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21. 发明申请

US20080115728A1 Plasma Processing Apparatus 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：US20080115728A1
公开(公告)日：2008-05-22
申请号：US11660862
申请日：2006-02-22
申请人： Ryuichi Matsuda , Masahiko Inoue
发明人： Ryuichi Matsuda , Masahiko Inoue
IPC分类号： C23C16/22
CPC分类号： H01L22/20 , H01J37/32009 , H01J37/32568 , H01J37/32935
摘要： When the size of a substrate 1 is instructed, a map of uniform sputter-etching possible region based on the relationship between the diameter-size Dp of a high-density plasma region and the height H from the center of the high-density plasma region to the bottom of a plasma diffusion region is read out; on the basis of the internal pressure and the frequency of electromagnetic waves from an antenna 116, the value of the height Hp from the center of the high-density plasma region to the upper surface inside a vacuum chamber 111, and the value of the Dp are obtained; on the basis of the internal pressure and the magnitude of the self-bias potential of the substrate 1, the height Hs between the bottom of the plasma diffusion region and the top surface of a supporting table 113 is obtained; on the basis of the above-mentioned values of Dp, Hp and Hs, the value of the H in the uniform sputter-etching possible region is obtained from the map; and a lifting-and-lowering device 121 is controlled so that H can have the above-mentioned value.
摘要翻译：当指示基板1的尺寸时，基于高密度等离子体区域的直径尺寸Dp与来自高密度等离子体区域的中心的高度H之间的关系的均匀溅射蚀刻可能区域的图读出等离子体扩散区域的底部; 基于来自天线116的电磁波的内部压力和频率，从高密度等离子体区域的中心到真空室111内的上表面的高度Hp的值，以及Dp 获得; 基于衬底1的内部压力和自偏置电位的大小，获得等离子体扩散区域的底部和支撑台113的顶面之间的高度Hs; 基于上述Dp，Hp和Hs的值，从图中获得均匀溅射蚀刻可能区域中的H的值; 并且控制升降装置121使得H可以具有上述值。

22. 发明授权

US07314525B2 Plasma CVD apparatus 有权
标题翻译：等离子体CVD装置
公开(公告)号：US07314525B2
公开(公告)日：2008-01-01
申请号：US10201020
申请日：2002-07-24
申请人： Tadashi Shimazu , Masahiko Inoue
发明人： Tadashi Shimazu , Masahiko Inoue
IPC分类号： C23C16/00 , C23C14/00
CPC分类号： C23C16/45523 , C23C16/402 , C23C16/517 , H01J37/32082 , H01J37/32706
摘要： A plasma CVD apparatus comprises a reaction container for allowing a reaction for forming a thin film on a semiconductor wafer to be performed, a bias electrode which applies a high frequency bias for sputtering to the semiconductor wafer, a nozzle which supplies SiH4 gas including at least hydrogen into the reaction container, and a control circuit which on/off-controls the high frequency bias through a switch and which on/off-controls the supply of SiH4 gas through a flow rate controller based on an opposite control logic to a high frequency bias control logic.
摘要翻译：等离子体CVD装置包括用于在要执行的半导体晶片上形成薄膜的反应的反应容器，向半导体晶片施加用于溅射的高频偏压的偏置电极，提供SiH 4的喷嘴至少包括氢的气体进入反应容器，以及控制电路，其通过开关对高频偏置进行开/关控制，并且控制电源的通过开/关控制SiH 4 气体通过流量控制器基于与高频偏置控制逻辑相反的控制逻辑。

