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21. 发明申请

US20080193085A1 MULTIMODE LONG PERIOD FIBER BRAGG GRATING MACHINED BY ULTRAFAST DIRECT WRITING 审中-公开
标题翻译：超声波直接写入多功能长周期光纤布拉格
公开(公告)号：US20080193085A1
公开(公告)日：2008-08-14
申请号：US12104082
申请日：2008-04-16
申请人： Rajminder Singh , Ming Li , Jimmy Yi-Jie-Jia , Xinbing Liu , Tetsuo Ohara
发明人： Rajminder Singh , Ming Li , Jimmy Yi-Jie-Jia , Xinbing Liu , Tetsuo Ohara
IPC分类号： G02B6/26
CPC分类号： G02B6/02095 , G02B6/02085 , G02B6/02147 , G02B2006/0209 , H01S5/12 , H01S5/141 , H01S5/4068
摘要： An optical fiber with an integral photonic crystal structure. The optical fiber core is formed of a non-photosensitive material having an initial index of refraction. The optical fiber core includes a substantially cylindrical surface, a longitudinal core axis, a core radius, and a number of index-altered portions having an altered index of refraction different from the initial cladding index of refraction. The index-altered portions are arranged within the non-photosensitive material of the optical fiber core to form a photonic crystal structure. The photonic crystal structure may be a one dimensional, a two dimensional, or a three dimensional photonic crystal structure.
摘要翻译：具有整体光子晶体结构的光纤。光纤芯由具有初始折射率的非感光材料形成。光纤芯包括基本上圆柱形的表面，纵向芯轴，芯半径以及具有与初始包层折射率不同的改变的折射率的多个折射率改变部分。折射率改变部分布置在光纤芯的非感光材料内，以形成光子晶体结构。光子晶体结构可以是一维，二维或三维光子晶体结构。

22. 发明授权

US06898358B2 Adjustable photonic crystal and method of adjusting the index of refraction of photonic crystals to reversibly tune transmissions within the bandgap 失效
$Adjustable photonic crystal and method of adjusting the index of refraction of photonic crystals to reversibly tune transmissions within the bandgap$
标题翻译：可调光子晶体和调整光子晶体折射率的方法可逆地调谐带隙内的传输
公开(公告)号：US06898358B2
公开(公告)日：2005-05-24
申请号：US10328841
申请日：2002-12-24
申请人： Ming Li , Makoto Ishizuka , Daniel Hogan , Xinbing Liu
发明人： Ming Li , Makoto Ishizuka , Daniel Hogan , Xinbing Liu
IPC分类号： G02B6/12 , G02B6/122 , G02F1/01 , G02B6/00 , H04J14/02
CPC分类号： B82Y20/00 , G02B6/12007 , G02B6/1225
摘要： A photonic crystal comprising a waveguide made of material. The waveguide has a periodic set of holes. The material proximate to at least one of the holes in the periodic set of holes exhibits an index of refraction that has been modified by the application of laser energy relative to the material proximate to other holes in the periodic set of holes. The photonic crystal is tuned to temporarily transmit a specific wavelength of light to create an on-off switch for the specific wavelength. Multiple photonic crystals are used to form a multiplexer and a demultiplexer.
摘要翻译：包括由材料制成的波导的光子晶体。波导具有周期性的一组孔。靠近周期性孔组中的至少一个孔的材料表现出折射率，该折射率已经通过相对于靠近周期性孔组中的其它孔的材料施加激光能量来改变。调整光子晶体以临时传输特定波长的光以产生用于特定波长的开 - 关开关。使用多个光子晶体来形成多路复用器和解复用器。

23. 发明授权

US06710288B2 Method and apparatus for aligning a work piece in a laser drilling system 失效
标题翻译：用于在激光钻孔系统中对准工件的方法和装置
公开(公告)号：US06710288B2
公开(公告)日：2004-03-23
申请号：US10266944
申请日：2002-10-08
申请人： Xinbing Liu , Ming Li
发明人： Xinbing Liu , Ming Li
IPC分类号： B23K2603
CPC分类号： B23K26/067 , B23K26/042 , B23K26/0624 , H05K3/0008 , H05K3/0026
摘要： A method is provided for aligning a workpiece in a laser drilling system. The method includes: providing a workpiece having at least two substantially planar and parallel surfaces, including a first planar surface in which ablations are formed therein by the laser drilling system; propagating an alignment beam of light towards a second planar surface of the workpiece, the alignment beam being incident on and reflected by the second planar surface, thereby forming a reflected beam of light; measuring a reflection angle of the reflected beam; and determining alignment information for the workpiece based on the measured reflection angle of the reflected beam. The method may further include adjusting alignment of the workpiece based on the alignment information.
摘要翻译：提供了一种用于在激光钻孔系统中对准工件的方法。该方法包括：提供具有至少两个基本平坦且平行的表面的工件，其包括第一平面，激光钻孔系统在其中形成有消融; 将对准光束朝向工件的第二平面传播，所述对准光束入射并由第二平面表面反射，从而形成反射光束; 测量反射光束的反射角; 并且基于所测量的反射光束的反射角确定工件的对准信息。该方法还可以包括基于对准信息来调整工件的对准。

