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    • 25. 发明授权
    • Light emitting semiconductor device with stacked structure
    • 具有层叠结构的发光半导体器件
    • US06180961B2
    • 2001-01-30
    • US09093609
    • 1998-06-09
    • Mitsuhiko OgiharaYukio NakamuraMasumi TaninakaTakatoku Shimizu
    • Mitsuhiko OgiharaYukio NakamuraMasumi TaninakaTakatoku Shimizu
    • H01L3300
    • H01L33/025H01L27/153H01L33/24
    • A high-density semiconductor device and semiconductor device array exhibiting high light emission efficiency which can be mass-produced at low cost with high yield is provided. An LED array comprises a structure wherein an n-type GaAs buffer layer 102 is formed on an n-type GaAs substrate 101, on which are then stacked an n-type AlzGa1−zAs layer 103, an n-type AlyGa1−yAs layer 104, a semi-insulating AlxGa1−xAs layer 105, and a semi-insulating GaAs layer 106. The energy band gaps of the AlzGa1−zAs layer 103 and AlxGa1−xAs layer 105 are at least larger than the energy band gap of the AlyGa1−yAs layer 104. A pn junction is formed by selective diffusion, having a diffusion front in the semiconductor layer having the smaller energy band gap sandwiched between the semiconductor layers having the larger energy band gaps. The outermost layer forming ohmic contact is made a p-type GaAs region formed by zinc diffusion in a semi-insulating GaAs layer.
    • 提供了一种可以以低成本,高产率批量生产的高发光效率的高密度半导体器件和半导体器件阵列。 LED阵列包括其中n型GaAs缓冲层102形成在n型GaAs衬底101上的结构,然后将n型GaAs缓冲层102层叠在n型AlzGa1-zAs层103,n型AllyGa1-yAs层104 ,半绝缘Al x Ga 1-x As层105和半绝缘GaAs层106.AlzGa1-zAs层103和AlxGa1-xAs层105的能带隙至少大于Al y Ga 1-x As层105的能带隙。 通过选择性扩散形成pn结,在半导体层中具有在具有较大能带间隙的半导体层之间具有较小能带隙的扩散前沿。 形成欧姆接触的最外层是在半绝缘GaAs层中通过锌扩散形成的p型GaAs区。