23. 发明授权

US07001865B2 Catalyst for use in fuel electrode of polymer solid electrolyte type fuel cell 有权
标题翻译：用于聚合物固体电解质型燃料电池燃料电极的催化剂
公开(公告)号：US07001865B2
公开(公告)日：2006-02-21
申请号：US10484962
申请日：2003-04-11
申请人： Tomoyuki Tada , Masahiko Inoue
发明人： Tomoyuki Tada , Masahiko Inoue
IPC分类号： B01J21/18 , B01J23/40 , H01M4/88 , H01M4/86
CPC分类号： H01M4/926 , B01J21/18 , B01J23/462 , H01M4/921
摘要： The present invention is a catalyst for use in a fuel electrode of a polymer solid electrotype fuel cell which is formed by making a carbon powder support platinum and ruthenium thereon, and is characterized in that the loading ratio between platinum and ruthenium is from 1:2.5 to 1:4 (in molar ratio). It is preferable that the loading density of the catalyst is 40 to 70%. Additionally, it is preferable that a carbon powder having a specific surface area of 600 to 1,200 m2/g is used as the carrier supporting the catalyst particles.
摘要翻译：本发明是一种用于聚合物固体电型燃料电池的燃料电极的催化剂，其通过使碳粉在其上载持铂和钌而形成，其特征在于铂和钌的负载比为1:2.5 至1：4（摩尔比）。催化剂的负载密度优选为40〜70％。此外，优选使用比表面积为600〜1200m 2 / g的碳粉作为负载催化剂粒子的载体。

24. 发明申请

US20050174135A1 Method and device for measuring wafer potential or temperature 有权
标题翻译：用于测量晶片电位或温度的方法和装置
公开(公告)号：US20050174135A1
公开(公告)日：2005-08-11
申请号：US10513396
申请日：2003-06-17
申请人： Ryuichi Matsuda , Yuichi Kawano , Masahiko Inoue
发明人： Ryuichi Matsuda , Yuichi Kawano , Masahiko Inoue
IPC分类号： H01L21/00 , H01L21/683 , G01R31/02
CPC分类号： H01L21/67253 , H01L21/67248 , H01L21/6831
摘要： The present invention attracts a wafer 6, placed on a susceptor 5, toward the susceptor 5 by the electrostatic attractive power of an electrostatic chuck electrode 7, varies the output voltage of a variable direct current power source 23 for the electrostatic chuck electrode 7 while measuring the temperature of the wafer 6 by a temperature detection sensor 21; and detects the potential of the wafer 6 based on the output voltage of the variable direct current power source 23 at a time when the temperature of the wafer 6 peaks.
摘要翻译：本发明通过静电卡盘电极7的静电吸引力吸引放置在基座5上的晶片6，从而使静电卡盘电极7的可变直流电源23的输出电压变化，同时测量温度检测传感器21的晶片6的温度; 并且在晶片6的温度高峰时基于可变直流电源23的输出电压来检测晶片6的电位。

25. 发明授权

US08480912B2 Plasma processing apparatus and plasma processing method 失效
公开(公告)号：US08480912B2
公开(公告)日：2013-07-09
申请号：US12065373
申请日：2007-02-15
申请人： Ryuichi Matsuda , Masahiko Inoue , Kazuto Yoshida , Tadashi Shimazu
发明人： Ryuichi Matsuda , Masahiko Inoue , Kazuto Yoshida , Tadashi Shimazu
IPC分类号： B44C1/22 , B05C11/00 , C23F1/08 , B01J19/08
CPC分类号： H01J37/32743 , H01J37/3244
摘要： Provided are a plasma processing apparatus and a plasma processing method, by which plasma damage is reduced during processing. At the time of performing desired plasma processing to a substrate (5), a process chamber (2) is supplied with an inert gas for carrying in and out the substrate (5), pressure fluctuation in the process chamber (2) is adjusted to be within a prescribed range, and plasma (20) of the inert gas supplied in the process chamber (2) is generated. The density of the plasma (20) in the transfer area of the substrate (5) is reduced by controlling plasma power to be in a prescribed range, and the substrate (5) is carried in and out to and from a supporting table (4).

