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21. 发明申请

US20100012026A1 EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH 有权
标题翻译：用于原材料和自动压力调节装置的蒸发供应装置
公开(公告)号：US20100012026A1
公开(公告)日：2010-01-21
申请号：US12306904
申请日：2007-06-13
申请人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/52 , F16K17/38
CPC分类号： C23C16/4481 , C23C16/52 , G05D16/2013 , Y10T137/7737
摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要翻译：用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

22. 发明授权

US08555920B2 Flow rate ratio variable type fluid supply apparatus 有权
标题翻译：流量比可变型流体供给装置
公开(公告)号：US08555920B2
公开(公告)日：2013-10-15
申请号：US12303841
申请日：2007-06-13
申请人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： F17D1/04
CPC分类号： G05D7/0664 , Y10T137/85938 , Y10T137/87314 , Y10T137/87539
摘要： A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.
摘要翻译：流量比可变型流体供给装置包括：流量控制系统，其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室，并且具有开口面积S1的第一孔口安装在第一分流通道上，第二分流通道连接到并联连接的多个支管通道，开口区域安装在分支通道上的开口/ 安装在所有或一些分支通道上的关闭阀，使得气体转向流动转向通道，流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值通过调节流通孔的总开口面积来分流通道。

23. 发明授权

US08191856B2 Piezoelectric element driven metal diaphragm control valve 有权
标题翻译：压电元件驱动金属隔膜控制阀
公开(公告)号：US08191856B2
公开(公告)日：2012-06-05
申请号：US12852220
申请日：2010-08-06
申请人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
发明人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
IPC分类号： F16K31/02
CPC分类号： F16K24/04 , F16K7/14 , F16K31/004 , F16K31/007 , F16K51/02
摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要翻译：控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长，规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

24. 发明授权

US08181932B2 Normally open type piezoelectric element driven metal diaphragm control valve 有权
标题翻译：常开式压电元件驱动金属隔膜控制阀
公开(公告)号：US08181932B2
公开(公告)日：2012-05-22
申请号：US12161549
申请日：2006-11-13
申请人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
发明人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
IPC分类号： F16K31/02
CPC分类号： F16K24/04 , F16K7/14 , F16K31/004 , F16K31/007 , F16K51/02
摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要翻译：控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长，规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

25. 发明授权

US08047510B2 Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith 有权
标题翻译：用于原材料的蒸发供应装置和使用的自动压力调节装置
公开(公告)号：US08047510B2
公开(公告)日：2011-11-01
申请号：US12306904
申请日：2007-06-13
申请人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： B01F3/04
CPC分类号： C23C16/4481 , C23C16/52 , G05D16/2013 , Y10T137/7737
摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要翻译：用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

26. 发明申请

US20100229976A1 FLOW RATE RATIO VARIABLE TYPE FLUID SUPPLY APPARATUS 有权
标题翻译：流量比可变型流体供应装置
公开(公告)号：US20100229976A1
公开(公告)日：2010-09-16
申请号：US12303841
申请日：2007-06-13
申请人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： F16L41/00 , G01F1/42
CPC分类号： G05D7/0664 , Y10T137/85938 , Y10T137/87314 , Y10T137/87539
摘要： A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.
摘要翻译：流量比可变型流体供给装置包括：流量控制系统，其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室，并且具有开口面积S1的第一孔口安装在第一分流通道上，第二分流通道连接到并联连接的多个支管通道，开口区域安装在分支通道上，开口/ 安装在所有或一些分支通道上的关闭阀，使得气体转向流动转向通道，流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值通过调节流通孔的总开口面积来分流通道。

27. 发明授权

US09163743B2 Piezoelectrically driven valve and piezoelectrically driven flow rate control device 有权
标题翻译：压电阀和压电驱动流量控制装置
公开(公告)号：US09163743B2
公开(公告)日：2015-10-20
申请号：US13505620
申请日：2010-11-04
申请人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
发明人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
IPC分类号： G05D7/06 , F16K31/00 , F16K7/14 , F16K25/00
CPC分类号： F16K31/007 , F16K7/14 , F16K25/005 , G05D7/0629 , Y10T137/6416 , Y10T137/7759 , Y10T137/776 , Y10T137/7761
摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.
摘要翻译：提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。