24. 发明授权

US08167469B2 Surface light emitting apparatus emitting laser light 有权
标题翻译：表面发光装置发射激光
公开(公告)号：US08167469B2
公开(公告)日：2012-05-01
申请号：US12404767
申请日：2009-03-16
申请人： Xinbing Liu , Janet Milliez
发明人： Xinbing Liu , Janet Milliez
IPC分类号： F21V7/04
CPC分类号： G02B27/0944 , G02B6/0023 , G02B6/0031 , G02B6/0038 , G02B6/0046 , G02B6/0066 , G02F1/133621
摘要： A surface light emitting apparatus capable of providing uniform illumination while efficiently using a laser light. The apparatus comprises a light source section that includes at least one light source which emits laser beam; an optical element section that includes at least one diffractive optical element section that modifies a wavefront of the laser beam emitted from the light source section by diffraction action; and an optical guiding section that guides from an incidence surface of the optical guiding section the laser beam emitted from the diffraction optical section and emits the laser beam from a radiation surface of the optical guiding section.
摘要翻译：一种表面发光装置，能够在有效地使用激光的同时提供均匀的照明。该装置包括：光源部分，其包括发射激光束的至少一个光源; 光学元件部分，其包括至少一个衍射光学元件部分，其通过衍射作用来修改从光源部分发射的激光束的波前; 以及光引导部，其从所述光引导部的入射面引导从所述衍射光学部发射的激光束，并且从所述光导部的辐射面发射所述激光束。

25. 发明申请

US20100309554A1 COLOR SEPARATION MICROLENS AND COLOR SEPARATION GRATING 审中-公开
标题翻译：颜色分离显微镜和颜色分离光栅
公开(公告)号：US20100309554A1
公开(公告)日：2010-12-09
申请号：US12477325
申请日：2009-06-03
申请人： Shuichi Nagai , Xinbing Liu
发明人： Shuichi Nagai , Xinbing Liu
IPC分类号： G02B5/18
CPC分类号： G02B5/1871 , G02B5/1814 , G02B5/1842
摘要： Color separation gratings, color separation microlenses and imaging arrays are provided. A color separation grating includes a transparent grating material having a grating formed therein. The transparent grating material has a first surface configured to receive incident light and a second surface opposite the first surface. The second surface is configured to pass selective separated colors from the incident light corresponding to different diffraction orders. The grating is formed in the first surface and includes a number of steps in a grating period and a number of sub-steps formed on each step. A combination of the number of steps and the number of sub-steps are selected to correspond to a number of diffraction orders produced by the color separation grating.
摘要翻译：提供了色分离光栅，分色微透镜和成像阵列。色分离光栅包括其中形成有光栅的透明光栅材料。透明光栅材料具有被配置为接收入射光的第一表面和与第一表面相对的第二表面。第二表面被配置为从与不同衍射级相对应的入射光中传递选择性分离的颜色。光栅形成在第一表面中并且包括在光栅周期中的多个步骤以及在每个步骤上形成的多个子步骤。选择步数和子步数的组合以对应于由分色光栅产生的衍射次数。

