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21. 发明申请

US20150102230A1 High Voltage Isolation of an Inductively Coupled Plasma Ion Source with a Liquid that is not Actively Pumped 审中-公开
标题翻译：具有不积极泵送的液体的电感耦合等离子体离子源的高压隔离
公开(公告)号：US20150102230A1
公开(公告)日：2015-04-16
申请号：US14128030
申请日：2012-06-21
申请人： Sean Kellogg , Andrew B. Wells , James B. Mcginn , N. William Parker , Mark W. Utlaut
发明人： Sean Kellogg , Andrew B. Wells , James B. Mcginn , N. William Parker , Mark W. Utlaut
IPC分类号： H05H1/24
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如导电屏蔽。一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。

22. 发明授权

US08642974B2 Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation 有权
标题翻译：固体介质中的电极封装，与流体高压隔离结合使用
公开(公告)号：US08642974B2
公开(公告)日：2014-02-04
申请号：US13165556
申请日：2011-06-21
申请人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
发明人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
IPC分类号： H01J3/14
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。导电屏蔽可以封闭在固体电介质中。电介质流体可以由泵循环或不被泵循环。热管可用于冷却介电流体。

23. 发明授权

US08633452B2 Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source 有权
标题翻译：在电感耦合等离子体（ICP）离子源中不同工艺气体之间快速切换的方法和结构
公开(公告)号：US08633452B2
公开(公告)日：2014-01-21
申请号：US13182187
申请日：2011-07-13
申请人： Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
发明人： Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
IPC分类号： H01J27/00
CPC分类号： H01J37/3002 , H01J37/08 , H01J37/18 , H01J2237/006 , H01J2237/08 , H01J2237/0827
摘要： An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
摘要翻译：可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。

24. 发明申请

US20130134855A1 System for Attachment of an Electrode into an Inductively Coupled Plasma Source 有权
标题翻译：将电极连接到电感耦合等离子体源的系统
公开(公告)号：US20130134855A1
公开(公告)日：2013-05-30
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
IPC分类号： H01J1/02 , H05H1/00
CPC分类号： H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
摘要翻译：用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。

25. 发明授权

US08294093B1 Wide aperature wien ExB mass filter 有权
标题翻译：宽温度ExB质量过滤器
公开(公告)号：US08294093B1
公开(公告)日：2012-10-23
申请号：US13089875
申请日：2011-04-19
申请人： David Tuggle , N. William Parker
发明人： David Tuggle , N. William Parker
IPC分类号： H01J49/00
CPC分类号： H01J37/05 , H01J2237/31749
摘要： An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.
摘要翻译： E×B维恩质量过滤器提供独立可调的电场与质量分离所需的偶极电场相结合。可独立调节的电场可以提供更大的光学孔径，以校正散光并使光束在与磁场平行和/或垂直的方向上偏转。

26. 发明申请

US20120261566A1 ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS FROM THE BEAM 有权
标题翻译：从光束去除中性粒子的去除校正的EXB质量过滤器
公开(公告)号：US20120261566A1
公开(公告)日：2012-10-18
申请号：US13089991
申请日：2011-04-19
申请人： David Tuggle , N. William Parker , Mark W. Utlaut
发明人： David Tuggle , N. William Parker , Mark W. Utlaut
IPC分类号： H01J49/20 , H01J49/22 , H01J49/10
CPC分类号： H01J37/05 , H01J37/317 , H01J2237/053 , H01J2237/055 , H01J2237/057 , H01J2237/31749
摘要： A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.
摘要翻译：用于离子束系统的质量过滤器包括至少两个级并且减少色差。一个实施例包括两个对称质量过滤器级，其组合减少或消除色差，以及入射和退出边缘场误差。实施例还可以防止中性粒子到达样品表面，并避免光束路径中的交叉。在一个实施例中，过滤器可以从产生多种物质的源传递单种离子。在其他实施例中，滤光器可以通过具有一定能量范围的单个离子种类并将多能量离子聚焦在衬底表面上的相同点。

27. 发明授权

US08137048B2 Wafer processing system with dual wafer robots capable of asynchronous motion 失效
标题翻译：具有双晶片机器人的晶圆处理系统能够进行异步运动
公开(公告)号：US08137048B2
公开(公告)日：2012-03-20
申请号：US11863166
申请日：2007-09-27
申请人： Mahendran Chidambaram , Quoc Truong , Jerry Schock , N. William Parker
发明人： Mahendran Chidambaram , Quoc Truong , Jerry Schock , N. William Parker
IPC分类号： B25J18/02
CPC分类号： H01L21/6719 , B25J9/107 , B25J18/025 , H01L21/67184 , H01L21/67196 , H01L21/67742 , Y10T74/20305
摘要： A robot assembly for transferring substrates includes a central tube assembly oriented along a central axis, perpendicular to a substrate transfer plane, and having an inner surface that forms part of a first enclosure at a first pressure, and an outer surface that forms part of a second enclosure at a second, different pressure. The robot assembly further includes a transfer robot which itself includes multiple rotor assemblies, each configured to rotate parallel to the substrate transfer plane. The various rotor assemblies are organized in pairs, each pair having one rotor fitted with a telescoping support arm/end effector arrangement to support substrates thereon, and the other rotor fitted with inner and outer actuator arms that cooperate to effect radial movement of the corresponding end effector of the paired rotor assembly. Each rotor is controlled to effect the transfer of substrates within a wafer processing system asynchronously and at differing heights.
摘要翻译：用于传送基板的机器人组件包括：中心管组件，其沿着中心轴线定向，垂直于基板传送平面，并且具有形成第一外壳的第一压力的一部分的内表面，以及形成第二个外壳处于第二个不同的压力。机器人组件还包括传送机器人，其自身包括多个转子组件，每个转子组件被构造成平行于基板传送平面旋转。各对转子组件成对组合，每对具有一个转子，该转子装配有可伸缩的支撑臂/端部执行器装置，以支撑其上的基板，另一个转子装配有内部和外部致动器臂，其配合以实现相应端部的径向移动成对的转子组件的效应器。控制每个转子以在晶片处理系统内以不同的高度实现衬底的转移。

