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21. 发明授权

US4240791A Dyeing method for fibrous products 失效
标题翻译：纤维制品染色方法
公开(公告)号：US4240791A
公开(公告)日：1980-12-23
申请号：US12341
申请日：1979-02-15
申请人： Kanji Sato , Kazuyoshi Kushibe , Masaru Nishii , Yasuhiro Kanaya , Yasumasa Kawabe
发明人： Kanji Sato , Kazuyoshi Kushibe , Masaru Nishii , Yasuhiro Kanaya , Yasumasa Kawabe
IPC分类号： D06P1/30 , D06P1/22 , D06P1/651 , C09K3/00
CPC分类号： D06P1/221 , D06P1/65112
摘要： According to this invention, there is provided a method of dyeing fibrous products characterized in that, in the dyeing of fibrous products using an oxidation-reduction dyeing type dye and an aqueous alkali solution of thiourea dioxide as a reducing solution, the reduction of the dye with the said aqueous alkali solution of thiourea dioxide is carried out in the presence of one or more dialdehyde compounds selected from dialdehyde compounds represented by the general formulaOHC--R--CHO (I)in which R is a saturated or unsaturated aliphatic or aromatic organic compound radical.
摘要翻译：根据本发明，提供一种染色纤维制品的方法，其特征在于，在使用氧化还原染色型染料和作为还原剂的二氧化硫脲的碱性水溶液的染色中，染料的还原所述二氧化硫脲二氧化硫水溶液在一种或多种选自由通式OHC-R-CHO（I）表示的二醛化合物的二醛化合物的存在下进行，其中R是饱和或不饱和的脂族或芳族有机物复合基。

22. 发明授权

US3948795A Method of low-temperature activation of peroxides 失效
标题翻译：过氧化物低温活化方法
公开(公告)号：US3948795A
公开(公告)日：1976-04-06
申请号：US427396
申请日：1973-12-21
申请人： Yasumasa Kawabe , Masaaki Suzuki
发明人： Yasumasa Kawabe , Masaaki Suzuki
IPC分类号： C11D3/39 , C01B15/02 , C11D7/54
CPC分类号： C11D3/3917 , C11D3/392
摘要： This invention provides a method for activating peroxides, particularly hydrogen peroxide or hydrogen peroxide adducts and for thereby furnishing the said peroxides with excellent bleaching effects, cleaning effects, and sterilizing effects at low temperatures, by adding to the said peroxides an aromatic compound containing in the molecule one or several groups represented by the formula ##EQU1## wherein R is a substituted or unsubstituted monovalent aromatic group and X is either CO or SO.sub.2. The activation according to this invention is preferably carried out in an aqueous solution at a pH value ranging from 7 to 11, at a temperature below 40.degree.C.
摘要翻译：本发明提供了一种活化过氧化物，特别是过氧化氢或过氧化氢加合物的方法，由此通过向所述过氧化物中加入含有所述过氧化物的芳族化合物，从而使所述过氧化物在低温下具有优异的漂白效果，清洁效果和灭菌效果。分子由式X-RCO-N ANGLE SO 2表示的一个或几个基团，其中R是取代或未取代的一价芳族基团，X是CO或SO 2。根据本发明的活化优选在pH为7-11的水溶液中，在低于40℃的温度下进行。

23. 发明授权

US07255971B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07255971B2
公开(公告)日：2007-08-14
申请号：US10244070
申请日：2002-09-16
申请人： Toru Fujimori , Yasumasa Kawabe
发明人： Toru Fujimori , Yasumasa Kawabe
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.
摘要翻译：一种正型抗蚀剂组合物，其包含以下成分：（A）在用光化射线和辐射之一照射时能够产生酸的化合物; （B）不溶于或微溶于碱的树脂，但在酸的作用下变为碱溶性的树脂; （C）碱性化合物; 和（D）包含至少三个羟基或至少三个取代的羟基并且包含至少一个环状结构的化合物。

