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21. 发明授权

US5969799A Exposure apparatus with a pulsed laser 失效
标题翻译：带脉冲激光的曝光装置
公开(公告)号：US5969799A
公开(公告)日：1999-10-19
申请号：US577474
申请日：1995-12-22
申请人： Naoto Sano
发明人： Naoto Sano
IPC分类号： G03F1/76 , G03F7/20 , H01L21/027 , H01S3/0943 , G03B27/54 , H01S3/13
CPC分类号： G03F7/70575 , G03F7/70241 , Y10S438/942
摘要： An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system is measured by use of a harmonic of a predetermined laser, and wherein the laser light from the excimer laser has a wavelength corresponding to that of the harmonic of the predetermined laser.
摘要翻译：一种曝光装置，包括：（a）用于从准分子激光器的激光照射掩模的照射装置，以及（b）用于将所述掩模的图案用激光投射到基板上的投影光学系统，其中所述投影光学系统通过使用预定激光器的谐波来测量，并且其中来自准分子激光器的激光具有与预定激光器的谐波相对应的波长。

22. 发明授权

US5923693A Discharge electrode, shape-restoration thereof, excimer laser oscillator, and stepper 失效
标题翻译：放电电极，其形状修复，准分子激光振荡器和步进机
公开(公告)号：US5923693A
公开(公告)日：1999-07-13
申请号：US807784
申请日：1997-02-28
申请人： Tadahiro Ohmi , Naoto Sano , Yasuyuki Shirai
发明人： Tadahiro Ohmi , Naoto Sano , Yasuyuki Shirai
IPC分类号： H01L21/027 , H01S3/038 , H01S3/0979 , H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： H01S3/0388
摘要： A discharge electrode for an excimer laser oscillator according to the present invention contains oxygen at a content of not more than 10 ppm, and a method of restoring the shape of a discharge electrode according to the present invention comprises introducing an inert gas into a laser chamber, and conducting discharge for several seconds.
摘要翻译：根据本发明的准分子激光振荡器用放电电极含有不大于10ppm的氧，并且根据本发明的恢复放电电极的形状的方法包括将惰性气体引入激光室并进行放电几秒钟。

23. 发明授权

US5567928A Scanning exposure apparatus and method including controlling irradiation timing of an irradiation beam with respect to relative movement between the beam and a substrate 失效
标题翻译：扫描曝光装置和方法包括控制照射光束相对于光束和基底之间的相对移动的照射定时
公开(公告)号：US5567928A
公开(公告)日：1996-10-22
申请号：US280823
申请日：1994-07-26
申请人： Naoto Sano
发明人： Naoto Sano
IPC分类号： G03F7/20 , H01L21/027 , G01J1/32
CPC分类号： G03F7/70558 , G03F7/70358
摘要： A scanning type exposure apparatus includes an irradiation source for irradiating an irradiation beam, which has an intensity fluctuation upon a start of irradiation; a scanner for imparting relative movement between the irradiation beam and a mask and a substrate to be exposed to a pattern of the mask, wherein the relative movement starts before a start of illumination of the mask with the irradiation beam; and a controller for controlling the irradiation source to start emission of the irradiation beam before a start of the relative movement and a start of the illumination to reduce intensity fluctuation of the irradiation beam.
摘要翻译：扫描型曝光装置包括：照射光束的照射源，其在照射开始时具有强度波动; 用于使所述照射光束与掩模之间的相对运动的扫描器和要暴露于所述掩模的图案的基板，其中所述相对运动在所述照射光束开始所述掩模的开始之前开始; 以及控制器，用于控制照射源在开始相对运动之前开始发射照射光束，并且开始照明以减小照射光束的强度波动。