26. 发明授权

US07788998B2 Precision machining system and methods 失效
标题翻译：精密加工系统及方法
公开(公告)号：US07788998B2
公开(公告)日：2010-09-07
申请号：US11374373
申请日：2006-03-13
申请人： Jon Ethington , Xinbing Liu
发明人： Jon Ethington , Xinbing Liu
IPC分类号： B23B5/36 , B23B5/00
CPC分类号： B23B1/00 , B23B2226/31 , Y10T82/25 , Y10T82/2512 , Y10T82/2585 , Y10T82/2591
摘要： A precision machining system with a variable projected machining width of the cutting surface of the machining tool, including: a workpiece holder to hold a workpiece; a machining tool holder to hold the machining tool such that the Z axis is substantially parallel to the tool's centerline; a Z translation stage and an X translation stage each coupled to one of the workpiece holder or the machining tool holder; a workpiece spindle coupled to the workpiece holder to rotate the workpiece about the workpiece axis that is parallel to the Z axis; a machining path controller electrically coupled to the X translation stage and the workpiece spindle; and a tool spindle coupled to the machining tool holder. The tool spindle rotates the machining tool about the centerline of the machining tool, which varies the width of the cutting surface of the machining tool projected perpendicular to the machining path.
摘要翻译：一种精密加工系统，具有加工刀具切削面的可变投影加工宽度，包括：工件夹持器，用于夹持工件; 加工工具夹持器，用于保持加工工具，使得Z轴基本上平行于工具的中心线; Z平移台和X平移台，每个平台与工件保持器或加工工具夹具中的一个相连接; 工件主轴，其联接到工件夹持器，以使工件围绕平行于Z轴的工件轴旋转; 电耦合到X平移台和工件主轴的加工路径控制器; 以及联接到加工工具保持器的工具主轴。工具主轴围绕加工工具的中心线旋转加工工具，这改变了加工刀具垂直于加工路径投影的切削面的宽度。

27. 发明授权

US07614831B2 Machining tools having concave cutting surfaces for precision machining and methods of manufacturing such 失效
标题翻译：具有用于精密加工的凹形切削表面的加工工具及其制造方法
公开(公告)号：US07614831B2
公开(公告)日：2009-11-10
申请号：US11374582
申请日：2006-03-13
申请人： Xinbing Liu , Jon Ethington
发明人： Xinbing Liu , Jon Ethington
IPC分类号： B23B27/00
CPC分类号： B23B27/20 , B23B27/005 , B23B27/14 , B23B2200/083 , B23B2200/085 , B23B2200/286 , B23B2222/92 , B23B2226/31 , B23B2226/72 , Y10T407/23 , Y10T407/27 , Y10T407/28
摘要： A machining tool with a cutting surface adapted to provide a variable projected machining width during machining, including the cutting surface and a back surface. The cutting surface includes a first cutting edge and a second cutting edge that extend to a tip of the machining tool and a cross section normal to a centerline of the machining tool that is concave between the first cutting edge and the second cutting edge. The back surface forms a first acute angle with the cutting surface at the first cutting edge and a second acute angle with the cutting surface at the second cutting edge, such that the cross section of the back surface normal to the centerline of the machining tool is convex between the first cutting edge and the second cutting edge.
摘要翻译：一种具有切割表面的加工工具，其适于在加工期间提供可变的投影加工宽度，包括切割表面和后表面。切割表面包括延伸到加工工具的尖端的第一切削刃和第二切削刃以及垂直于加工工具的中心线的横截面，该切削刃在第一切削刃和第二切削刃之间是凹入的。后表面与第一切削刃处的切削表面形成第一锐角，并且与第二切削刃处的切削表面形成第二锐角，使得垂直于加工工具的中心线的后表面的横截面为在第一切削刃和第二切削刃之间凸起。

28. 发明授权

US07505499B2 Slab laser amplifier with parasitic oscillation suppression 有权
标题翻译：平板激光放大器具有寄生振荡抑制
公开(公告)号：US07505499B2
公开(公告)日：2009-03-17
申请号：US11013203
申请日：2004-12-15
申请人： Craig First , Xinbing Liu
发明人： Craig First , Xinbing Liu
IPC分类号： H01S3/14
CPC分类号： H01S3/0606 , H01S3/0615 , H01S3/063 , H01S3/08095 , H01S3/0941 , H01S3/2333
摘要： A slab laser amplifier with parasitic oscillation suppression has a plurality of angled pump faces related to one another in order to decrease likelihood of parasitic oscillations, with internal beam incidence angles at total internal reflection that alleviate need for reflective coatings. No polished surfaces of gain material comprising the amplifier are parallel to one another. A beam path within the gain material is such that all incident angles of the beam path upon the two main faces and the common end face are greater than a critical angle required for total internal reflection, thereby alleviating need for reflective coatings. Based on an index of refraction of the gain material, and based on a diameter of the laser beam, dimensions of the gain material are selected to maximize beam overlap in a pumped volume of the gain material.
摘要翻译：具有寄生振荡抑制的平板激光放大器具有彼此相关的多个倾斜的泵浦面，以便减少寄生振荡的可能性，其中内部射束入射角在全内反射处可减轻对反射涂层的需要。不包括放大器的增益材料的抛光表面彼此平行。增益材料内的光束路径使得在两个主面和公共端面上的光束路径的所有入射角大于全内反射所需的临界角，从而减轻对反射涂层的需要。基于增益材料的折射率，并且基于激光束的直径，选择增益材料的尺寸以使增益材料的泵送体积中的束重叠最大化。