24. 发明授权

US06743562B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06743562B2
公开(公告)日：2004-06-01
申请号：US10097983
申请日：2002-03-15
申请人： Mokoto Momota , Yasumasa Kawabe
发明人： Mokoto Momota , Yasumasa Kawabe
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A positive photoresist composition comprising the components of: (a) a resin which decomposes by the action of an acid, thereby having an increased solubility in an alkali developer; and (b) a compound which is represented by the formula (1) and generates an acid by exposure to active rays or radiation, and a compound which is represented by the formula (2) and generates an acid by exposure to active rays or radiation.
摘要翻译：一种正性光致抗蚀剂组合物，其包含以下组分：（a）通过酸的作用分解的树脂，从而在碱性显影剂中具有增加的溶解度; 和（b）由式（1）表示并通过暴露于活性射线或辐射产生酸的化合物和由式（2）表示的化合物并通过暴露于活性射线或辐射产生酸。

25. 发明授权

US06692897B2 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06692897B2
公开(公告)日：2004-02-17
申请号：US09902793
申请日：2001-07-12
申请人： Toru Fujimori , Yasumasa Kawabe , Hajime Nakao
发明人： Toru Fujimori , Yasumasa Kawabe , Hajime Nakao
IPC分类号： G03F7038
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/12
摘要： A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).
摘要翻译：正型抗蚀剂组合物包括：（A）具有脂族环状烃基并通过酸作用增加对碱性显影剂的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; 和（C）在分子中具有由下式（I）表示的至少一种部分结构的含氮化合物。

26. 发明授权

US5709977A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5709977A
公开(公告)日：1998-01-20
申请号：US677143
申请日：1996-07-09
申请人： Shiro Tan , Yasumasa Kawabe
发明人： Shiro Tan , Yasumasa Kawabe
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition which comprises a 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a specified phenol compound, formaldehyde and a specified aromatic aldehyde having at least one alkoxy substituent and at least one hydroxy substituent.
摘要翻译：提供一种正性光致抗蚀剂组合物，其包含1,2-醌二叠氮化合物和通过使特定的酚化合物，甲醛和具有至少一个烷氧基取代基的特定芳香醛和至少一个羟基取代基缩合而获得的碱溶性树脂。

27. 发明授权

US5554481A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5554481A
公开(公告)日：1996-09-10
申请号：US361697
申请日：1994-12-22
申请人： Yasumasa Kawabe , Kenichiro Satoh , Toshiaki Aoai
发明人： Yasumasa Kawabe , Kenichiro Satoh , Toshiaki Aoai
IPC分类号： C08G8/20 , G03F7/022 , G03F7/023
CPC分类号： C08G8/20 , G03F7/022 , G03F7/023
摘要： A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.
摘要翻译：对辐射敏感的正性光致抗蚀剂组合物，具有高分辨能力，高灵敏度和优异的储存稳定性，并进一步形成能够在宽范围的光掩模线宽度下精确地再现掩模尺寸的图案。本发明是通过含有多羟基化合物的1,2-萘醌二叠氮基-5-磺酸酯和多羟基化合物的1,2-萘醌二叠氮基-4-磺酸酯中的至少一种的组合物而得到的，至少一种碱溶性树脂。

28. 发明授权

US5429905A Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound 失效
标题翻译：含有多羟基化合物的萘醌二叠氮磺酸酯的正性光刻胶组合物
公开(公告)号：US5429905A
公开(公告)日：1995-07-04
申请号：US227011
申请日：1994-04-13
申请人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： The present invention relates to a positive-working photoresist composition comprising at least one of the 1,2-naphthoquinonediazido-5- sulfonic acid ester of a polyhydroxy compound represented by formula (1) and the 1,2-naphthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound represented by formula (1): ##STR1## wherein R represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, an alkyl group having from 1 to 6 carbon atoms, an aryl group, or an alkenyl group; and R.sub.1 to R.sub.15, which may be the same or different, each represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group, or a substituted or unsubstituted cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.15 is a substituted or unsubstituted cycloalkyl group.
摘要翻译：本发明涉及一种正性光致抗蚀剂组合物，其包含由式（1）表示的多羟基化合物的1,2-萘醌二叠氮基-5-磺酸酯和1,2-萘醌二叠氮基-4-磺酸中的至少一种由式（1）表示的多羟基化合物的酯：其中R表示氢原子，羟基，卤素原子，硝基，具有1至6个碳原子的烷基，芳基基团或烯基; R 1〜R 15可以相同或不同，表示氢原子，羟基，卤素原子，碳原子数1〜6的烷基，烷氧基或取代或未取代的环烷基，条件是R 1至R 15中的至少一个是取代或未取代的环烷基。

