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21. 发明授权

US07471297B2 Image processing device and information recording medium 失效
标题翻译：图像处理装置和信息记录介质
公开(公告)号：US07471297B2
公开(公告)日：2008-12-30
申请号：US11239377
申请日：2005-09-30
申请人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
发明人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
IPC分类号： G06T15/70
CPC分类号： G06T13/20 , A63F13/08 , A63F13/10 , A63F13/52 , A63F13/577 , A63F13/837 , A63F2300/1037 , A63F2300/302 , A63F2300/6081 , A63F2300/64 , A63F2300/643 , A63F2300/646 , A63F2300/66 , A63F2300/6607 , A63F2300/663 , A63F2300/6638 , A63F2300/6692 , A63F2300/8017 , A63F2300/8076 , G06T13/60 , G06T13/80 , G06T15/005 , G06T17/00 , G06T2210/21
摘要： An image processing device for realizing more realistic pictures of explosions in video game devices as well as other devices. Objects displaying such pictures of explosions are formed of spherical polygons (R1, R2, R3, . . . ) and planar polygons (S1, S2, S3, . . . ). Pictures of explosions are realized by alternately arranging these spherical polygons and planar polygons with the lapse in time. Preferably, pictures of polygons are realized by arranging the spherical polygons in layers on the boundary of the planar polygons.
摘要翻译：一种用于在视频游戏设备以及其他设备中实现更真实的爆炸图像的图像处理设备。显示爆炸图像的对象由球形多边形（R1，R2，R3 ...）和平面多边形（S1，S2，S3 ...）形成。通过随时间推移交替布置这些球形多边形和平面多边形来实现爆炸图片。优选地，通过将平面多边形的边界上的层中的球形多边形布置来实现多边形的图片。

22. 发明申请

US20080302965A1 Electron Interferometer or Electron Microscope 有权
标题翻译：电子干涉仪或电子显微镜
公开(公告)号：US20080302965A1
公开(公告)日：2008-12-11
申请号：US11547054
申请日：2005-03-07
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01N23/00
CPC分类号： H01J37/295 , H01J37/26 , H01J2237/1514 , H01J2237/2614
摘要： In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
摘要翻译：在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学采用两级电子双棱镜干涉仪中使用的系统。光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率的电子双棱镜的灯丝电极的任意值。

23. 发明申请

US20060134908A1 Polishing method 审中-公开
标题翻译：抛光方法
公开(公告)号：US20060134908A1
公开(公告)日：2006-06-22
申请号：US11266967
申请日：2005-11-04
申请人： Junhui Oh , Atsunori Kawamura , Tsuyoshi Matsuda , Tatsuhiko Hirano , Katsunobu Hori , Kenji Sakai
发明人： Junhui Oh , Atsunori Kawamura , Tsuyoshi Matsuda , Tatsuhiko Hirano , Katsunobu Hori , Kenji Sakai
IPC分类号： H01L21/4763
CPC分类号： H01L21/7684 , H01L21/02074 , H01L21/3212
摘要： A method for polishing an object to form wiring for a semiconductor device includes: removing part of an outside portion of a conductor layer through chemical and mechanical polishing to expose an upper surface of a barrier layer; and removing a remaining part of the outside portion of the conductor layer and an outside portion of the barrier layer through chemical and mechanical polishing to expose an upper surface of an insulator layer. When removing part of the outside portion of the conductor layer, the upper surface of the object is chemically and mechanically polished using a first polishing composition containing a film forming agent. Subsequently, the upper surface of the object is washed to remove a protective film formed on an upper surface of the conductor layer by the film forming agent in the first polishing composition. Thereafter, the upper surface of the object is chemically and mechanically polished again using a second polishing composition containing the film forming agent. Thus, the wiring of the semiconductor device is reliably formed.
摘要翻译：用于研磨物体以形成用于半导体器件的布线的方法包括：通过化学和机械抛光去除导体层的外部的一部分以暴露阻挡层的上表面; 以及通过化学和机械抛光去除导体层的外部部分的剩余部分和阻挡层的外部部分，以露出绝缘体层的上表面。当去除导体层的外部的一部分时，使用包含成膜剂的第一抛光组合物对物体的上表面进行化学和机械抛光。随后，洗涤物体的上表面以通过第一抛光组合物中的成膜剂除去在导体层的上表面上形成的保护膜。此后，使用含有成膜剂的第二抛光组合物再次对物体的上表面进行化学和机械抛光。因此，可靠地形成半导体器件的布线。