29. 发明申请

US20060263698A1 Apparatus and method of making a grayscale photo mask and an optical grayscale element 失效
标题翻译：制造灰度光掩模和光学灰度元件的装置和方法
公开(公告)号：US20060263698A1
公开(公告)日：2006-11-23
申请号：US11134310
申请日：2005-05-23
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G02B6/00 , H01S5/00 , G03F1/00
CPC分类号： G03F7/70383 , G03F1/50 , G03F7/0015
摘要： An apparatus and method for making a grayscale photo mask and a three-dimensional grayscale diffractive optical element operate as follows. A grayscale photo mask is obtained by exposing a laser direct write (LDW) glass material to laser beam radiation from a first laser beam of modulated power moved over a grid of discrete locations on the LDW material, the modulated power being in accordance with grayscale pattern data, and, while the first laser beam is moved over the discrete locations of the grid, exposing the grid to a second laser beam, the power of the second laser beam being less than the bleach threshold of the glass material, to provide each of the discrete locations with a gray scale level to provide a predetermined gray scale pattern of varying optical transmissivity on the LDW material to produce a grayscale mask. An optical element is obtained by exposing a photoresist layer on a wafer to radiation transmitted through the grayscale mask; and removing material from the photoresist layer to provide a predetermined varying thickness of the photoresist layer as determined by the gray scale patterns on the grayscale mask to produce the three-dimensional grayscale diffractive optical element. The optical element may be a diffraction grating. The power of the second laser exposed on said discrete locations may be between about 50 mW and about 5 W, and the power of the first laser exposed on the discrete locations may be between about 20 mW and about 500 mW.
摘要翻译：用于制造灰度光掩模和三维灰度级衍射光学元件的装置和方法如下操作。通过将激光直接写入（LDW）玻璃材料暴露于来自在LDW材料上离散位置网格上移动的调制电力的第一激光束的激光束辐射，获得灰度光掩模，调制后的功率与灰度图数据，并且当第一激光束在网格的离散位置移动时，将栅格暴露于第二激光束，第二激光束的功率小于玻璃材料的漂白阈值，以提供每个具有灰度级的离散位置，以在LDW材料上提供改变光学透射率的预定灰度图案，以产生灰度掩模。通过将晶片上的光致抗蚀剂层暴露于通过灰度掩模的辐射而获得光学元件; 以及从光致抗蚀剂层去除材料以提供通过灰度掩模上的灰度图案确定的光致抗蚀剂层的预定变化厚度，以产生三维灰度级衍射光学元件。光学元件可以是衍射光栅。暴露在所述分立位置上的第二激光器的功率可以在约50mW至约5W之间，并且在离散位置上暴露的第一激光器的功率可以在约20mW至约500mW之间。

30. 发明申请

US20060210886A1 Method for making grayscale photo masks and optical grayscale elements 审中-公开
标题翻译：制作灰度光罩和光学灰阶元件的方法
公开(公告)号：US20060210886A1
公开(公告)日：2006-09-21
申请号：US11083324
申请日：2005-03-18
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G09B7/00 , G03C5/00 , G03F1/00
CPC分类号： G03F1/50
摘要： A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the photo-resist. After development, the exposed portions are removed and ions are implanted to obtain a modulated ion density in the photo mask blank. The implanted ions become color centers which absorb a specific wavelength of light and the modulated distribution of the color substrates create the grayscale photo mask. The photo resist structure is finally removed to produce a grayscale photo mask.
摘要翻译：在光掩模板的表面上设置正型光致抗蚀剂。然后将光暴露在光致抗蚀剂上，以在光致抗蚀剂中形成未曝光和曝光部分的预定图案。显影后，去除曝光部分，并注入离子以获得光掩模板坯中调制的离子密度。注入的离子成为吸收特定波长的光的色心，并且彩色底物的调制分布产生灰度光掩模。最后去除光致抗蚀剂结构以产生灰度光掩模。

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