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    • 21. 发明申请
    • METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE
    • 用于确定报告偏移和用于确定阶段的补偿地图的方法
    • US20120127447A1
    • 2012-05-24
    • US13110760
    • 2011-05-18
    • Pai-Hsueh YangScott CoakleyMichael B. BinnardKazuhiro HiranoBausan YuanShiang-Lung Koo
    • Pai-Hsueh YangScott CoakleyMichael B. BinnardKazuhiro HiranoBausan YuanShiang-Lung Koo
    • G03B27/58
    • G03F7/70758G03F7/70516G03F7/70775H02P6/006
    • A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
    • 用于确定相对于台架(220B)移动和定位平台(220A)的移动器组件(220C)的移动器(250A)的换向偏移的方法包括以闭环方式控制所述动子组件(220C) 以使台架(220A)沿着第一轴线并且沿着第二轴线保持台架(220A)的位置,台架(220A)悬浮在平台底座(220B)上方。 该方法还包括以下步骤:(i)将电流引导到移动器组件(220C)的线圈阵列(240),使得移动器组件(220C)在平台(220A)上施加干扰; 以及(ii)评估由所述移动器组件(220C)产生的由所述移动器(250A)产生的所述平台(220A)上的干扰所产生的一个或多个力。 此外,用于产生补偿图(1402)的方法包括将多个激励信号顺序地引导到移动器组件(220C)的控制,并且确定由多个激励信号产生的控制命令。
    • 22. 发明申请
    • METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE
    • 用于确定报告偏移量和确定阶段补偿地图的方法
    • US20120113405A1
    • 2012-05-10
    • US13101264
    • 2011-05-05
    • Pai-Hsueh YangScott CoakleyMichael B. BinnardKazuhiro HiranoBausan YuanShiang-Lung Koo
    • Pai-Hsueh YangScott CoakleyMichael B. BinnardKazuhiro HiranoBausan YuanShiang-Lung Koo
    • G03B27/58G05B1/06
    • G03F7/70758G03F7/70516G03F7/70775H02P6/006
    • A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
    • 用于确定相对于台架(220B)移动和定位平台(220A)的移动器组件(220C)的移动器(250A)的换向偏移的方法包括以闭环方式控制所述动子组件(220C) 以使台架(220A)沿着第一轴线并且沿着第二轴线保持台架(220A)的位置,台架(220A)悬浮在平台底座(220B)上方。 该方法还包括以下步骤:(i)将电流引导到移动器组件(220C)的线圈阵列(240),使得移动器组件(220C)在平台(220A)上施加干扰; 以及(ii)评估由所述移动器组件(220C)产生的由所述移动器(250A)产生的所述平台(220A)上的干扰所产生的一个或多个力。 此外,用于产生补偿图(1402)的方法包括将多个激励信号顺序地引导到移动器组件(220C)的控制,并且确定由多个激励信号产生的控制命令。
    • 23. 发明授权
    • On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
    • 用于识别和补偿由多个执行器在多轴平台上产生的力 - 波动和侧力的机上方法
    • US08140288B2
    • 2012-03-20
    • US11986314
    • 2007-11-19
    • Pai-Hsueh YangBausan YuanKazuo MasakiKazuhiro HiranoXiao-Feng YangScott CoakleyMichael B. Binnard
    • Pai-Hsueh YangBausan YuanKazuo MasakiKazuhiro HiranoXiao-Feng YangScott CoakleyMichael B. Binnard
    • G01L25/00
    • G03F7/70758G03F7/70725
    • Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.