24. 发明授权

US06980207B2 Image processing device and information recording medium 失效
标题翻译：图像处理装置和信息记录介质
公开(公告)号：US06980207B2
公开(公告)日：2005-12-27
申请号：US10681172
申请日：2003-10-09
申请人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
发明人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
IPC分类号： A63F13/00 , G06T13/20 , G06T13/60 , G06T13/80 , G06T15/00 , G06T17/00 , G06T19/00
CPC分类号： G06T13/20 , A63F13/08 , A63F13/10 , A63F13/52 , A63F13/577 , A63F13/837 , A63F2300/1037 , A63F2300/302 , A63F2300/6081 , A63F2300/64 , A63F2300/643 , A63F2300/646 , A63F2300/66 , A63F2300/6607 , A63F2300/663 , A63F2300/6638 , A63F2300/6692 , A63F2300/8017 , A63F2300/8076 , G06T13/60 , G06T13/80 , G06T15/005 , G06T17/00 , G06T2210/21
摘要： An image processing device for realizing more realistic pictures of explosions in video game devices and the like. Objects displaying such pictures of explosions are formed of spherical polygons (R1, R2, R3, . . . ) and planar polygons (S1, S2, S3, . . . ). Pictures of explosions are realized by alternately arranging these spherical polygons and planar polygons with the lapse in time. Preferably, pictures of polygons are realized by arranging the spherical polygons in layers on the boundary of the planar polygons.
摘要翻译：一种用于在视频游戏装置等中实现更真实的爆炸图像的图像处理装置。显示这种爆炸图像的对象由球形多边形（R 1，R 2，R 3，...）和平面多边形（S 1，S 2，S 3，...）形成。通过随时间推移交替布置这些球形多边形和平面多边形来实现爆炸图片。优选地，通过将平面多边形的边界上的层中的球形多边形布置来实现多边形的图片。

25. 发明申请

US20050208761A1 Polishing composition and polishing method 审中-公开
标题翻译：抛光组合物和抛光方法
公开(公告)号：US20050208761A1
公开(公告)日：2005-09-22
申请号：US11085835
申请日：2005-03-21
申请人： Junhui Oh , Atsunori Kawamura , Tsuyoshi Matsuda , Tatsuhiko Hirano , Kenji Sakai , Katsunobu Hori
发明人： Junhui Oh , Atsunori Kawamura , Tsuyoshi Matsuda , Tatsuhiko Hirano , Kenji Sakai , Katsunobu Hori
IPC分类号： B24B37/00 , C09G1/02 , C09K3/14 , C23F3/06 , H01L21/00 , H01L21/304 , H01L21/321 , H01L21/4763
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/06
摘要： A polishing composition contains a surface irregularity-inhibitor, silicon dioxide, an acid, an oxidant, and water. The surface irregularity-inhibitor is at least one selected from, for example, stored polysaccharides and extracellular polysaccharides. The silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The acid is at least one selected from, for example, nitric acid, hydrochloric acid, sulfuric acid, lactic acid, acetic acid, oxalic acid, citric acid, malic acid, succinic acid, butyric acid, and malonic acid. The oxidant is, for example, hydrogen peroxide, persulfate, periodate, perchlorate, nitrate salt, or an oxidative metallic salt. The polishing composition can be suitably used in polishing for forming wiring in a semiconductor device.
摘要翻译：抛光组合物含有表面不规则抑制剂，二氧化硅，酸，氧化剂和水。表面不规则抑制剂是选自例如储存的多糖和细胞外多糖中的至少一种。二氧化硅是例如胶体二氧化硅，热解二氧化硅或沉淀二氧化硅。酸是选自例如硝酸，盐酸，硫酸，乳酸，乙酸，草酸，柠檬酸，苹果酸，琥珀酸，丁酸和丙二酸中的至少一种。氧化剂是例如过氧化氢，过硫酸盐，高碘酸盐，高氯酸盐，硝酸盐或氧化性金属盐。抛光组合物可以适用于在半导体器件中形成布线的抛光。

