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    • 21. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
    • 半导体器件及其形成方法
    • US20130168666A1
    • 2013-07-04
    • US13433311
    • 2012-03-29
    • Jing-Yi YanChen-Wei LinChih-Chieh HsuKing-Yuan Ho
    • Jing-Yi YanChen-Wei LinChih-Chieh HsuKing-Yuan Ho
    • H01L29/12H01L21/336
    • H01L27/1225H01L27/1251
    • A semiconductor device is provided. A first semiconductor layer is disposed on a substrate and has a channel region and two doped regions beside the channel region. A first dielectric layer is disposed on the substrate and covers the first semiconductor layer. A gate is disposed on the first dielectric layer and corresponds to the channel region of the first semiconductor layer. A second dielectric layer is disposed on the first dielectric layer and covers the gate. A second semiconductor layer is disposed on the second dielectric layer and corresponds to the gate. The boundary of the second semiconductor layer does not exceed that of the gate. At least one first conductive plug penetrates through the first and second dielectric layers and contacts one doped region of the first semiconductor layer. At least one contact contacts the second semiconductor layer. A method of forming a semiconductor device is also provided.
    • 提供一种半导体器件。 第一半导体层设置在衬底上,并且在沟道区域旁边具有沟道区和两个掺杂区。 第一电介质层设置在衬底上并覆盖第一半导体层。 栅极设置在第一介电层上并对应于第一半导体层的沟道区。 第二电介质层设置在第一电介质层上并覆盖栅极。 第二半导体层设置在第二电介质层上并对应于栅极。 第二半导体层的边界不超过栅极的边界。 至少一个第一导电插塞穿过第一和第二电介质层并接触第一半导体层的一个掺杂区域。 至少一个触点接触第二半导体层。 还提供了一种形成半导体器件的方法。