29. 发明授权

US5340683A Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound 失效
标题翻译：具有表面颗粒和阳极氧化的铝基板的预感板，其具有含特定多羟基化合物的醌二叠氮磺酸酯的光敏层
公开(公告)号：US5340683A
公开(公告)日：1994-08-23
申请号：US86864
申请日：1993-07-07
申请人： Syunichi Kondo , Akira Nagashima , Yasumasa Kawabe
发明人： Syunichi Kondo , Akira Nagashima , Yasumasa Kawabe
IPC分类号： G03F7/00 , C07C309/76 , C09B11/00 , G03F7/022 , G03F7/023 , G03F7/09
CPC分类号： C09B11/00 , C07C309/76 , G03F7/022
摘要： A PS plate comprises a surface-grained and anodized aluminum plate provided thereon with a light-sensitive layer of a composition comprising a light-sensitive substance and an alkali-soluble resin wherein the light-sensitive substance is a 1,2-naphthoquinonediazide-5- (or -4-) sulfonic acid ester of a polyhydroxy compound of formula (I): ##STR1## wherein substituents R.sub.1 to R.sub.4 may be same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group or an alkenyl group; R.sub.5 and R.sub.6 each represents a hydrogen atom, an alkyl group or a group: ##STR2## a and c each represents 0-1 and b represents 0-4. The PS plate permits the complete removal of any pasting mark and has a high development latitude.
摘要翻译： PS板包括在其上设置有包含感光物质和碱溶性树脂的组合物的感光层的表面颗粒和阳极氧化铝板，其中光敏物质是1,2-萘醌二叠氮化物-5 （I）的多羟基化合物的（或4-）磺酸酯：不同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基组; R 5和R 6各自表示氢原子，烷基或基团：A和C各自表示0-1，b表示0-4。 PS板允许完全去除任何粘贴标记，并具有较高的开发纬度。

30. 发明授权

US5030550A Developer for positive type photoresists 失效
标题翻译：正型光刻胶的开发商
公开(公告)号：US5030550A
公开(公告)日：1991-07-09
申请号：US333928
申请日：1989-04-06
申请人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
IPC分类号： G03C1/72 , G03F7/32 , H01L21/027
CPC分类号： G03F7/322
摘要： A positive photoresist developer containing a basic compound and from 10 to 10,000 ppm of a non-ionic surfactant represented by formula (I): ##STR1## wherein X represents an oxyethylene group; Y represents an oxypropylene group; R represents hydrogen, an alkyl group containing from 1 to 8 carbon atoms, R', or ##STR2## R' represents --O--(X).sub.m (Y).sub.n --H; R" represents R' of an alkyl group containing l carbon atoms; m and n each is an integer from 1 to 50, provided that m:n is from 20:80 to 80:20; p is 0 or 1, and q and s each is o or an integer from 1 to 4, provided that p+q+s=4; and l is an integer from 1 to 4; and r is an integer from 1 to 8, provided that l+r is an integer of 9 or more. The developer has superior art in forming properties, and prevents film residues, surface layer peeling, and film reduction.
摘要翻译：含有碱性化合物的正性光致抗蚀剂显影剂和10〜10,000ppm由式（I）表示的非离子型表面活性剂：其中X表示氧化乙烯基; Y表示氧丙烯基; R表示氢，含有1至8个碳原子的烷基，R'或R'表示-O-（X）m（Y）n -H; R“表示含有1个碳原子的烷基的R'; m和n各自为1至50的整数，条件是m：n为20:80至80:20; p为0或1，q和s各自为o或1至4的整数，条件是p + q + s = 4; l为1〜4的整数，并且r为1〜8的整数，条件是l + r为9以上的整数。显影剂具有优异的成型性能，并且防止膜残留，表面层剥离和膜还原。

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