28. 发明申请

US20070168150A1 Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed 失效
标题翻译：用于流体的耐腐蚀金属制传感器和使用传感器的流体供应装置
公开(公告)号：US20070168150A1
公开(公告)日：2007-07-19
申请号：US10598290
申请日：2005-01-13
申请人： Kaoru Hirata , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi
发明人： Kaoru Hirata , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi
IPC分类号： G01K1/00
CPC分类号： G01L19/0023 , G01F1/6842 , G01F1/6845 , Y10T137/7761
摘要： The present invention provides a corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed. More specifically, the corrosion-resistant metal made sensor for fluid is equipped with a corrosion-resistant metal substrate, a mass flow rate sensor part comprising a corrosion-resistant metal substrate, a thin film forming a temperature sensor and a heater mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrate, and a pressure sensor part comprising a thin film forming a strain sensor element mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrates, and the sensor is so constituted that the mass flow rate and pressure of the fluid are measured.
摘要翻译：本发明提供了用于流体的耐腐蚀金属制传感器和使用该传感器的流体供应装置。更具体地说，用于流体的耐腐蚀金属制传感器配备有耐腐蚀金属基板，包含耐腐蚀金属基板的质量流量传感器部件，形成温度传感器的薄膜和安装在背面的加热器耐腐蚀金属基板的流体接触面的表面侧，以及包含形成安装在耐腐蚀金属基板的流体接触面的背面侧的应变传感器元件的薄膜的压力传感器部，传感器被构造成测量流体的质量流量和压力。

29. 发明授权

US08931506B2 Gas supply apparatus equipped with vaporizer 有权
标题翻译：配有蒸发器的供气装置
公开(公告)号：US08931506B2
公开(公告)日：2015-01-13
申请号：US12935870
申请日：2009-02-17
申请人： Atsushi Nagata , Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Atsushi Matsumoto , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
发明人： Atsushi Nagata , Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Atsushi Matsumoto , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
IPC分类号： F16K49/00 , B01J4/02 , B01B1/00 , C23C16/448 , C23C16/455 , F02M21/06 , F02M21/02 , F02D19/02
CPC分类号： B01J4/02 , B01B1/005 , B01J2219/00162 , B01J2219/00164 , B01J2219/00191 , B01J2219/00198 , B01J2219/00213 , B01J2219/00231 , C23C16/4481 , C23C16/4485 , C23C16/45561 , F02D19/023 , F02D19/027 , F02M21/0239 , F02M21/06 , Y02T10/32 , Y10T137/6416 , Y10T137/6606
摘要： An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.
摘要翻译：提供一种配备有蒸发器的节能的小型化气体供给装置，其中，气体供给装置能够稳定且容易地进行高精度的气体流量控制，而无需对蒸发器侧进行严格的温度控制。本发明涉及一种配备有蒸发器的气体供给装置，该蒸发器包括：（a）液体接收罐; （b）蒸发液体的蒸发器; （c）调节汽化气体的流量的高温型压力式流量控制装置; 以及（d）加热蒸发器，高温型压力式流量控制装置以及连接到蒸发器和高温型压力式流量控制装置的管道的期望部分的加热装置。

30. 发明申请

US20140299206A1 RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS EQUIPPED WITH RAW MATERIAL CONCENTRATION 有权
标题翻译：原料气化装置与原料浓缩装置
公开(公告)号：US20140299206A1
公开(公告)日：2014-10-09
申请号：US14343226
申请日：2012-07-17
申请人： Masaaki Nagase , Kaoru Hirata , Atushi Hidaka , Kouji Nishino , Nobukazu Ikeda , Takeshi Nakamura
发明人： Masaaki Nagase , Kaoru Hirata , Atushi Hidaka , Kouji Nishino , Nobukazu Ikeda , Takeshi Nakamura
IPC分类号： F17D3/00
CPC分类号： F17D3/00 , C23C16/4482 , C23C16/45561 , G05D11/135 , Y10T137/8158
摘要： An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mixed gas easily and highly accurately and displaying the concentration in real time without using an expensive concentration meter, etc.
摘要翻译：能够精确稳定地调节载气和原料气体的混合气体中的原料浓度的装置，以高精度地控制流量，将混合气体供给到处理室，从而检测蒸发浓度混合气体中的原料气体容易且高精度地实时显示浓度，而不使用昂贵的浓度计等。

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