26. 发明申请

US20100147261A1 GASOLINE ENGINE 审中-公开
标题翻译：汽油发动机
公开(公告)号：US20100147261A1
公开(公告)日：2010-06-17
申请号：US12337760
申请日：2008-12-18
申请人： Junichi YAMAGUCHI , Shinya MATOHARA , Masahiko Inoue
发明人： Junichi YAMAGUCHI , Shinya MATOHARA , Masahiko Inoue
IPC分类号： F02B17/00
CPC分类号： F02B17/00 , F02B23/101 , F02B23/104 , F02D41/3029 , F02D41/3094 , F02M69/046 , Y02T10/125
摘要： A gasoline engine is provided that effectively uses two injectors to enhance homogeneity of mixture at the time of high-load for improving output power and to enable stable operation also when stratified or weak stratified combustion is performed.One cylinder is provided with a first injector 122a and a second injector 122b, which directly inject fuel into the cylinder. An ECU 201 uses one or both the injectors to perform fuel injection during one combustion cycle depending on operating conditions.
摘要翻译：提供了一种汽油发动机，其有效地使用两个喷射器以在高负载时提高混合物的均匀性，以提高输出功率，并且当也进行分层或弱分层燃烧时也能够稳定运行。一个气缸设置有第一喷射器122a和第二喷射器122b，其将燃料直接喷射到气缸中。 ECU201使用一个或两个喷射器根据操作条件在一个燃烧循环期间执行燃料喷射。

27. 发明授权

US07335619B2 Catalyst for fuel electrode of solid polymer fuel cell 有权
标题翻译：固体高分子燃料电池燃料电极催化剂
公开(公告)号：US07335619B2
公开(公告)日：2008-02-26
申请号：US11302394
申请日：2005-12-14
申请人： Tomoyuki Tada , Masahiko Inoue , Koichi Matsutani
发明人： Tomoyuki Tada , Masahiko Inoue , Koichi Matsutani
IPC分类号： B01J21/18 , B01J23/40 , B01J23/74 , B01J23/42 , B01J23/44
CPC分类号： H01M4/8652 , H01M4/92 , H01M4/926 , H01M2008/1095
摘要： There is provided a catalyst for a fuel electrode of a solid polymer fuel cell, wherein the catalyst comprises fine precious metal particles loaded on a support composed of an electrically conductive material, and wherein the weight ratio of the fine precious metal particles and the support composed of an electrically conductive material (fine precious metal particles:electrically conductive material) is 60:40 to 95:5; and the fine precious metal particles satisfy the following conditions (a) to (c): (a) the fine precious metal particles contain platinum and ruthenium, and the mixing ratio thereof (platinum:ruthenium) is within a range between 1:1 and 1:3 in terms of molar ratio; (b) the fine precious metal particles have an average particle diameter of 3 to 10 nm; and (c) the fine precious metal particles contain oxygen, and the weight ratio of the fine precious metal particles and oxygen (fine precious metal particles:oxygen) is 86:14 to 96:4.
摘要翻译：提供了一种用于固体高分子型燃料电池的燃料电极的催化剂，其中催化剂包含负载在由导电材料构成的载体上的细小的贵金属颗粒，并且其中贵金属微粒和载体的重量比构成的导电材料（细贵金属颗粒：导电材料）为60:40至95:5; 贵金属微粒满足以下条件（a）〜（c）：（a）贵金属微粒含有铂和钌，其混合比（铂：钌）在1:1〜 1：3的摩尔比; （b）贵金属微粒的平均粒径为3〜10nm; （c）贵金属微粒含有氧，贵金属微粒与氧（贵金属微粒：氧）的重量比为86:14〜96:4。

28. 发明申请

US20050202183A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method 审中-公开
标题翻译：等离子体处理系统，等离子体处理方法，等离子体膜沉积系统和等离子体膜沉积方法
公开(公告)号：US20050202183A1
公开(公告)日：2005-09-15
申请号：US10514017
申请日：2003-06-17
申请人： Ryuichi Matsuda , Tadashi Shimazu , Masahiko Inoue
发明人： Ryuichi Matsuda , Tadashi Shimazu , Masahiko Inoue
IPC分类号： C23C16/507 , B01J19/08 , H01J37/32 , H01L21/205 , H05H1/46 , C03C15/00 , C23F1/00 , H05H1/24
CPC分类号： H01J37/321 , C23C16/507
摘要： A plasma film deposition apparatus (plasma processing apparatus) is disclosed, which includes a second antenna 11b disposed around an antenna 11a and located outwardly of a ceiling surface, and which supplies the second antenna 11b with an electric current flowing in a direction opposite to the direction of an electric current supplied to the antenna 11a by power supply means, whereby lines of magnetic force, F2, heading in a direction opposite to the direction of lines of magnetic force, F1, appearing at the site of the antenna 11a are generated at the site of the second antenna 11b. Thus, the magnetic flux density in the direction of the wall surface is lowered, even when a uniform plasma is generated in a wide range within a tubular container 2.
摘要翻译：公开了一种等离子体成膜装置（等离子体处理装置），其包括设置在天线11a周围并位于天花板表面外侧的第二天线11b，并且向第二天线11b提供沿着方向与通过电源装置供给到天线11a的电流的方向相反，由此在与磁力线F 1相反的方向上的磁力线F 2出现在天线11a在第二天线11b的位置产生。因此，即使在管状容器2内的宽范围内产生均匀的等离子体，壁面方向的磁通密度降低。