24. 发明申请

US20130046644A1 COMMODITY ACCOMMODATION APPARATUS, COMMODITY REGISTRATION APPARATUS AND COMMODITY REGISTRATION METHOD 审中-公开
标题翻译：商品住宿设备，商品注册设备和商品注册方法
公开(公告)号：US20130046644A1
公开(公告)日：2013-02-21
申请号：US13584103
申请日：2012-08-13
申请人： Naoto Sano
发明人： Naoto Sano
IPC分类号： G06Q20/20 , G06Q20/40
CPC分类号： G06Q20/20 , G06Q20/208 , G07G1/14
摘要： A commodity accommodation apparatus comprises an accommodation unit configured to accommodate commodities, a shooting unit configured to shoot an image of the interior of the accommodation unit and a sending section configured to send an identification information for specifying one's own identity and the shot image to a commodity registration apparatus.
摘要翻译：商品住宿设备包括：被配置为容纳商品的收纳单元，被配置为拍摄住宿单元的内部的图像的拍摄单元;以及发送部，被配置为向商品发送用于指定自己的身份和拍摄图像的识别信息登记装置

25. 发明申请

US20060093009A1 Gas laser device and exposure apparatus using the same 审中-公开
标题翻译：气体激光装置及使用其的曝光装置
公开(公告)号：US20060093009A1
公开(公告)日：2006-05-04
申请号：US11292195
申请日：2005-12-02
申请人： Naoto Sano , Yoshiyuki Nagai
发明人： Naoto Sano , Yoshiyuki Nagai
IPC分类号： H01S3/223 , H01S3/22
CPC分类号： H01S3/036
摘要： A gas laser device includes a laser gas supplying device in a chamber for supplying a laser gas to an exciting region in the chamber, and an exciting device for exciting the laser gas supplied to the exciting region. The gas laser device controls the laser gas supplying device so that, when the laser gas is excited by the exciting device, the laser gas is circulated at a first circulating rate and so that, when the laser gas is not excited by the exciting device, the laser gas is circulated at a second circulating rate lower than the first circulating rate.
摘要翻译：一种气体激光装置，包括在室内向激光区域供给激光气体的激光气体供给装置，激励供给激励区域的激光气体的激励装置。气体激光装置控制激光气体供给装置，使得当激光气体被激励装置激发时，激光气体以第一循环速率循环，并且当激光气体不被激发装置激发时，激光气体以低于第一循环速率的第二循环速率循环。

26. 发明授权

US06646717B2 Projection exposure apparatus and device manufacturing method using the same 失效
标题翻译：投影曝光装置及其制造方法
公开(公告)号：US06646717B2
公开(公告)日：2003-11-11
申请号：US09986322
申请日：2001-11-08
申请人： Masakatsu Ota , Naoto Sano
发明人： Masakatsu Ota , Naoto Sano
IPC分类号： G03B2754
CPC分类号： G03F7/70025 , G03F7/70575
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system for projecting the illuminated pattern onto a substrate, wherein the projection optical system includes a lens system being made of a substantially single glass material, a wavelength detecting device for detecting a wavelength of the laser light from the excimer laser and for producing an output, and a displacing device for shifting a mirror for resonance of the excimer laser, in an optical axis direction of the excimer laser, on the basis of the output of the wavelength detecting device.
摘要翻译：一种投影曝光装置，包括用于利用来自连续发射准分子激光器的激光照射标线图案的照明光学系统，用于将照射图案投影到基板上的投影光学系统，其中投影光学系统包括制造的透镜系统基本上单个玻璃材料的波长检测装置，用于检测来自准分子激光器的激光的波长并用于产生输出的波长检测装置，以及用于使准分子激光器的共振用的反射镜移位的移位装置，沿光轴方向准分子激光器，基于波长检测装置的输出。

27. 发明授权

US06322220B1 Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US06322220B1
公开(公告)日：2001-11-27
申请号：US08991442
申请日：1997-12-16
申请人： Naoto Sano , Chidane Ouchi
发明人： Naoto Sano , Chidane Ouchi
IPC分类号： G02B504
CPC分类号： G03F7/70091 , H01S3/1305 , H01S3/134 , H01S3/225
摘要： An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first dispersing element, a wavelength selecting device for passing a predetermined wavelength region of light, of the light beams of wavelength units each being collected by the first optical system, a second optical system for receiving the light from the wavelength selecting device and providing parallel light beams of wavelength units, and a second dispersing element for combining the parallel light beams of wavelength units from the second optical system, the second dispersing element having substantially the same angular dispersion as that of the first dispersing element and a direction of dispersion opposite to that of the first dispersing element.
摘要翻译：曝光装置包括：第一分散元件，用于从激光器分散相对于波长的大致平行的激光，以提供波长单元的光束;第一光学系统，用于从第一分散元件收集波长单元的每个光束; 用于使每个由第一光学系统收集的波长单位的光束的预定波长区域通过的波长选择装置，用于接收来自波长选择装置的光并提供波长的平行光束的第二光学系统单元和用于组合来自第二光学系统的波长单元的平行光束的第二分散元件，第二分散元件具有与第一分散元件基本相同的角度分散，并且与第一分散元件的分散方向相反的方向分散元件。

