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    • 30. 发明申请
    • RESIN COMPOSITION FOR STEREOLITHOGRAPHY
    • 用于立体成像的树脂组合物
    • US20090209674A1
    • 2009-08-20
    • US12304962
    • 2007-06-15
    • Takashi ItoTsuneo HagiwaraKenji HirotsuTadashi Murakami
    • Takashi ItoTsuneo HagiwaraKenji HirotsuTadashi Murakami
    • C08F2/46
    • C08F2/50B33Y70/00C08G59/18C08L63/00G03F7/0037G03F7/038
    • Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time.The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    • 提供一种用于立体光刻的树脂组合物,其在未固化状态下随时间吸收几乎没有水分和水分,即使在高湿度下也保持低吸湿率,并且具有高固化灵敏度,由此可以获得诸如尺寸精度的性能优异的立体光刻产品 ,可以平滑地产生机械性能和尺寸稳定性,以减少光照射时间。 用于立体光刻的树脂组合物,其包含由下述通式(I)表示的氧杂环丁烷化合物; (其中R1表示具有1至5个碳原子的烷基,R2表示可含有醚键的具有2至10个碳原子的亚烷基),基于总重量的3至60质量% 用于立体光刻的树脂组合物。