    • 公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法,装置和系统。 可以对所识别的力 - 纹波和/或侧向力进行映射,并且获得用于校正相应的位置相关的补偿比的映射。 这些方法对于使用多个(冗余)致动器在至少一个自由度中提供运动的阶段特别有用。 在示例性方法中,使用至少一个所选择的致动器,在主体致动器的运动范围内的设定距离上移动台架构件多次。 每个位移具有预定的轨迹和该范围内的相应起始点。 对于每个位移,提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。 组合多段补偿比作为该范围内的位移的函数,以提供在整个范围内的致动器的补偿比的图。
    • 26. 发明申请
    • EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM
    • 曝光装置与扫描照明光束
    • US20090303454A1
    • 2009-12-10
    • US12481326
    • 2009-06-09
    • Michael B. BinnardDouglas C. WatsonDaniel Gene SmithDavid M. Williamson
    • Michael B. BinnardDouglas C. WatsonDaniel Gene SmithDavid M. Williamson
    • G03B27/54
    • G03B27/54G03F7/70358
    • An exposure apparatus (10) for transferring a mask pattern (358) from a mask (12) to a substrate (14) includes a mask retainer (44), a substrate stage assembly (24), and an illumination system (18). The mask retainer (44) retains the mask (12). The substrate stage assembly (24) retains and positions the substrate (14). The illumination system (18) generates an illumination beam (31) that moves along a beam scan axis (35) relative to the mask (12) to scan at least a portion of the mask pattern (358). The beam scan axis (35) is substantially parallel to the mask pattern (358). The illumination system (18) can include an illumination source (32) that generates the illumination beam (31) and an illumination optical assembly (34) that guides the illumination beam (31). The illumination optical assembly (34) moves the illumination beam (31) relative to the mask (12) so that the illumination beam (31) scans substantially the entire mask pattern (358). The illumination optical assembly (34) can further include an illumination reflector (36) that is incident on the illumination beam (31), and the illumination reflector (36) can be selectively moved to move the illumination beam (31) along the beam scan axis (35).
    • 用于将掩模图案(358)从掩模(12)传送到基板(14)的曝光装置(10)包括掩模保持器(44),基板台组件(24)和照明系统(18)。 掩模保持器(44)保持掩模(12)。 衬底台组件(24)保持并定位衬底(14)。 照明系统(18)产生相对于掩模(12)沿着光束扫描轴(35)移动以扫描掩模图案(358)的至少一部分的照明光束(31)。 光束扫描轴(35)基本上平行于掩模图案(358)。 照明系统(18)可以包括产生照明光束(31)的照明源(32)和引导照明光束(31)的照明光学组件(34)。 照明光学组件(34)相对于掩模(12)移动照明光束(31),使得照明光束(31)基本上扫描整个掩模图案(358)。 照明光学组件(34)还可以包括入射到照明光束(31)上的照明反射器(36),并且照明反射器(36)可以被选择性地移动以沿着光束扫描来移动照明光束(31) 轴(35)。
    • 28. 发明申请
    • METHODS FOR LIMITING COUNTER-MASS TRIM-MOTOR FORCE AND STAGE ASSEMBLIES INCORPORATING SAME
    • 用于限制相同尺寸的电机和电机组合的方法
    • US20120069316A1
    • 2012-03-22
    • US13228341
    • 2011-09-08
    • Pai-Hsueh YangMichael B. BinnardScott Coakley
    • Pai-Hsueh YangMichael B. BinnardScott Coakley
    • G03B27/58G05B11/42
    • G05B19/404G03F7/70725G03F7/70766
    • An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a reactive motion of the counter-mass counter to the motion of the stage mass. At least one trim-motor is coupled to the counter-mass. A control system commands the trim-motor to regulate movement of the counter-mass in reaction to stage-mass motion. A PI feedback controller receives the following-error of the counter-mass and generates corresponding center-of-gravity (CG) force commands and trim-motor force commands to the trim-motor(s) to produce corrective counter-mass motion. A trim-motor force limiter receives trim-motor force commands and produces corresponding limited trim-motor force commands that are fed back as actual CG force commands to the feedback controller to modify integral terms of the feedback controller according to the limited trim-motor force commands.
    • 示例性的舞台组件具有可移动的舞台质量和反质量。 舞台电机被耦合到舞台质量和反质量,使得由舞台电动机施加的舞台质量运动导致反质量计数器对舞台质量的运动的反作用运动。 至少一个调整电机与反质量联接。 控制系统命令微调电机调节反质量运动反应阶段质量运动。 PI反馈控制器接收反质量的跟随误差,并产生相应的重心(CG)力指令和微调电机力指令给微调电机,以产生校正反质量运动。 修剪马达力限制器接收修剪马达力指令并产生相应的有限的修剪马达力命令,作为实际的CG力命令反馈到反馈控制器,以根据限制的修正马达力修改反馈控制器的积分项 命令。