28. 发明授权

US06215806B1 Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface 失效
标题翻译：准分子激光发生器具有激光室，具有氟化物钝化的内表面
公开(公告)号：US06215806B1
公开(公告)日：2001-04-10
申请号：US08812288
申请日：1997-03-06
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Naoto Sano
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Naoto Sano
IPC分类号： H01S322
CPC分类号： H01S3/0305 , H01S3/036 , H01S3/225
摘要： An excimer laser generating system includes a laser chamber whose inner surface is covered with a fluorine-passivated surface. Preferably, the surfaces of a blower and heat exchanger disposed in the laser chamber are also covered with a fluorine-passivated surface. The fluorine-passivated surface may be formed of a wide variety of materials including an aluminum oxide film, a fluoride film containing aluminum fluoride and magnesium fluoride, iron fluoride, and nickel fluoride. Preferably, the excimer laser generation system includes a gas supply system having an inert gas purging system so that gas sources can be replaced without exposing the inside of gas supply pipes to atmosphere. With the above arrangement, the excimer laser generating system can generate a laser beam pulse whose energy and shape are maintained constant for a long period of operation time without encountering serious degradation. The invention also provides a high-reliability step-and-repeat exposure apparatus using the above excimer laser generating system, capable of exposing a very fine pattern.
摘要翻译：准分子激光发生系统包括其内表面被氟钝化表面覆盖的激光室。优选地，设置在激光室中的鼓风机和热交换器的表面也被氟钝化表面覆盖。氟钝化表面可以由各种各样的材料形成，包括氧化铝膜，含氟化铝和氟化镁的氟化物膜，氟化铁和氟化镍。优选地，准分子激光发生系统包括具有惰性气体吹扫系统的气体供应系统，使得可以更换气体源而不将气体供应管的内部暴露于大气。通过上述布置，准分子激光发生系统可以产生激光束脉冲，其能量和形状在长时间的操作时间内保持恒定，而不会严重恶化。本发明还提供了使用上述准分子激光发生系统的能够曝光非常精细图案的高可靠性分步重复曝光装置。

29. 发明授权

US5250797A Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters 失效
标题翻译：使用确定的曝光量和控制参数来控制光脉冲发射的曝光方法和装置
公开(公告)号：US5250797A
公开(公告)日：1993-10-05
申请号：US771221
申请日：1991-10-04
申请人： Naoto Sano , Tsutomu Asahina
发明人： Naoto Sano , Tsutomu Asahina
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/70058 , G03F7/70558
摘要： A semiconductor device manufacturing exposure method usable with a pulsed light source is disclosed. The light source is caused to produce pulses of light in accordance with successively changed control parameters, while a sensor detects each pulse of light from the light source. Outputs of the sensor corresponding to the pulses of light are integrated to determine a quantity of exposure of a predetermined zone of a substrate corresponding to each light pulse. By using the determined exposure quantities corresponding to the pulses of light, a relational equation representing the relationship between each control parameter and a corresponding exposure quantity is determined. Then, a control parameter for subsequent light pulse emission of the light source is determined in accordance with the determined relational equation.
摘要翻译：公开了可用于脉冲光源的半导体器件制造曝光方法。光源根据连续变化的控制参数产生脉冲光，而传感器检测来自光源的每个脉冲。对应于光脉冲的传感器的输出被积分以确定对应于每个光脉冲的衬底的预定区域的曝光量。通过使用与光脉冲对应的确定的曝光量，确定表示每个控制参数与对应的曝光量之间的关系的关系式。然后，根据确定的关系式来确定光源的后续光脉冲发射的控制参数。

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