26. 发明申请

US20050108949A1 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US20050108949A1
公开(公告)日：2005-05-26
申请号：US10952672
申请日：2004-09-29
申请人： Tsuyoshi Matsuda , Tatsuhiko Hirano , Junhui Oh , Atsunori Kawamura , Kenji Sakai
发明人： Tsuyoshi Matsuda , Tatsuhiko Hirano , Junhui Oh , Atsunori Kawamura , Kenji Sakai
IPC分类号： C09G1/02 , C09K3/14 , H01L21/321 , H01L21/768 , B24D3/02
CPC分类号： H01L21/7684 , C09G1/02 , C09K3/1463 , C23F3/04 , H01L21/3212
摘要： A polishing composition of the present invention, to be used in polishing for forming wiring in a semiconductor device, includes: a specific surfactant; a silicon oxide; at least one selected from the group consisting of carboxylic acid and alpha-amino acid; a corrosion inhibitor; an oxidant; and water This polishing composition is capable of suppressing the occurrence of the dishing.
摘要翻译：本发明的抛光组合物，用于在半导体器件中形成布线的抛光中，包括：特定的表面活性剂; 氧化硅; 选自羧酸和α-氨基酸的至少一种; 腐蚀抑制剂; 氧化剂和水这种抛光组合物能够抑制凹陷的发生。

27. 发明授权

US06664965B1 Image processing device and information recording medium 有权
公开(公告)号：US06664965B1
公开(公告)日：2003-12-16
申请号：US09369302
申请日：1999-08-06
申请人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
发明人： Makoto Yamamoto , Kenji Tohma , Shinobu Hayashi , Tsuyoshi Matsuda , Yoshitaka Maeyama , Tomoya Takasugi
IPC分类号： G06T1500
CPC分类号： G06T13/20 , A63F13/08 , A63F13/10 , A63F13/52 , A63F13/577 , A63F13/837 , A63F2300/1037 , A63F2300/302 , A63F2300/6081 , A63F2300/64 , A63F2300/643 , A63F2300/646 , A63F2300/66 , A63F2300/6607 , A63F2300/663 , A63F2300/6638 , A63F2300/6692 , A63F2300/8017 , A63F2300/8076 , G06T13/60 , G06T13/80 , G06T15/005 , G06T17/00 , G06T2210/21
摘要： An image processing device for realizing more realistic pictures of explosions in video game devices and the like. Objects displaying such pictures of explosions are formed of spherical polygons (R1, R2, R3, . . . ) and planar polygons (S1, S2, S3, . . . ). Pictures of explosions are realized by alternately arranging these spherical polygons and planar polygons with the lapse in time. Preferably, pictures of polygons are realized by arranging the spherical polygons in layers on the boundary of the planar polygons.

