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    • 22. 发明授权
    • Solid state image pickup apparatus
    • 固态摄像装置
    • US07110030B1
    • 2006-09-19
    • US09264719
    • 1999-03-09
    • Tetsunobu KochiShigetoshi SugawaIsamu UenoToru KoizumiKatsuhito SakuraiHiroki Hiyama
    • Tetsunobu KochiShigetoshi SugawaIsamu UenoToru KoizumiKatsuhito SakuraiHiroki Hiyama
    • H04N3/14H04N5/335
    • H04N5/374
    • In the solid state image pickup apparatus, in order to achieve complete transfer of the charge from the photodiode to the floating diffusion area, there is provided a pickup apparatus having a photoelectric conversion element, a transfer switch consisting of a MOS transistor for transferring the signal charge generated in the photoelectric conversion element, a floating diffusion capacitance for receiving the signal charge through the transfer switch, and a reset switch consisting of a MOS transistor for resetting the potential of the floating diffusion capacitance, the device comprising at least a potential setting circuit for generating a voltage different from the power supply voltage, wherein the output of the potential setting circuit is applied as a pulse to the gate of the transfer switch and/or the gate of the reset switch.
    • 在固态图像拾取装置中,为了实现电荷从光电二极管完全转移到浮动扩散区域,提供了一种拾取装置,其具有光电转换元件,由用于传送信号的MOS晶体管组成的转移开关 在光电转换元件中产生的电荷,用于通过转移开关接收信号电荷的浮动扩散电容,以及由用于复位浮动扩散电容的电位的MOS晶体管组成的复位开关,该器件至少包括电位设置电路 用于产生不同于电源电压的电压,其中电位设置电路的输出作为脉冲施加到转换开关的栅极和/或复位开关的栅极。
    • 28. 发明授权
    • Solid state image pickup device and manufacturing method therefor
    • 固态摄像装置及其制造方法
    • US07705373B2
    • 2010-04-27
    • US11773731
    • 2007-07-05
    • Toru KoizumiShigetoshi SugawaIsamu UenoTesunobu KochiKatsuhito SakuraiHiroki Hiyama
    • Toru KoizumiShigetoshi SugawaIsamu UenoTesunobu KochiKatsuhito SakuraiHiroki Hiyama
    • H01L29/76
    • H01L27/14806H01L27/14609H01L27/14643H01L27/14689H01L31/035281Y02E10/50
    • A MOS-type solid-state image pickup device includes a photoelectric conversion unit having a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type forming a pn-junction with the first semiconductor region, a third semiconductor region of the first conductivity type disposed at a light incident side of the second semiconductor region, and a transfer MOS transistor having the second semiconductor region, a fourth semiconductor region of the second conductivity type, and a gate electrode disposed on an insulating film on the first semiconductor region between the photoelectric conversion unit and the fourth semiconductor region to transfer a charge carrier from the second semiconductor region to the fourth semiconductor region. The photoelectric conversion unit and the transfer MOS transistor are disposed on a substrate. A fifth semiconductor region of the second conductivity type is arranged continuously to the second semiconductor region under the gate electrode, and a sixth semiconductor region of the second conductivity type having an impurity concentration lower than that of the fourth semiconductor region is arranged at a side of the gate electrode in the fourth semiconductor region. A drain of the transfer MOS transistor includes the fourth and sixth semiconductor regions, and a bias is applied to the drain, and the fifth semiconductor region is depleted during reading out the charge carrier from the second semiconductor region.
    • MOS型固态摄像装置包括:具有第一导电类型的第一半导体区域的第一半导体区域的第二半导体区域和与该第一半导体区域形成pn结的第二导电类型的第二半导体区域的光电转换单元, 位于第二半导体区域的光入射侧的第一导电类型和具有第二半导体区域的转移MOS晶体管,第二导电类型的第四半导体区域和设置在第一半导体区域上的绝缘膜上的栅电极 半导体区域,以将电荷载体从第二半导体区域转移到第四半导体区域。 光电转换单元和转移MOS晶体管设置在基板上。 第二导电类型的第五半导体区域被连续配置到栅极下方的第二半导体区域,并且具有比第四半导体区域低的杂质浓度的第二导电类型的第六半导体区域被布置在 在第四半导体区域中的栅电极。 转移MOS晶体管的漏极包括第四和第六半导体区域,并且偏置被施加到漏极,并且在从第二半导体区域读出电荷载流子期间,第五半导体区域被耗尽。
    • 29. 发明授权
    • Solid state image pickup device with LDD structure and reset transistor
    • 具有LDD结构和复位晶体管的固态图像拾取器件
    • US06661459B1
    • 2003-12-09
    • US09271887
    • 1999-03-18
    • Toru KoizumiShigetoshi SugawaIsamu UenoTesunobu KochiKatsuhito SakuraiHiroki Hiyama
    • Toru KoizumiShigetoshi SugawaIsamu UenoTesunobu KochiKatsuhito SakuraiHiroki Hiyama
    • H04N314
    • H01L27/14806H01L27/14609H01L27/14643H01L27/14689H01L31/035281Y02E10/50
    • In a solid state image pickup device, in order to form a bypass region with precisely controlled impurity concentration and width, there is provided a solid state image pickup device comprising a photoelectric conversion unit composed of a first region of a first conductive type formed on a semiconductor substrate and having a principal surface, a second region of a second conductive type formed in the first region, and a third region of the first conductive type present between the second region and the principal surface, a fourth region of the second conductive type formed in the first region, and a charge transfer unit including the first region, an insulation layer on the first region and a control electrode provided on the insulation layer, for transferring a signal charge accumulated in the photoelectric conversion unit, to the fourth region, wherein the photoelectric conversion unit and the charge transfer unit are connected through a fifth region of the second conductive type.
    • 在固态图像拾取装置中,为了形成具有精确控制的杂质浓度和宽度的旁路区域,提供了一种固态图像拾取装置,其包括光电转换单元,该光电转换单元由形成在第一导电类型的第一导电类型的第一区域 半导体基板,具有主表面,形成在第一区域中的第二导电类型的第二区域和存在于第二区域和主表面之间的第一导电类型的第三区域,形成第二导电类型的第四区域 在所述第一区域中,以及电荷转移单元,所述电荷转移单元包括所述第一区域,所述第一区域上的绝缘层和设置在所述绝缘层上的控制电极,用于将累积在所述光电转换单元中的信号电荷转移到所述第四区域,其中 光电转换单元和电荷转移单元通过第二导电类型的第五区连接。