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    • 21. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US07977932B2
    • 2011-07-12
    • US12206907
    • 2008-09-09
    • Fukashi Morishita
    • Fukashi Morishita
    • G05F3/16
    • G05F1/465
    • The present invention provides a regulator circuit that can fast-respond to a variation in load current and supply a sufficient drive current so as to be capable of generating a stable internal source voltage. The regulator circuit includes a preamplifier circuit that detects and amplifies a different between a reference voltage and an internal source voltage, a clamp circuit that limits the amplitude of an output of the preamplifier circuit, a main amplifier circuit that amplifies the amplitude-limited output of the preamplifier circuit, and a driver circuit that outputs the internal source voltage according to the output of the main amplifier. Even though the internal source voltage varies abruptly, the regulator circuit does not oscillate owing to the effect of the clamp circuit.
    • 本发明提供了一种调节器电路,其能够快速响应负载电流的变化并提供足够的驱动电流,以便能够产生稳定的内部源电压。 调节器电路包括前置放大器电路,其检测和放大参考电压和内部源极电压之间的不同,限制前置放大器电路的输出的幅度的钳位电路,放大限幅输出的主放大器电路 前置放大器电路和根据主放大器的输出输出内部源电压的驱动电路。 即使内部源电压突然变化,调节器电路也不会由于钳位电路的影响而振荡。
    • 22. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US07910975B2
    • 2011-03-22
    • US10593275
    • 2005-06-03
    • Fukashi MorishitaKazutami Arimoto
    • Fukashi MorishitaKazutami Arimoto
    • H01L29/788H01L27/01H01L27/12
    • G11C11/405G11C2211/4016H01L27/108H01L27/10802
    • The present invention aims at providing a semiconductor memory device that can be manufactured by a MOS process and can realize a stable operation. A storage transistor has impurity diffusion regions, a channel formation region, a charge accumulation node, a gate oxide film, and a gate electrode. The gate electrode is connected to a gate line and the impurity diffusion region is connected to a source line. The storage transistor creates a state where holes are accumulated in the charge accumulation node and a state where the holes are not accumulated in the charge accumulation node to thereby store data “1” and data “0”, respectively. An access transistor has impurity diffusion regions, a channel formation region, a gate oxide film, and a gate electrode. The impurity diffusion region is connected to a bit line.
    • 本发明的目的在于提供一种可以通过MOS工艺制造并可实现稳定操作的半导体存储器件。 存储晶体管具有杂质扩散区域,沟道形成区域,电荷累积节点,栅极氧化膜和栅电极。 栅电极连接到栅极线,杂质扩散区连接到源极线。 存储晶体管产生在电荷累积节点中积累空穴的状态和空穴未积累在电荷累积节点中的状态,从而分别存储数据“1”和数据“0”。 存取晶体管具有杂质扩散区,沟道形成区,栅极氧化膜和栅电极。 杂质扩散区域连接到位线。
    • 23. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US07906990B2
    • 2011-03-15
    • US12677745
    • 2008-09-19
    • Fukashi Morishita
    • Fukashi Morishita
    • H01L25/00H03K19/00H03K19/20
    • H01L27/1203H01L27/088H01L27/108H01L27/10802H01L27/10844H01L29/7841H01L29/78615
    • The present invention provides a semiconductor integrated circuit device in which characteristics of an SOI transistor are effectively used to achieve higher speed, higher degree of integration, and also reduction in voltage and power consumption. The semiconductor integrated circuit device according to the present invention has a configuration in which a plurality of external power supply lines and body voltage control lines are alternately arranged in one direction so as to extend over the entire chip, which supply power and a body voltage to logic circuits, an analog circuit and memory circuits. A body voltage control type logic gate is fully applied in the logic circuit, whereas the body voltage control type logic gate is partially applied in the memory circuit.
    • 本发明提供一种半导体集成电路器件,其中SOI晶体管的特性被有效地用于实现更高的速度,更高的集成度,并且还降低了电压和功耗。 根据本发明的半导体集成电路器件具有这样的结构,其中多个外部电源线和体电压控制线在一个方向上交替布置,以便在整个芯片上延伸,从而将电源和体电压提供给 逻辑电路,模拟电路和存储器电路。 体电压控制型逻辑门完全应用在逻辑电路中,而体电压控制型逻辑门部分地应用于存储器电路中。
    • 27. 发明授权
    • Semiconductor device
    • 半导体器件
    • US06914300B2
    • 2005-07-05
    • US10653198
    • 2003-09-03
    • Masakazu HiroseFukashi Morishita
    • Masakazu HiroseFukashi Morishita
    • H01L21/3205H01L21/82H01L21/822H01L21/8234H01L21/84H01L23/52H01L27/01H01L27/04H01L27/08H01L27/088H01L27/12H01L29/786H01L31/0392
    • H01L27/1203H01L21/84
    • In a potential interconnection layer, when viewed from a plane, a plurality of power supply potential regions and ground potential regions are alternately provided, with an interlayer insulation layer lying therebetween. A contact plug penetrating a second insulation layer is provided to electrically connect a source/drain (S/D) region on one side of a selected field effect transistor with a selected power supply potential region. Similarly, a contact plug penetrating the second insulation layer is provided to electrically connect a source/drain (S/D) region on the other side of another selected field effect transistor with a selected ground potential region. By employing this structure, a semiconductor device having a plurality of semiconductor circuits in which a power supply potential and a ground potential can be stabilized regardless of the cross-sectional structure of the semiconductor device is provided.
    • 在潜在的互连层中,当从平面观察时,交替地设置多个电源电位区域和接地电位区域,层间绝缘层位于其间。 提供穿透第二绝缘层的接触插塞以将选定的场效应晶体管的一侧上的源极/漏极(S / D)区域与选定的电源电位区域电连接。 类似地,穿过第二绝缘层的接触插塞被提供以将另一个选择的场效应晶体管的另一侧上的源极/漏极(S / D)区域与选择的接地电位区域电连接。 通过采用这种结构,提供了具有能够稳定电源电位和接地电位的多个半导体电路的半导体器件,而与半导体器件的横截面结构无关。