28. 发明授权

US08779723B2 Battery charge/discharge control apparatus 有权
标题翻译：电池充放电控制装置
公开(公告)号：US08779723B2
公开(公告)日：2014-07-15
申请号：US13379980
申请日：2010-06-01
申请人： Takashi Ogane , Naoki Maruno , Tsuyoshi Matsuda , Yuji Fujita
发明人： Takashi Ogane , Naoki Maruno , Tsuyoshi Matsuda , Yuji Fujita
IPC分类号： H02J7/00
CPC分类号： B60W20/13 , B60K6/485 , B60L11/1857 , B60L11/1862 , B60L11/187 , B60L2260/50 , B60W10/26 , B60W20/00 , B60W2510/246 , B60W2510/248 , B60W2530/14 , G01R31/3679 , H01M10/443 , H01M10/48 , H01M2220/20 , Y02T10/6226 , Y02T10/7044 , Y02T10/705
摘要： A battery charge/discharge control apparatus for a vehicle capable of driving an electric motor by a battery is provided. Temperature of the battery is detected, temperature history distribution of the battery after start of temperature detection is calculated, and a lifetime workload of the battery is calculated on the basis of this temperature history distribution of the battery. A permissible value of a workload increase rate indicating a workload to increase per unit distance is calculated on the basis of the lifetime workload of the battery and a travel distance of the vehicle. An actual workload increase rate of the battery is compared with the permissible value of the workload increase rate. In the case where the actual workload increase rate is larger than the permissible value of the workload increase rate, an output is restricted from the output of the battery restricted in a normal driving mode if necessary by a restricted value based upon a difference between the actual workload increase rate and the permissible value of the workload increase rate. This makes it possible to carry out lifetime prolonging control for the battery more accurately by setting up an appropriate charge/discharge permissible amount in accordance with temperature change of the battery in the past.
摘要翻译：提供一种能够通过电池驱动电动机的车辆的电池充放电控制装置。检测电池的温度，计算开始温度检测后的电池的温度历史分布，并且基于电池的该温度历史分布来计算电池的寿命工作量。基于电池的寿命工作量和车辆的行驶距离来计算表示每单位距离增加的工作负荷的工作量增加率的允许值。将电池的实际工作负载增加率与工作量增加率的允许值进行比较。在实际工作负荷增加率大于工作量增加率的允许值的情况下，如果必要，则以正常驱动模式限制的电池的输出限制输出，基于实际工作负荷增加率的实际值之间的差工作量增加率和工作量增加率的允许值。这使得可以通过根据过去的电池的温度变化设置适当的充电/放电允许量来更精确地执行电池的终身延长控制。

29. 发明授权

US07816648B2 Electron interferometer or electron microscope 有权
标题翻译：电子干涉仪或电子显微镜
公开(公告)号：US07816648B2
公开(公告)日：2010-10-19
申请号：US11547054
申请日：2005-03-07
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda
IPC分类号： G01B15/00
CPC分类号： H01J37/295 , H01J37/26 , H01J2237/1514 , H01J2237/2614
摘要： In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.
摘要翻译：在使用电子双棱镜的电子束干涉系统中，其能够独立地控制每个干涉条纹间距s和干涉宽度W，这两者都是干涉仪和干涉仪获取的干涉图的重要参数，光学采用两级电子双棱镜干涉仪中使用的系统。光学系统在光轴方向上使用两阶段的电子双棱镜，以相对于标本图像相对于相对放大率以及相对于电子双棱镜的细丝电极的图像具有灵活性。另外，作为组合了两个物镜（51,52）的两级配置，独立地控制每个物镜的焦距使得可以相对于标本图像和相对于图像设置相对放大率的电子双棱镜的灯丝电极的任意值。

30. 发明授权

US07655905B2 Charged particle beam equipment 有权
标题翻译：带电粒子束设备
公开(公告)号：US07655905B2
公开(公告)日：2010-02-02
申请号：US11920132
申请日：2006-05-11
申请人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
发明人： Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
IPC分类号： G21K5/10 , G01N23/00
CPC分类号： G01N23/04 , H01J37/023 , H01J37/067 , H01J37/20 , H01J37/26 , H01J2237/024 , H01J2237/1514 , H01J2237/20207 , H01J2237/20214 , H01J2237/262 , H01J2237/317
摘要： Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
摘要翻译：具有旋转机构的带电粒子束设备可以在垂直于带电的光学系统的光轴的平面中以高精度方便地校正入射到具有旋转机构的设备的旋转操作的观察/加工位置的偏移粒子束或稍微倾斜的平面。根据带电粒子束设备中的样本保持器，隔膜或双棱镜等旋转机构的角度信息确定入射到平面中的X-Y偏移，然后执行驱动或控制以消除X-Y偏移。

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