allow SOM detection by the SOM detector. The multiple substrate orienter further includes a plurality of lift and lower mechanisms, each lift and lower mechanism coupled to a different one of the substrate supports and adapted to individually lift and lower the substrate support to which the lift and lower mechanism is coupled. Alternatively, each lift and lower mechanism may be coupled to a different one of the substrate support portions of the rotatable substrate handler and adapted to individually lift and lower the substrate support portion to which the lift and lower mechanism is coupled. Preferably the multiple substrate orienter includes a controller having program code adapted to simultaneously rough orient a plurality of substrates loaded onto the substrate support portions of the substrate handler, and to individually fine orient each rough oriented substrate. In further aspects of the invention, a substrate orienter capable of orienting one or more substrates is provided, as are methods for orienting substrates as described above.
    • 提供了多个基板取向器,其包括具有多个基板支撑部分的可旋转基板处理器,每个基板支撑部分适于支撑基板。 多个基板取向器还包括多个层叠的基板支撑件,每个基板支撑件适于支撑基板。 提供了多个基板取向标记(SOM)检测器,并且每个SOM检测器耦合到不同的一个基板支撑件,并且适于识别位于距离SOM检测器足够近的基板的SOM的存在以允许SOM 通过SOM检测器检测。 多个基板取向器还包括多个提升和下部机构,每个提升和下部机构联接到不同的一个基板支撑件,并且适于单独升高和降低升降机构和下部机构所联接的基板支撑件。 或者,每个提升和下部机构可以联接到可旋转基板处理器的不同的一个基板支撑部分,并且适于单独升高和降低升降机构和下部机构所联接的基板支撑部分。 优选地,多个基板取向器包括具有程序代码的控制器,该程序代码适用于同时粗略地定向加载到基板处理器的基板支撑部分上的多个基板,并且单独精细地定向每个粗略取向的基板。 在本发明的另一方面,提供了能够定向一个或多个基板的基板定向器,如上所述的用于定向基板的方法。
    • 29. 发明授权
    • Conditioner apparatus for chemical mechanical polishing
    • 化学机械抛光调理装置
    • US06293853B1
    • 2001-09-25
    • US09479046
    • 2000-01-07
    • Ilya PerlovEugene Gantvarg
    • Ilya PerlovEugene Gantvarg
    • B24B100
    • B24B53/017
    • In one aspect, an apparatus and a method for use in substrate polishing are described wherein a conditioner head is provided for receiving an end effector for conditioning a polishing pad surface; the conditioner head is supported above the polishing pad surface to be conditioned; and the conditioner head is driven with an actuating force from a position that lies along a line that is substantially normal to the polishing pad surface to be conditioned so that an end effector attached to the conditioner head can condition the surface of the polishing pad. In another aspect, pneumatic pressure is supplied through the conditioner head support arm to apply actuating force to the conditioner head so that an end effector attached to the conditioner head can condition the surface of the polishing pad. In yet another aspect, the conditioner head support arm has a fluid channel extending therein and a fluid port, wherein the fluid channel is constructed to receive rinsing fluid and fluid port is constructed to direct rinsing fluid from the fluid channel toward the polishing pad surface to be conditioned.
    • 一方面,描述了一种用于衬底抛光的装置和方法,其中设置有用于接收用于调节抛光垫表面的末端执行器的调节头; 调节头被支撑在待调理的抛光垫表面上方; 并且调节头由来自位于基本上垂直于待调理的抛光垫表面的线的位置的致动力驱动,使得附接到调节头的末端执行器可调节抛光垫的表面。 另一方面,通过调节器头支撑臂供给气压,以向致动器头施加致动力,使得附接到调节头的末端执行器可调节抛光垫的表面。 在另一方面,调节器头支撑臂具有在其中延伸的流体通道和流体端口,其中流体通道被构造成接收冲洗流体,并且流体端口被构造成将冲洗流体从流体通道朝向抛光垫表面引导到 被调节。