28. 发明授权

US07122795B2 Detector optics for charged particle beam inspection system 有权
标题翻译：用于带电粒子束检测系统的检测器光学器件
公开(公告)号：US07122795B2
公开(公告)日：2006-10-17
申请号：US10833949
申请日：2004-04-27
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/244
摘要： A charged particle beam column for substrate inspection includes detector optics with high secondary electron detection efficiency combined with minimal distortion of the charged particle beam. One embodiment of the detector optics includes a symmetrizing electrode configured with a secondary electron detector to produce a generally cylindrically symmetric electric field about the optical axis of the column. Control electrodes may be used for screening the charged particle beam from the secondary electron detector and for controlling the electric field at the surface of the substrate. In some embodiments, the control electrodes are cylindrically symmetric about the optical axis; whereas in other embodiments, the cylindrical symmetry of one or more control electrodes is broken in order to improve the secondary electron detection efficiency.
摘要翻译：用于基板检查的带电粒子束柱包括具有高二次电子检测效率的结合最小带电粒子束失真的检测器光学器件。检测器光学器件的一个实施例包括配置有二次电子检测器的对称电极，以围绕色谱柱的光轴产生大致圆柱形的对称电场。控制电极可用于筛选来自二次电子检测器的带电粒子束并用于控制衬底表面处的电场。在一些实施例中，控制电极围绕光轴圆柱对称; 而在其他实施例中，为了提高二次电子检测效率，一个或多个控制电极的圆柱对称性被破坏。

29. 发明授权

US06738506B2 Image processing system for multi-beam inspection 有权
标题翻译：多光束检测图像处理系统
公开(公告)号：US06738506B2
公开(公告)日：2004-05-18
申请号：US10125054
申请日：2002-04-17
申请人： S. Daniel Miller , N. William Parker , Steven B. Hobmann
发明人： S. Daniel Miller , N. William Parker , Steven B. Hobmann
IPC分类号： G06K900
CPC分类号： G06T7/001 , G06T2207/30148
摘要： An image processing system for use in semiconductor wafer inspection comprises a multiplicity of self-contained image processors for independently performing image cross-correlation and defect detection. The system may also comprise an image normalization engine for performing image brightness and contrast normalization. The self-contained image processors and image normalization engine access image data from a memory array; the array is fed data from a multiplicity of imaging modules operating in parallel. The memory array is configured to allow simultaneous access for data input, normalization, and cross-correlation and defect detection. Multiple image processing systems can be configured in parallel as a single image processing computer, all sending defect data to a common display module.
摘要翻译：用于半导体晶片检查的图像处理系统包括用于独立执行图像互相关和缺陷检测的多个自包含图像处理器。该系统还可以包括用于执行图像亮度和对比度归一化的图像归一化引擎。独立的图像处理器和图像归一化引擎从存储器阵列访问图像数据; 该阵列从并行操作的多个成像模块馈送数据。存储器阵列被配置为允许同时访问数据输入，归一化和互相关和缺陷检测。多个图像处理系统可以并行配置为单个图像处理计算机，全部将缺陷数据发送到公共显示模块。

30. 发明授权

US06734428B2 Multi-beam multi-column electron beam inspection system 有权
标题翻译：多光束多列电子束检测系统
公开(公告)号：US06734428B2
公开(公告)日：2004-05-11
申请号：US10222759
申请日：2002-08-15
申请人： N. William Parker , S. Daniel Miller
发明人： N. William Parker , S. Daniel Miller
IPC分类号： G01N2300
CPC分类号： G21K1/087 , G21K5/10 , H01J37/04 , H01J37/28 , H01J2237/04924 , H01J2237/2817
摘要： An electron optics assembly for a multi-column electron beam inspection tool comprises a single accelerator structure and a single focus electrode mounting plate for all columns; the other electron optical components are one per column and are independently alignable. The accelerator structure comprises first and final accelerator electrodes with a set of accelerator plates in between; the first and final accelerator plates have an aperture for each column and the accelerator plates have a single aperture such that the electron optical axes for all columns pass through the single aperture. Independently alignable focus electrodes are attached to the focus electrode mounting plate, allowing each electrode to be aligned to the electron optical axis of its corresponding column. There is one electron gun per column, mounted on the top of the single accelerator structure. In other embodiments, the electron guns are mounted to a single gun mounting plate positioned above the accelerator structure.
摘要翻译：用于多列电子束检查工具的电子光学组件包括用于所有柱的单个加速器结构和单个聚焦电极安装板; 其他电子光学元件是每列一个，并且可独立对准。加速器结构包括在其间具有一组加速器板的第一和最终加速器电极; 第一和最终的加速器板具有用于每一列的孔，并且加速板具有单个孔，使得所有列的电子光轴通过单个孔。独立地对准的聚焦电极附着到聚焦电极安装板上，允许每个电极与其相应列的电子光轴对准。每列有一个电子枪，安装在单个加速器结构的顶部。在其他实施例中，电子枪安装到位于加速器结构上方的单个枪安装板。

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