29. 发明授权

US06847518B2 Membrane electrode assembly for polymer electrolyte fuel cell 有权
标题翻译：用于聚合物电解质燃料电池的膜电极组件
公开(公告)号：US06847518B2
公开(公告)日：2005-01-25
申请号：US10725331
申请日：2003-12-02
申请人： Kaoru Fukuda , Masaki Tani , Hayato Kaji , Shigeru Inai , Takeshi Muro , Shinya Watanabe , Tomoyuki Tada , Masahiko Inoue
发明人： Kaoru Fukuda , Masaki Tani , Hayato Kaji , Shigeru Inai , Takeshi Muro , Shinya Watanabe , Tomoyuki Tada , Masahiko Inoue
IPC分类号： H01M4/90 , H01G9/02 , H01G9/04 , H01M4/86 , H01M4/88 , H01M4/92 , H01M4/96 , H01M8/10
CPC分类号： H01M4/926 , H01M4/8605 , H01M4/921 , H01M8/1004
摘要： A membrane electrode assembly for a polymer electrolyte fuel cell has a polymer electrolyte membrane, an anode, and a cathode having a catalytic layer and a diffusion layer. The alloy catalyst contains ruthenium in the anode diffusion layer. The assembly has less loss of efficiency, particularly when operated at high potentials.
摘要翻译：用于聚合物电解质燃料电池的膜电极组件具有聚合物电解质膜，阳极和具有催化层和扩散层的阴极。合金催化剂在阳极扩散层中含有钌。该组件的效率损失较小，特别是在高电位下运行时。

30. 发明授权

US5594538A Image forming apparatus having multi-layer transfer material bearing member with different coefficient of kinetic frictions between layers 失效
标题翻译：图像形成装置具有层间不同的动摩擦系数的多层转印材料承载部件
公开(公告)号：US5594538A
公开(公告)日：1997-01-14
申请号：US172057
申请日：1993-12-23
申请人： Nobuhiko Takekoshi , Masahiko Inoue
发明人： Nobuhiko Takekoshi , Masahiko Inoue
IPC分类号： G03G15/01 , G03G15/16
CPC分类号： G03G15/0131 , G03G15/1685 , G03G2215/0177 , G03G2215/1628
摘要： The present invention provides an image forming apparatus comprising an image bearing means for bearing an image, a transfer material bearing member for bearing and conveying a transfer material, and a transfer member for transferring the image on the image bearing means onto the transfer material born by the transfer material bearing member, the transfer member being arranged to contact with a surface of the transfer material bearing member opposite to a surface on which the transfer material is born. The transfer member comprises a first layer contacting with the transfer material bearing member and a second layer not contacting with the transfer material bearing member, and the first layer has coefficient of kinetic friction smaller than that of the second layer.
摘要翻译：本发明提供了一种图像形成装置，包括用于承载图像的图像承载装置，用于承载和输送转印材料的转印材料承载部件，以及用于将图像承载装置上的图像转印到由转印材料承载构件，转印构件布置成与转印材料承载构件的与转印材料出现的表面相对的表面接触。转印构件包括与转印材料承载构件接触的第一层和不与转印材料承载构件接触的第二层，并且第一层的动摩擦系数小于第二层的系数。

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